PROCEEDINGS VOLUME 2194
SPIE'S 1994 SYMPOSIUM ON MICROLITHOGRAPHY | FEB 27 - MAR 4 1994
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
SPIE'S 1994 SYMPOSIUM ON MICROLITHOGRAPHY
Feb 27 - Mar 4 1994
San Jose, CA, United States
Papers of Special Interest
Proc. SPIE 2194, Cost of ownership for x-ray proximity lithography, 0000 (13 May 1994); doi: 10.1117/12.175796
X-Ray Lithography--Manufacturing
Proc. SPIE 2194, Overlay measurement and analysis of x-ray/optical lithography for mix-and-match device applications, 0000 (13 May 1994); doi: 10.1117/12.175807
Proc. SPIE 2194, Supporting early development of advanced high-performance logic with synchrotron orbital radiation lithography: a feasibility evaluation, 0000 (13 May 1994); doi: 10.1117/12.175816
Proc. SPIE 2194, Alignment accuracy improvement by consideration of wafer processing impacts, 0000 (13 May 1994); doi: 10.1117/12.175826
Proc. SPIE 2194, 22-nm overlay accuracy of synchrotron radiation stepper using an improved chromatic bifocus alignment system, 0000 (13 May 1994); doi: 10.1117/12.175832
Proc. SPIE 2194, Comparative study of x-ray lithography process optimization using theoretical and empirical tools, 0000 (13 May 1994); doi: 10.1117/12.175833
Proc. SPIE 2194, X-ray lithography processing at CXrL from beamline to quarter-micron NMOS devices, 0000 (13 May 1994); doi: 10.1117/12.175835
Papers of Special Interest
Proc. SPIE 2194, Micromechanics for actuators via deep x-ray lithography, 0000 (13 May 1994); doi: 10.1117/12.175836
X-Ray Lithography--Subsystems
Proc. SPIE 2194, Neon dense plasma focus point x-ray source for <=0.25 um lithography, 0000 (13 May 1994); doi: 10.1117/12.175797
Proc. SPIE 2194, Spectral effects on x-ray lithography, 0000 (13 May 1994); doi: 10.1117/12.175798
Proc. SPIE 2194, Synchrotron irradiation stability of x-ray masks utilizing stress-free W-Ti absorbers and SiC membranes, 0000 (13 May 1994); doi: 10.1117/12.175799
Proc. SPIE 2194, Development of a membrane-etch wet station for x-ray masks, 0000 (13 May 1994); doi: 10.1117/12.175800
Proc. SPIE 2194, Optimization of ESCAP photoresist for x-ray lithography, 0000 (13 May 1994); doi: 10.1117/12.175801
Proc. SPIE 2194, Reactive-ion etching of tungsten for high-resolution x-ray masks, 0000 (13 May 1994); doi: 10.1117/12.175802
Proc. SPIE 2194, Comparison of dry-etch approaches for tungsten patterning, 0000 (13 May 1994); doi: 10.1117/12.175803
Proc. SPIE 2194, Effect of condenser mirror surface roughness on partially coherent image formation in proximity x-ray lithography, 0000 (13 May 1994); doi: 10.1117/12.175804
Proc. SPIE 2194, Modeling of a positive chemically amplified photoresist for x-ray lithography, 0000 (13 May 1994); doi: 10.1117/12.175805
Proc. SPIE 2194, 1-kW x-pinch soft x-ray source, 0000 (13 May 1994); doi: 10.1117/12.175806
Proc. SPIE 2194, Total evaluation of W-Ti absorber for x-ray mask, 0000 (13 May 1994); doi: 10.1117/12.175808
Proc. SPIE 2194, Soft x-ray output from the spherical pinch plasma radiation source (SPX II) for microlithography applications, 0000 (13 May 1994); doi: 10.1117/12.175809
Proc. SPIE 2194, Application and experimental verification of finite element modeling of friction effects for x-ray lithography mask mounts, 0000 (13 May 1994); doi: 10.1117/12.175810
Papers of Special Interest
Proc. SPIE 2194, Cell projection electron-beam lithography, 0000 (13 May 1994); doi: 10.1117/12.175811
Electon-Beam Lithography
Proc. SPIE 2194, Miniature electron microscopes for lithography, 0000 (13 May 1994); doi: 10.1117/12.175812
Proc. SPIE 2194, Pulsed electron-beam source for high-resolution high-throughput microlithography, 0000 (13 May 1994); doi: 10.1117/12.175813
Proc. SPIE 2194, Techniques for determination of the absorbed energy density function in electron-beam lithography, 0000 (13 May 1994); doi: 10.1117/12.175814
Proc. SPIE 2194, Very simple data processing system for deep submicron nanofabrication, 0000 (13 May 1994); doi: 10.1117/12.175815
Electron-Beam Lithography: Proximity Effects
Proc. SPIE 2194, Rule-based approach to e-beam and process-induced proximity effect correction for phase-shifting mask fabrication, 0000 (13 May 1994); doi: 10.1117/12.175817
Proc. SPIE 2194, Proximity correction of high-dosed frame with PROXECCO, 0000 (13 May 1994); doi: 10.1117/12.175818
Proc. SPIE 2194, Direct inclusion of the proximity effect in the calculation of kinoforms, 0000 (13 May 1994); doi: 10.1117/12.175819
Proc. SPIE 2194, Improved proximity correction algorithm for electron-beam lithography, 0000 (13 May 1994); doi: 10.1117/12.175820
Resists for Manufacturing
Proc. SPIE 2194, Chemically amplified negative resist for e-beam fabrication of x-ray masks, 0000 (13 May 1994); doi: 10.1117/12.175821
Proc. SPIE 2194, Dry-etch characteristics of chemically amplified and onium-salt-sensitized electron-beam resists, 0000 (13 May 1994); doi: 10.1117/12.175822
Proc. SPIE 2194, Vertical lithography: controlling resist profiles in optical lithography with a large area electron beam, 0000 (13 May 1994); doi: 10.1117/12.175823
Proc. SPIE 2194, Submicron e-beam lithography process using an overcoating conducting polymer for the reduction of beam charging effects on lithium niobate and quartz, 0000 (13 May 1994); doi: 10.1117/12.175824
Proc. SPIE 2194, Characterization of safe solvent PMMA resist variables for electron-beam application, 0000 (13 May 1994); doi: 10.1117/12.175825
Ion-Beam Lithography
Proc. SPIE 2194, Ion projection: the successor to optical lithography, 0000 (13 May 1994); doi: 10.1117/12.175827
Proc. SPIE 2194, Advances in focused ion-beam repair of opaque defects, 0000 (13 May 1994); doi: 10.1117/12.175828
Proc. SPIE 2194, Recent progress in gas field ion source technology, 0000 (13 May 1994); doi: 10.1117/12.175829
X-Ray Lithography--Subsystems
Proc. SPIE 2194, Interferometric investigation of x-ray mask fabrication distortions, 0000 (13 May 1994); doi: 10.1117/12.175830
Proc. SPIE 2194, High-sensitivity x-ray mask damage studies employing holographic gratings and phase-shifting interferometry, 0000 (13 May 1994); doi: 10.1117/12.175831
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