PROCEEDINGS VOLUME 2437
SPIE'S 1995 SYMPOSIUM ON MICROLITHOGRAPHY | 19-24 FEBRUARY 1995
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
IN THIS VOLUME

0 Sessions, 43 Papers, 0 Presentations
XRL Tooling  (2)
SPIE'S 1995 SYMPOSIUM ON MICROLITHOGRAPHY
19-24 February 1995
Santa Clara, CA, United States
Process Control in X-Ray Lithography
Proc. SPIE 2437, Experimental x-ray process latitude evaluation using E-D tree analysis, 0000 (19 May 1995); doi: 10.1117/12.209150
Proc. SPIE 2437, Electrical linewidth measurements and simulations studying the effect of dose and gap on exposure latitude in x-ray lithography, 0000 (19 May 1995); doi: 10.1117/12.209161
Proc. SPIE 2437, Effect of the high-contrast-mask sidewall slope on deep x-ray lithography, 0000 (19 May 1995); doi: 10.1117/12.209171
Proc. SPIE 2437, Resist contrast requirement for sub-0.25-um lithography, 0000 (19 May 1995); doi: 10.1117/12.209180
Proc. SPIE 2437, Replicating characteristics by SR lithography, 0000 (19 May 1995); doi: 10.1117/12.209188
Proc. SPIE 2437, Electron-beam and x-ray lithographic characteristics of the optical resist ARCH, 0000 (19 May 1995); doi: 10.1117/12.209189
X-Ray Lithography Applications
Proc. SPIE 2437, Sub-0.1-um NMOS transistors fabricated using point-source x-ray lithography, 0000 (19 May 1995); doi: 10.1117/12.209191
Proc. SPIE 2437, Micromachining using Helios, 0000 (19 May 1995); doi: 10.1117/12.209192
XRL Tooling
Proc. SPIE 2437, Magnification correction for proximity x-ray lithography, 0000 (19 May 1995); doi: 10.1117/12.209154
Proc. SPIE 2437, Quantitative evaluation of in-plane deformation due to mask holding in x-ray lithography, 0000 (19 May 1995); doi: 10.1117/12.209155
E-Beam Lithogrpahy
Proc. SPIE 2437, Performance of IBM's EL-4 e-beam lithography system, 0000 (19 May 1995); doi: 10.1117/12.209156
Proc. SPIE 2437, 0.25-um lithography using a 50-kV shaped electron-beam vector scan system, 0000 (19 May 1995); doi: 10.1117/12.209157
Proc. SPIE 2437, New electron optical column with large field for nanometer e-beam lithography system, 0000 (19 May 1995); doi: 10.1117/12.209158
Proc. SPIE 2437, Conductivity and reproducibility of e-beam-induced deposited tungsten lines, 0000 (19 May 1995); doi: 10.1117/12.209159
Proc. SPIE 2437, Exposure and characterization of superstructure gratings for DBR lasers generated by direct write electron-beam lithography, 0000 (19 May 1995); doi: 10.1117/12.209160
Proc. SPIE 2437, High-energy (100-keV) e-beam lithography applied for fabrication of deep-submicrometer SAW devices on lithium niobate and quartz, 0000 (19 May 1995); doi: 10.1117/12.209162
Advanced Mask Fabrication
Proc. SPIE 2437, Focused ion beam deposition of new materials: dielectric films for device modification and mask repair and tantalum films for x-ray mask repair, 0000 (19 May 1995); doi: 10.1117/12.209163
Proc. SPIE 2437, EBR900 processes in e-beam and laser beam lithographies for photomask fabrication, 0000 (19 May 1995); doi: 10.1117/12.209164
Proc. SPIE 2437, Approach to fabricating defect-free x-ray masks, 0000 (19 May 1995); doi: 10.1117/12.209165
Proc. SPIE 2437, High-resolution repair of photomasks using a deep-UV-laser-based defect repair system, 0000 (19 May 1995); doi: 10.1117/12.209166
EUV Lithography
Proc. SPIE 2437, Extreme UV resist technology: the limits of silylated resist resolution, 0000 (19 May 1995); doi: 10.1117/12.209168
Proc. SPIE 2437, Printability of substrate and absorber defects on extreme ultraviolet lithographic masks, 0000 (19 May 1995); doi: 10.1117/12.209169
Proc. SPIE 2437, Optical system design issues in development of projection camera for EUV lithography, 0000 (19 May 1995); doi: 10.1117/12.209170
Proc. SPIE 2437, At-wavelength testing of optics for EUV, 0000 (19 May 1995); doi: 10.1117/12.209172
Poster Session
Proc. SPIE 2437, Characteristics of the x-ray/EUV emission from spherically pinched and vacuum spark sources, 0000 (19 May 1995); doi: 10.1117/12.209173
Proc. SPIE 2437, Geometry of x-ray point source proximity printing, Part I: linewidth control., 0000 (19 May 1995); doi: 10.1117/12.209174
Proc. SPIE 2437, Experimental study of proximity effect corrections in electron-beam lithography, 0000 (19 May 1995); doi: 10.1117/12.209175
Proc. SPIE 2437, Assessment of silicon carbide x-ray mask overlay performance in the IBM Advanced Lithography Facility x-ray stepper, 0000 (19 May 1995); doi: 10.1117/12.209176
Proc. SPIE 2437, Application of smoothing techniques to relief-type resist surfaces generated by direct write electron-beam lithography, 0000 (19 May 1995); doi: 10.1117/12.209177
Proc. SPIE 2437, Low-voltage electron-beam lithography linked to photolithography, 0000 (19 May 1995); doi: 10.1117/12.209178
Proc. SPIE 2437, Creation of a topology in metal phthalocyanine layers, 0000 (19 May 1995); doi: 10.1117/12.209179
Proc. SPIE 2437, Master masks for big patterns by electron-beam lithography, 0000 (19 May 1995); doi: 10.1117/12.209181
Proc. SPIE 2437, Study of EUV contact lithography with a compact laser plasma source, 0000 (19 May 1995); doi: 10.1117/12.209182
Process Control in X-Ray Lithography
Proc. SPIE 2437, Resolution and components of critical dimension variation in x-ray lithography, 0000 (19 May 1995); doi: 10.1117/12.209183
Poster Session
Proc. SPIE 2437, Repair of photo- and x-ray masks by LCVD using nitrogen laser, 0000 (19 May 1995); doi: 10.1117/12.209184
Advanced Mask Fabrication
Proc. SPIE 2437, Toward a commercial gas field ion source, 0000 (19 May 1995); doi: 10.1117/12.209185
Poster Session
Proc. SPIE 2437, Transfer mask for high-aspect-ratio microlithography, 0000 (19 May 1995); doi: 10.1117/12.209186
E-Beam Lithogrpahy
Proc. SPIE 2437, Error measure comparison of currently employed dose-modulation schemes for e-beam proximity effect control, 0000 (19 May 1995); doi: 10.1117/12.209187
Plenary Session
Proc. SPIE 2437, Lithography and the future of Moore's law, 0000 (19 May 1995); doi: 10.1117/12.209151
Proc. SPIE 2437, Lithography for ULSI, 0000 (19 May 1995); doi: 10.1117/12.209152
Proc. SPIE 2437, SEMATECH and the national technology roadmap: needs and challenges, 0000 (19 May 1995); doi: 10.1117/12.209153
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