PROCEEDINGS VOLUME 2621
15TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT '95 | 20-22 SEPTEMBER 1995
15th Annual BACUS Symposium on Photomask Technology and Management
15TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT '95
20-22 September 1995
Santa Clara, CA, United States
Photomask Pattern Generation
Proc. SPIE 2621, Proximity correction for e-beam lithography, 0000 (8 December 1995); doi: 10.1117/12.228169
Proc. SPIE 2621, Manufacturing performance of the ALTA 3000 mask laser writer, 0000 (8 December 1995); doi: 10.1117/12.228180
Proc. SPIE 2621, Investigation of MEBES 4500 system composite performance, 0000 (8 December 1995); doi: 10.1117/12.228189
Proc. SPIE 2621, Production performance of the EBES4 electron-beam lithography system, 0000 (8 December 1995); doi: 10.1117/12.228200
Proc. SPIE 2621, Integration of an advanced laser writer into a manufacturing environment, 0000 (8 December 1995); doi: 10.1117/12.228207
Photomask Resist and Process
Proc. SPIE 2621, Evaluation of commercial and experimental resist materials for use in MEBES mask making, 0000 (8 December 1995); doi: 10.1117/12.228215
Proc. SPIE 2621, Plasma etching of chromium films in the fabrication of photomasks, 0000 (8 December 1995); doi: 10.1117/12.228216
Proc. SPIE 2621, Novel techniques on photomask blanks enhancement for the laser reticle writer, 0000 (8 December 1995); doi: 10.1117/12.228217
Proc. SPIE 2621, Contributions by blank vendors to critical dimension and defect errors, 0000 (8 December 1995); doi: 10.1117/12.228160
Proc. SPIE 2621, Investigation of GMC for CD uniformity benefits, 0000 (8 December 1995); doi: 10.1117/12.228161
Inspection and Repair
Proc. SPIE 2621, Photomask production integration of KLA STARlight 300 system, 0000 (8 December 1995); doi: 10.1117/12.228162
Proc. SPIE 2621, Current technological status of spatial-filtering method for soft defect detection, 0000 (8 December 1995); doi: 10.1117/12.228163
Proc. SPIE 2621, Inspection system qualification and integration into the mask manufacturing environment, 0000 (8 December 1995); doi: 10.1117/12.228164
Proc. SPIE 2621, Printability of laser mask repairs at deep UV, 0000 (8 December 1995); doi: 10.1117/12.228165
Proc. SPIE 2621, Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes, 0000 (8 December 1995); doi: 10.1117/12.228166
Metrology
Proc. SPIE 2621, 1995 mask industry quality assessment, 0000 (8 December 1995); doi: 10.1117/12.228167
Proc. SPIE 2621, Identifying the components of mask image-size variation, 0000 (8 December 1995); doi: 10.1117/12.228168
Proc. SPIE 2621, Repeatable mask metrology for next-generation lithography tools, 0000 (8 December 1995); doi: 10.1117/12.228170
Proc. SPIE 2621, Improved estimates of the range of errors on photomasks using measured values of skewness and kurtosis, 0000 (8 December 1995); doi: 10.1117/12.228171
Proc. SPIE 2621, Method to produce a reference grid artifact for matching a MEBES 4500 system to an external reference, 0000 (8 December 1995); doi: 10.1117/12.228172
Advanced Topics in Photomasks
Proc. SPIE 2621, Next-generation mask strategy: accuracy and mask-size survey and discussion results at PMJ '95 rump session, 0000 (8 December 1995); doi: 10.1117/12.228173
Proc. SPIE 2621, Ergonomic risks in mask manufacturing and methods to combat them, 0000 (8 December 1995); doi: 10.1117/12.228174
Proc. SPIE 2621, Advances in stencil mask technology: control of distortion in ion-projection lithography masks, 0000 (8 December 1995); doi: 10.1117/12.228175
Proc. SPIE 2621, Fabrication processes for SCALPEL mask blanks, 0000 (8 December 1995); doi: 10.1117/12.228176
Proc. SPIE 2621, 24"x 20" precision photomasks manufacture, 0000 (8 December 1995); doi: 10.1117/12.228177
Addtional Paper
Proc. SPIE 2621, Quality assurance of embedded attenuated phase-shift masks, 0000 (8 December 1995); doi: 10.1117/12.228178
Phase-Shifting Masks
Proc. SPIE 2621, Actual use of phase-shift mask, 0000 (8 December 1995); doi: 10.1117/12.228179
Proc. SPIE 2621, Embedded attenuating phase-shift mask: printability of defects, 0000 (8 December 1995); doi: 10.1117/12.228181
