PROCEEDINGS VOLUME 1671
MICROLITHOGRAPHY '92 | 8-12 MARCH 1992
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
IN THIS VOLUME

0 Sessions, 45 Papers, 0 Presentations
MICROLITHOGRAPHY '92
8-12 March 1992
San Jose, CA, United States
E-Beam Lithography
Proc. SPIE 1671, Advanced e-beam systems for manufacturing, 0000 (9 July 1992); doi: 10.1117/12.136006
Proc. SPIE 1671, MEBES IV: a new generation raster-scan electron-beam lithography system, 0000 (9 July 1992); doi: 10.1117/12.136007
Proc. SPIE 1671, Mix-and-match lithography in a manufacturing environment, 0000 (9 July 1992); doi: 10.1117/12.136008
Proc. SPIE 1671, Electron-beam lithography system for high-precision reticle making, 0000 (9 July 1992); doi: 10.1117/12.136009
Proc. SPIE 1671, Study of single-layer e-beam lithography for x-ray mask making, 0000 (9 July 1992); doi: 10.1117/12.136010
Proc. SPIE 1671, E-beam lithography at low voltages, 0000 (9 July 1992); doi: 10.1117/12.136011
Proc. SPIE 1671, Scanning tunneling microscope lithography: a viable lithographic technology?, 0000 (9 July 1992); doi: 10.1117/12.136012
Recent Developments in X-Ray Lithography
Proc. SPIE 1671, Why bother with x-ray lithography?, 0000 (9 July 1992); doi: 10.1117/12.136013
Proc. SPIE 1671, ALF: a facility for x-ray lithography (II): a progress report, 0000 (9 July 1992); doi: 10.1117/12.136014
Proc. SPIE 1671, Evaluation of a laser-based proximity x-ray stepper, 0000 (9 July 1992); doi: 10.1117/12.136015
Proc. SPIE 1671, Production of x-ray mask blanks for a point source stepper, 0000 (9 July 1992); doi: 10.1117/12.136016
Proc. SPIE 1671, Design of synchrotron x-ray lithography beamlines, 0000 (9 July 1992); doi: 10.1117/12.136017
Proc. SPIE 1671, X-ray optics design approach for an SXLS lithography beamline, 0000 (9 July 1992); doi: 10.1117/12.136018
Proc. SPIE 1671, Finite element analysis of dynamic thermal distortions of an x-ray mask for synchrotron radiation lithography, 0000 (9 July 1992); doi: 10.1117/12.136019
E-Beam Lithography
Proc. SPIE 1671, Single-cycle lithography process for both large and sub-half-micron features (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136020
Proc. SPIE 1671, EB lithography for fabricating a GHz SAW filter on LiTaO3 substrate (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136021
Proc. SPIE 1671, Effect of stitching errors on the performance of DFB lasers fabricated using e-beam lithography (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136022
Proc. SPIE 1671, Microstructural gated field emission sources for electron-beam applications (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136023
Proc. SPIE 1671, Computational method for the correction of proximity effect in electron-beam lithography (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136024
Proc. SPIE 1671, Electron-beam lithography of optical elements for x-ray range (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136025
Recent Developments in X-Ray Lithography
Proc. SPIE 1671, Effects of mounting imperfections on an x-ray lithography mask (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136026
Proc. SPIE 1671, keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136027
Proc. SPIE 1671, Spherical pinch x-ray generator (SPX II): prototype performance for x-ray lithography (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136028
Proc. SPIE 1671, Study of large-field beryllium window for SR lithography (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136029
Resists for Manufacturing
Proc. SPIE 1671, Model and measurement of resist heating effect in EBL (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136030
Focused-Ion-Beam Processing
Proc. SPIE 1671, Focused-ion-beam repair of phase-shift photomasks, 0000 (9 July 1992); doi: 10.1117/12.136031
Proc. SPIE 1671, Focused-ion-beam cross-sectioning techniques using XeF2, 0000 (9 July 1992); doi: 10.1117/12.136032
Proc. SPIE 1671, Resist cross-sectioning using focused ion beams, 0000 (9 July 1992); doi: 10.1117/12.136033
Proc. SPIE 1671, Chromatic and spherical aberration correction in axially symmetric electrostatic lenses, 0000 (9 July 1992); doi: 10.1117/12.136034
Proc. SPIE 1671, Novel surface imaging process with ion-beam lithography and dry development, 0000 (9 July 1992); doi: 10.1117/12.136035
Proc. SPIE 1671, Low-damage anisotropic radical-beam ion-beam etching and selective chemical etching of focused-ion-beam-damaged GaAs substrates, 0000 (9 July 1992); doi: 10.1117/12.136036
Resists for Manufacturing
Proc. SPIE 1671, Resist optimization for SOR x-ray lithography using an orthogonal experimental design, 0000 (9 July 1992); doi: 10.1117/12.136037
Proc. SPIE 1671, Comparative evaluation of e-beam charge-reducing processes, 0000 (9 July 1992); doi: 10.1117/12.136038
Proc. SPIE 1671, Simulation fidelity in microlithography, 0000 (9 July 1992); doi: 10.1117/12.136039
Proc. SPIE 1671, Manufacturing implementation of deep-UV lithography for 500-nm devices, 0000 (9 July 1992); doi: 10.1117/12.136040
Proc. SPIE 1671, Practical evaluation of 16M-DRAMs production with i-line phase-shift lithography, 0000 (9 July 1992); doi: 10.1117/12.136041
Recent Developments in X-Ray Lithography
Proc. SPIE 1671, Alignment and overlay accuracy of an advanced x-ray stepper using an improved alignment system (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136042
Proc. SPIE 1671, Analysis of diffraction intensities in the Fresnel region for the x-ray lithography process optimization (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136043
Proc. SPIE 1671, Development of XUV projection lithography at 60-80 nm (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136044
Proc. SPIE 1671, Practical tolerancing and performance implications for XUV projection lithography reduction systems (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136045
Proc. SPIE 1671, Optimization of partially coherent illumination in x-ray lithography (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136046
Proc. SPIE 1671, X-ray dose density: a new radiation damage modeling tool (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136047
Proc. SPIE 1671, Performances of the CXrL x-ray beamlines (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136048
Proc. SPIE 1671, Implementation of two-state alignment system into CXrL aligner (Poster Paper), 0000 (9 July 1992); doi: 10.1117/12.136049
Proc. SPIE 1671, Impact of CD control on circuit yield in submicron lithography, 0000 (9 July 1992); doi: 10.1117/12.136050
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