Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes
Improved estimates of the range of errors on photomasks using measured values of skewness and kurtosis
Method to produce a reference grid artifact for matching a MEBES 4500 system to an external reference
Next-generation mask strategy: accuracy and mask-size survey and discussion results at PMJ '95 rump session
Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems
Further work in optimizing PBS: is it capable of meeting specifications for 256 Mbit DRAM reticle manufacturing?
How to improve MEBES-III Write times by improving your MEBES-III directory management discipline, enabled by high-speed networking software