PROCEEDINGS VOLUME 2254
PHOTOMASK JAPAN '94 | 22-22 APRIL 1994
Photomask and X-Ray Mask Technology
Editor(s): Hideo Yoshihara
Editor Affiliations +
PHOTOMASK JAPAN '94
22-22 April 1994
Kawasaki City, Kanagawa, Japan
Mask Fabrication
Fu-Chang Lo, Giang T. Dao, Marc Berube, Nelson Tam, Robert F. Hainsey, Jeff N. Farnsworth, Jim DeWitt, Rosanne LaVoy, Susan V. Daugherty
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191918
Morihisa Hoga, Yasuhiro Koizumi, Fumio Mizuno, H. Nakaune
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191927
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191936
Masahiro Uraguchi, Hideaki Hasegawa, Yuhichi Yamamoto, Hideyuki Kanemitsu, Eiichi Hoshino, Akira Morishige
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191946
Mutsuo Kataoka, S. Kanetsuki, Kazutaka Tamura, Kyoichi Yamamoto, M. Asano
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191956
Phase-shift Mask I
Yoshihiro Saito, Susumu Kawada, Tsuneo Yamamoto, Atsushi Hayashi, Akihiko Isao, Yasuo Tokoro
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191962
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191963
Hideaki Mitsui, Hideki Suda, Yoichi Yamaguchi, Kenji Matsumoto, Masaru Mitsui, S. Mitsui, Yasushi Okubo
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191964
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191965
Masks for X-ray and E-beam I
Yoshio Yamashita, Hiroshi Okuyama, Kinya Ashikaga, Tomiyuki Arakawa
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191919
Hitoshi Noguchi, Meguru Kashida, Yoshihiro Kubota
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191920
Yasunao Saitoh, Ikuo Okada, Misao Sekimoto, Takashi Ohkubo, Tadahito Matsuda
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191921
Hidetoshi Satoh, Yoshinori Nakayama, Norio Saitou, T. Kagami
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191922
Metrology and Equipment
C. M. Rose, Darryl Peters, Herbert A. Waggener, David M. Walker
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191923
Nobuo Shimazu, Takashi Watanabe, Tetsuo Morosawa, Hirofumi Morita, Youichi Kuriyama, Tatsuya Kunioka
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191924
Taro Ototake, Masaya Iwasaki
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191925
Diane K. Stewart, Thomas K. Olson, Andrew F. Doyle
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191926
Photomask Process and Materials
Yoshiyuki Tanaka, M. Matsuda, Tsuyoshi Tanaka, Ryoichi Kobayashi
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191928
Emiko Sugiura, Hisashi Watanabe, Tadashi Imoriya, Yoshihiro Todokoro
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191929
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191930
Alberto Moel, Yoshio Gomei
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191931
Ki Jong Kim, Kun-Taek Park, Jung K. Oh, Hong S. Chun
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191932
Keisuke Tsudaka, Minoru Sugawara, Hiroichi Kawahira, Akihiro Ogura, Satoru Nozawa
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191933
Akira Tamura, Masaji Yonezawa, Mitsuyoshi Sato, T. Okuyama
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191934
Phase-shift mask II
Hiroshi Mohri, Keiji Hashimoto, T. Tominaga, Yasutaka Morikawa, Junji Fujikawa, Hiroyuki Inomata, Y. Iimura, Wataru Gotoh, Masahiro Takahashi, et al.
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191935
Hiroyuki Miyashita, Minoru Naitoh, Toshiharu Nishimura, T. Tomita, M. Katoh, Kazuo Suwa, Masa-aki Kurihara, N. Tarumoto, D. Tagaya, et al.
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191937
Toshifumi Yokoyama, Y. Suzuki, K. Hanzawa, K. Oda, Katsuhide Tsuchiya, Shigeru Noguchi, Minoru Komada, Hisashi Moro-oka
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191938
Akihiro Ogura, Hiroichi Kawahira, Minoru Sugawara, Keisuke Tsudaka, Takehiko Gunji, Satoru Nozawa
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191939
Shinji Ishida, Yohko Iwabuchi, Tadao Yasuzato, Kunihiko Kasama
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191940
Haruhiko Kusunose, Hiroyuki Nakae, Junji Miyazaki, Nobuyuki Yoshioka, Hiroaki Morimoto, Keiichi Murayama, Katsuhiro Tsukamoto
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191941
Masks for X-ray and E-beam II
Tsuneaki Ohta, R. Kumar, Shuichi Noda, Masanori Kasai, Hiroshi Hoga
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191942
Tsutomu Shoki, Yoichi Yamaguchi, Noromichi Annaka, Isao Amemiya
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191943
Tadashi Matsuo, Nobuhiko Fukuhara, F. Noguchi, S. Tanaka
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191944
Masanori Suzuki, Mitsuo Fukuda, F. Omata, H. Tsuyuzaki, Takashi Ohkubo, Ikuo Okada
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191945
Inspection, Repair, and Metrology
Mircea V. Dusa, Erik H. Rauch
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191947
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191948
Yair Eran, Gideon Rossman
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191949
Katsuhiro Takushima, Hideyuki Jinbo, Taro Saito, Itsuji Ashida, Yoshio Tanaka
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191950
Cleaning and Pelliclization
Carl Johnson, Abdu Boudour, Eric T. Chase
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191951
Naofumi Inoue, Hiroaki Nakagawa, Masahiro Kondou
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191952
Toru Shirasaki, S. Kawakami, Y. Hamada, Y. Nagata, Meguru Kashida, Yoshihiro Kubota
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191953
Design automation
Ming-Huei Lin
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191954
Touru Miyauchi, Kenichi Kobayashi, Kazumasa Shigematsu
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191955
Equipment
Charles S. Biechler, C. M. Rose, David M. Walker, Akiyoshi Suzuki, Kazuhiro Takahashi
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191957
H. A. Khoury
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191958
Atsunobu Une, Masatoshi Oda, F. Omata, Akinori Shibayama
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191959
Kazuhiro Honda, Hiroshi Shimada, S. Norioka, Tatsuya Matsuo
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191960
Proceedings Volume Photomask and X-Ray Mask Technology, (1994) https://doi.org/10.1117/12.191961
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