PROCEEDINGS VOLUME 2640
MICROMACHINING AND MICROFABRICATION | 23-25 OCTOBER 1995
Microlithography and Metrology in Micromachining
MICROMACHINING AND MICROFABRICATION
23-25 October 1995
Austin, TX, United States
Micromachining Technology I
Proc. SPIE 2640, Overview of the miniaturization technologies, 0000 (26 September 1995); doi: 10.1117/12.222632
Proc. SPIE 2640, Generic technology, measurement, and standards issues in micromachining and microfabrication, 0000 (26 September 1995); doi: 10.1117/12.222644
Proc. SPIE 2640, Microanalysis to nanoanalysis: analytical techniques for chemical characterization of micrometer- to nanometer-scale structures, 0000 (26 September 1995); doi: 10.1117/12.222653
Metrology in Microfabrication I
Proc. SPIE 2640, X-ray microlithography exposure system for high aspect ratio micromachining, 0000 (26 September 1995); doi: 10.1117/12.222654
Proc. SPIE 2640, Micromechanical cantilevers and scanning probe microscopes, 0000 (26 September 1995); doi: 10.1117/12.222655
Proc. SPIE 2640, Optical methods for characterization of MEMS device motion, 0000 (26 September 1995); doi: 10.1117/12.222656
Proc. SPIE 2640, Microfabrication of channel electron multipliers, 0000 (26 September 1995); doi: 10.1117/12.222657
Proc. SPIE 2640, E-beam lithography: a suitable technology for fabrication of high-accuracy 2D and 3D surface profiles, 0000 (26 September 1995); doi: 10.1117/12.222658
Micromachining Technology II
Proc. SPIE 2640, 1/N Feynman machines as a path to ultraminiaturization?, 0000 (26 September 1995); doi: 10.1117/12.222635
Proc. SPIE 2640, Challenge of automotive sensors, 0000 (26 September 1995); doi: 10.1117/12.222636
Metrology in Microfabrication II
Proc. SPIE 2640, FIB 601 focused ion beam fabrication of micron-sized apertures for the NASA AXAF x-ray telescope prelaunch calibration, 0000 (26 September 1995); doi: 10.1117/12.222637
Proc. SPIE 2640, Very high aspect ratio wafer-free silicon micromechanical structures, 0000 (26 September 1995); doi: 10.1117/12.222638
Proc. SPIE 2640, Process optimization of single-coat positive photoresist for thick film applications, 0000 (26 September 1995); doi: 10.1117/12.222639
Proc. SPIE 2640, Design and fabrication of micromachined electron guns (MEGs) usinga multiple-level planar tungsten process, 0000 (26 September 1995); doi: 10.1117/12.222640
Proc. SPIE 2640, Application of the prototype NIST SRM 2090A SEM magnification standard in a manufacturing environment, 0000 (26 September 1995); doi: 10.1117/12.222641
Metrology in Microfabrication III
Proc. SPIE 2640, Fabrication and testing of microchannel heat exchangers, 0000 (26 September 1995); doi: 10.1117/12.222642
Proc. SPIE 2640, Rapid fabrication of molds by mechanical micromilling: process development, 0000 (26 September 1995); doi: 10.1117/12.222643
Proc. SPIE 2640, Integrated optical bench for a CO2 gas sensor, 0000 (26 September 1995); doi: 10.1117/12.222645
Proc. SPIE 2640, Low-temperature process for very high aspect ratio silicon microstructures using SOG etch mask, 0000 (26 September 1995); doi: 10.1117/12.222646
Proc. SPIE 2640, Thin metal film thermal microsensors, 0000 (26 September 1995); doi: 10.1117/12.222647
Proc. SPIE 2640, Three-dimensional functional integration in silicon using confined selective epitaxial growth, 0000 (26 September 1995); doi: 10.1117/12.222648
Metrology in Microfabrication IV
Proc. SPIE 2640, Fabrication of miniaturized electrostatic deflectors using LIGA, 0000 (26 September 1995); doi: 10.1117/12.222649
Proc. SPIE 2640, Fabricating subcollimating grids for an x-ray solar imaging spectrometer using LIGA techniques, 0000 (26 September 1995); doi: 10.1117/12.222650
Proc. SPIE 2640, Fine pitch grids for an x-ray solar imaging spectrometer fabricated by optical lithography and XeF2 etching, 0000 (26 September 1995); doi: 10.1117/12.222651
Proc. SPIE 2640, Effects of doping on the dynamic mechanical response of semiconductor cantilevers to electrostatic forces, 0000 (26 September 1995); doi: 10.1117/12.222652
Plenary Papers
Proc. SPIE 2640, Projection displays and MEMS: timely convergence for a bright future, 0000 (26 September 1995); doi: 10.1117/12.222633
Proc. SPIE 2640, Recent trends in silicon micromachining technology, 0000 (26 September 1995); doi: 10.1117/12.222634
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