Proc. SPIE 2621, Side-lobe suppression in halftone PSM with optical proximity correction, 0000 (8 December 1995); doi: 10.1117/12.228182
Proc. SPIE 2621, Deep-UV attenuated phase-shift mask for a quarter-micrometer photolithography, 0000 (8 December 1995); doi: 10.1117/12.228183
Poster Session
Proc. SPIE 2621, Large-area high-quality photomasks, 0000 (8 December 1995); doi: 10.1117/12.228184
Proc. SPIE 2621, Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems, 0000 (8 December 1995); doi: 10.1117/12.228185
Proc. SPIE 2621, Evaluation of thin PBS resist films for improved feature linearity, 0000 (8 December 1995); doi: 10.1117/12.228186
Proc. SPIE 2621, Shifter slope variation effect of embedded half-tone phase-shift masks, 0000 (8 December 1995); doi: 10.1117/12.228187
Proc. SPIE 2621, Printability of opaque repairs for DUV EPSM clear defects at sub-half-micrometer design rules, 0000 (8 December 1995); doi: 10.1117/12.228188
Proc. SPIE 2621, Masks for laser ablation technology: new requirements and challenges, 0000 (8 December 1995); doi: 10.1117/12.228190
Proc. SPIE 2621, Quality assurance of dielectric masks for laser ablation technology, 0000 (8 December 1995); doi: 10.1117/12.228191
Proc. SPIE 2621, Further work in optimizing PBS: is it capable of meeting specifications for 256 Mbit DRAM reticle manufacturing?, 0000 (8 December 1995); doi: 10.1117/12.228192
Proc. SPIE 2621, X-ray mask fabrication techniques for micromachining, 0000 (8 December 1995); doi: 10.1117/12.228193
Proc. SPIE 2621, Mix-and-match lithography technology on 6-in. wafers for nanofabrication, 0000 (8 December 1995); doi: 10.1117/12.228194
Proc. SPIE 2621, Powerful inspection and metrology tool for micro- and nanofabrication, 0000 (8 December 1995); doi: 10.1117/12.228195
Proc. SPIE 2621, Low-cost photomask inspection system, 0000 (8 December 1995); doi: 10.1117/12.228196
Proc. SPIE 2621, Application of alternating PSM to sub-quarter-micrometer technology using i-line lithography, 0000 (8 December 1995); doi: 10.1117/12.228197
Proc. SPIE 2621, Attenuated phase-shifting mask specification with modified beam illumination, 0000 (8 December 1995); doi: 10.1117/12.228198
Proc. SPIE 2621, Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity, 0000 (8 December 1995); doi: 10.1117/12.228199
Proc. SPIE 2621, Predicting mask performance by numerical simulation, 0000 (8 December 1995); doi: 10.1117/12.228201
Proc. SPIE 2621, Initial evaluation result of DNQ-novolak resist system for advanced e-beam reticle fabrication, 0000 (8 December 1995); doi: 10.1117/12.228202
Proc. SPIE 2621, Comprehensive simulation study of the photomask defects printability, 0000 (8 December 1995); doi: 10.1117/12.228203
Proc. SPIE 2621, Chromium-based attenuated embedded phase-shift photomask blanks for use in 1X lithography, 0000 (8 December 1995); doi: 10.1117/12.228204
Proc. SPIE 2621, Resist charging in electron-beam lithography, 0000 (8 December 1995); doi: 10.1117/12.228205
Proc. SPIE 2621, How to improve MEBES-III Write times by improving your MEBES-III directory management discipline, enabled by high-speed networking software, 0000 (8 December 1995); doi: 10.1117/12.228206
The Optimum Solution: OPC and Beyond
Proc. SPIE 2621, Fast sparse aerial-image calculation for OPC, 0000 (8 December 1995); doi: 10.1117/12.228208
Proc. SPIE 2621, Fast EB-PEC system for 0.25-um device reticle fabrication using a variable shaped beam machine, 0000 (8 December 1995); doi: 10.1117/12.228209
Proc. SPIE 2621, Hierarchical proximity correction using CAPROX, 0000 (8 December 1995); doi: 10.1117/12.228210
Proc. SPIE 2621, Intelligent ground-rule-based inspection of OPC masks, 0000 (8 December 1995); doi: 10.1117/12.228211
Proc. SPIE 2621, Simplified rule generation for automated rules-based optical enhancement, 0000 (8 December 1995); doi: 10.1117/12.228212
Proc. SPIE 2621, Good OPC, where will this drive mask CD tolerance and mask grid size, 0000 (8 December 1995); doi: 10.1117/12.228213
Proc. SPIE 2621, Manufacturing and inspection of OPC and PSM masks, 0000 (8 December 1995); doi: 10.1117/12.228214