PROCEEDINGS VOLUME 1809
PHOTOMASK TECHNOLOGY | 23-25 SEPTEMBER 1992
12th Annual BACUS Symposium on Photomask Technology and Management
IN THIS VOLUME

0 Sessions, 26 Papers, 0 Presentations
PHOTOMASK TECHNOLOGY
23-25 September 1992
Sunnyville, CA, United States
Advanced Lithography
Proc. SPIE 1809, Performance testing and results of the first Etec CORE-2564, 0000 (26 March 1993); doi: 10.1117/12.142129
Proc. SPIE 1809, Performance and perspective of the newly developed high-accuracy mask-making EB lithography system JBX-7000MV designed for 64M DRAM production, 0000 (26 March 1993); doi: 10.1117/12.142137
Proc. SPIE 1809, Performance data from the EBES4 high-speed reticle generator, 0000 (26 March 1993); doi: 10.1117/12.142146
Proc. SPIE 1809, Rational argument for the impracticability of 1x reticles, 0000 (26 March 1993); doi: 10.1117/12.142149
Advanced Process Technology
Proc. SPIE 1809, Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing II, 0000 (26 March 1993); doi: 10.1117/12.142150
Proc. SPIE 1809, Understanding CD error sources in optical mask processing, 0000 (26 March 1993); doi: 10.1117/12.142151
Proc. SPIE 1809, Initial manufacturing performance of an actively controlled PBS resist development process, 0000 (26 March 1993); doi: 10.1117/12.142152
Proc. SPIE 1809, Chrome dry-etching for photomask fabrication, 0000 (26 March 1993); doi: 10.1117/12.142153
Advanced Metrology
Proc. SPIE 1809, Implications of 64-MB reticle specifications on metrology tool requirements, 0000 (26 March 1993); doi: 10.1117/12.142154
Proc. SPIE 1809, New approach for 5X reticle CD methodology, 0000 (26 March 1993); doi: 10.1117/12.142130
Proc. SPIE 1809, Coherence probe metrology for phase-shift masks: initial results, 0000 (26 March 1993); doi: 10.1117/12.142131
Proc. SPIE 1809, Interferometer for phase measurements in phase-shift masks, 0000 (26 March 1993); doi: 10.1117/12.142132
Pelliclization and Cleaning
Proc. SPIE 1809, Defect reduction methodologies: pellicle yield improvement, 0000 (26 March 1993); doi: 10.1117/12.142133
Proc. SPIE 1809, Printability of particles on 5x reticles, 0000 (26 March 1993); doi: 10.1117/12.142134
Proc. SPIE 1809, Point-of-use laser inspection, 0000 (26 March 1993); doi: 10.1117/12.142135
Inspection and Repair
Proc. SPIE 1809, Vector modeling of defects and defect repair for phase-shifting masks, 0000 (26 March 1993); doi: 10.1117/12.142136
Proc. SPIE 1809, Status and trends of laser mask-repair technologies, 0000 (26 March 1993); doi: 10.1117/12.142138
Proc. SPIE 1809, New role of high-sensitivity database inspection, 0000 (26 March 1993); doi: 10.1117/12.142139
Proc. SPIE 1809, Status of x-ray mask inspection and repair, 0000 (26 March 1993); doi: 10.1117/12.142140
Quality and Business
Proc. SPIE 1809, Optimizing continuous improvement in the semiconductor industry, 0000 (26 March 1993); doi: 10.1117/12.142141
Proc. SPIE 1809, Bottom-line empowerment: lessons from the firing line, 0000 (26 March 1993); doi: 10.1117/12.142142
Phase-Shifting Masks
Proc. SPIE 1809, Edge effects in phase-shifting masks for 0.25-um lithography, 0000 (26 March 1993); doi: 10.1117/12.142143
Proc. SPIE 1809, Simple method for rim shifter design: the biased self-aligned rim shifter, 0000 (26 March 1993); doi: 10.1117/12.142144
Proc. SPIE 1809, Real and imaginary phase-shifting masks, 0000 (26 March 1993); doi: 10.1117/12.142145
Proc. SPIE 1809, Application of laser scatterometry to characterize phase-shifting masks, 0000 (26 March 1993); doi: 10.1117/12.142147
Proc. SPIE 1809, Alignment technique for second-level exposure of phase-shifting masks using 10-kV raster-scan electron-beam lithography system, 0000 (26 March 1993); doi: 10.1117/12.142148
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