PROCEEDINGS VOLUME 2087
13TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT | 22-24 SEPTEMBER 1993
13th Annual BACUS Symposium on Photomask Technology and Management
13TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT
22-24 September 1993
Santa Clara, CA, United States
Advanced Lithography
Proc. SPIE 2087, Masks for Markle-Dyson optics, 0000 (15 February 1994); doi: 10.1117/12.167246
Proc. SPIE 2087, Comparison of state-of-the-art lithography tools, 0000 (15 February 1994); doi: 10.1117/12.167284
Photomask Processes and Materials
Proc. SPIE 2087, Flexure of photomasks in manufacturing and application, 0000 (15 February 1994); doi: 10.1117/12.167285
Proc. SPIE 2087, CORE 2564 process optimization with the APTCON 4045, 0000 (15 February 1994); doi: 10.1117/12.167286
Proc. SPIE 2087, Comparison of wet and dry chrome etching with the CORE-2564, 0000 (15 February 1994); doi: 10.1117/12.167247
Proc. SPIE 2087, Dry etch patterning of chrome on glass optical masks using P(SI-CMS) resist, 0000 (15 February 1994); doi: 10.1117/12.167248
Proc. SPIE 2087, Results from the first fully automated PBS-mask process and pelliclization, 0000 (15 February 1994); doi: 10.1117/12.167249
Proc. SPIE 2087, CD results for 6 inch 250 mil PBS photoblanks for a 0.50 micron generation photomask process, 0000 (15 February 1994); doi: 10.1117/12.167250
Metrology
Proc. SPIE 2087, Self-calibration in one dimension, 0000 (15 February 1994); doi: 10.1117/12.167251
Proc. SPIE 2087, Postioning accuracy issues for 0.35 micron critical dimension microlithography, 0000 (15 February 1994); doi: 10.1117/12.167252
Proc. SPIE 2087, Through quartz metrology in an automated chemical process, 0000 (15 February 1994); doi: 10.1117/12.167253
Proc. SPIE 2087, Dimensional metrology of phase-shifting masks with scanning probe microscopes, 0000 (15 February 1994); doi: 10.1117/12.167254
Proc. SPIE 2087, Direct phase measurement in phase-shift masks with a differential heterodyne interferometer, 0000 (15 February 1994); doi: 10.1117/12.167255
Proc. SPIE 2087, Application of an aerial image measurement system to mask fabrication and analysis, 0000 (15 February 1994); doi: 10.1117/12.167256
Proc. SPIE 2087, Metrology hardware simulation of mask focus-exposure matrix, 0000 (15 February 1994); doi: 10.1117/12.167257
Proc. SPIE 2087, Improvements in two-dimensional X/Y metrology on photomasks and wafers, 0000 (15 February 1994); doi: 10.1117/12.167258
Proc. SPIE 2087, New tool for phase-shift mask evaluation: the stepper equipment aerial image measurement system--AIMS, 0000 (15 February 1994); doi: 10.1117/12.167259
Microcontamination and Pelliclization
Proc. SPIE 2087, Basic improvements in the pellicle final clean area, 0000 (15 February 1994); doi: 10.1117/12.167260
Proc. SPIE 2087, Development for deep-UV pellicles, 0000 (15 February 1994); doi: 10.1117/12.167261
Defect Inspection
Proc. SPIE 2087, Die-to-die inspection of phase-shifting masks, 0000 (15 February 1994); doi: 10.1117/12.167262
Proc. SPIE 2087, Die-to-database inspection using high accuracy database representation, 0000 (15 February 1994); doi: 10.1117/12.167263
Proc. SPIE 2087, Automatic defects classification for photolithographics reticles, 0000 (15 February 1994); doi: 10.1117/12.167264
Proc. SPIE 2087, Fabrication and evaluation of a programmed transmission defect test mask, 0000 (15 February 1994); doi: 10.1117/12.167265
Defect Repair
Proc. SPIE 2087, PSM defect repair using currently available tools, 0000 (15 February 1994); doi: 10.1117/12.167266
Proc. SPIE 2087, Laser repair of phase-shifting masks, 0000 (15 February 1994); doi: 10.1117/12.167267
Proc. SPIE 2087, Recent advances in focused ion beam repair of phase-shifting masks, 0000 (15 February 1994); doi: 10.1117/12.167268
Proc. SPIE 2087, Printability of phase-shift defects using a perturbational model, 0000 (15 February 1994); doi: 10.1117/12.167269
Proc. SPIE 2087, Universal pattern data format, 0000 (15 February 1994); doi: 10.1117/12.167270
Proc. SPIE 2087, Characterization of defect sizing on an automatic inspection system (KLA238e), 0000 (15 February 1994); doi: 10.1117/12.167271
Proc. SPIE 2087, Chrome-level repair of phase-shift photomasks using conventional focused ion beam repair technology, 0000 (15 February 1994); doi: 10.1117/12.167272
Quality and Manufacturing Management
Proc. SPIE 2087, LAN integration of photomask tools at IBM Burlington using the IBMRISC/6000, 0000 (15 February 1994); doi: 10.1117/12.167273
Proc. SPIE 2087, Continuous improvement journey at Du Pont photomasks, 0000 (15 February 1994); doi: 10.1117/12.167274
Proc. SPIE 2087, Mask manufacturing improvement through capability definition and bottleneck line management, 0000 (15 February 1994); doi: 10.1117/12.167275
Proc. SPIE 2087, Cost of ownership for soft x-ray projection lithography, 0000 (15 February 1994); doi: 10.1117/12.167276
Proc. SPIE 2087, Mask quality assessment, 0000 (15 February 1994); doi: 10.1117/12.167277
Phase Shift Mask/Future Technology
Proc. SPIE 2087, Phase-shifting mask fabrication, 0000 (15 February 1994); doi: 10.1117/12.167278
Proc. SPIE 2087, New simple method of extending the limit of rim phase-shift mask, 0000 (15 February 1994); doi: 10.1117/12.167279
Proc. SPIE 2087, Simulation and fabrication of a new phase-shifting mask for 0.35 um contact hole pattern transfer: half-tone rim, 0000 (15 February 1994); doi: 10.1117/12.167280
Proc. SPIE 2087, Continous phase transitions fabricated by subtractive process, 0000 (15 February 1994); doi: 10.1117/12.167281
Proc. SPIE 2087, Electron-beam lithography optimization for 0.25-um x-ray mask making, 0000 (15 February 1994); doi: 10.1117/12.167282
Proc. SPIE 2087, Practical approach to 0.35-um i-line lithography, 0000 (15 February 1994); doi: 10.1117/12.167283
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