PROCEEDINGS VOLUME 2723
SPIE'S 1996 INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY | 10-15 MARCH 1996
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
SPIE'S 1996 INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY
10-15 March 1996
Santa Clara, CA, United States
Future Lithography Technologies
Proc. SPIE 2723, Patterning ULSI circuits, 0000 (27 May 1996); doi: 10.1117/12.240458
Proc. SPIE 2723, University-industry relations: what do we do now?, 0000 (27 May 1996); doi: 10.1117/12.240469
Proc. SPIE 2723, Science and technology policy in the 104th Congress, 0000 (27 May 1996); doi: 10.1117/12.240480
Proc. SPIE 2723, Optical system for high-throughput EUV lithography, 0000 (27 May 1996); doi: 10.1117/12.240487
Proc. SPIE 2723, Silicon oxide deposition using a gallium-focused ion beam, 0000 (27 May 1996); doi: 10.1117/12.240495
Proc. SPIE 2723, Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool, 0000 (27 May 1996); doi: 10.1117/12.240496
Proc. SPIE 2723, Formation of submicrometer current-blocking layer for high-power GaAs/AlGaAs quantum wire array laser, 0000 (27 May 1996); doi: 10.1117/12.240497
Proc. SPIE 2723, Conception of optimal designing of optical column for ion projection lithography, 0000 (27 May 1996); doi: 10.1117/12.240498
Advanced Masks: Electron-Beam Writers, Image Placement, and CD Improvements
Proc. SPIE 2723, Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography, 0000 (27 May 1996); doi: 10.1117/12.240499
Proc. SPIE 2723, Position measurement of high-energy e-beams for pattern placement improvement, 0000 (27 May 1996); doi: 10.1117/12.240459
Proc. SPIE 2723, New electron-beam mask writing system for 0.25-um lithography, 0000 (27 May 1996); doi: 10.1117/12.240460
Proc. SPIE 2723, Development of two new positive DUV photoresists for use with direct-write e-beam lithography, 0000 (27 May 1996); doi: 10.1117/12.240461
Proc. SPIE 2723, CD uniformity of photomasks written with high-voltage variable-shaped e beam, 0000 (27 May 1996); doi: 10.1117/12.240462
Critical Parameter Control in Electron-Beam Lithography: Proximity Correction and Image Placement
Proc. SPIE 2723, Pattern-density-dependent contrast in commonly used dose-equalization schemes, 0000 (27 May 1996); doi: 10.1117/12.240463
Proc. SPIE 2723, Mark topography for alignment and registration in projection electron lithography, 0000 (27 May 1996); doi: 10.1117/12.240464
Proc. SPIE 2723, Hierarchical e-beam proximity correction in mask making, 0000 (27 May 1996); doi: 10.1117/12.240465
Proc. SPIE 2723, Simulation and modeling of electron-beam lithography for delineating 0.2-um line and space patterns, 0000 (27 May 1996); doi: 10.1117/12.240466
Electron-Beam Lithography: Applications
Proc. SPIE 2723, Fine-pitch control in EB lithography for semiconductor laser grating formation, 0000 (27 May 1996); doi: 10.1117/12.240467
Proc. SPIE 2723, Mix-and-match lithography processes for 0.1-um MOS transistor device fabrication, 0000 (27 May 1996); doi: 10.1117/12.240468
X-Ray Proximity Lithography: Mask Technology
Proc. SPIE 2723, X-ray mask fabrication advancements at the Microlithographic Mask Development Center, 0000 (27 May 1996); doi: 10.1117/12.240470
Proc. SPIE 2723, Development of x-ray mask in Taiwan, 0000 (27 May 1996); doi: 10.1117/12.240471
Proc. SPIE 2723, X-ray mask image-placement studies at the Microlithography Mask Development Center, 0000 (27 May 1996); doi: 10.1117/12.240472
Proc. SPIE 2723, Novel x-ray mask inspection tool based on transmission x-ray conversion microscope, 0000 (27 May 1996); doi: 10.1117/12.240473
X-Ray Proximity Lithography: Resists and Applications
Proc. SPIE 2723, Application of SR lithography to 0.14-um device fabrication, 0000 (27 May 1996); doi: 10.1117/12.240474
Proc. SPIE 2723, X-ray exposure in the manufacture of sub-150-nm gate lines, 0000 (27 May 1996); doi: 10.1117/12.240475
Proc. SPIE 2723, Importance of chemistry at the resist-wafer interface for mechanical and lithographic adhesion, 0000 (27 May 1996); doi: 10.1117/12.240476
Proc. SPIE 2723, New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile, 0000 (27 May 1996); doi: 10.1117/12.240477
Proc. SPIE 2723, Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores, 0000 (27 May 1996); doi: 10.1117/12.240478
X-Ray Proximity Lithography: Point Sources
Proc. SPIE 2723, Spherical pinch (soft x ray/EUV) and vacuum spark (soft x ray) for microlithography, 0000 (27 May 1996); doi: 10.1117/12.240479
Proc. SPIE 2723, Alternative soft x-ray source for step-and-scan lithography, 0000 (27 May 1996); doi: 10.1117/12.240481
Posters--Monday
Proc. SPIE 2723, Debrisless laser-produced x-ray source with a gas puff target, 0000 (27 May 1996); doi: 10.1117/12.240482
Proc. SPIE 2723, Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As2S3, 0000 (27 May 1996); doi: 10.1117/12.240483
Proc. SPIE 2723, Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure, 0000 (27 May 1996); doi: 10.1117/12.240484
Proc. SPIE 2723, Geometry of x-ray point source proximity printing, part II: overlay effects, 0000 (27 May 1996); doi: 10.1117/12.240485
Proc. SPIE 2723, Experiment and simulation of e-beam direct writing over topography, 0000 (27 May 1996); doi: 10.1117/12.240486
Proc. SPIE 2723, Enhanced defect inspection method for x-ray masks, 0000 (27 May 1996); doi: 10.1117/12.240488
Proc. SPIE 2723, Thick PMMA layer formation as an x-ray imaging medium for micromachining, 0000 (27 May 1996); doi: 10.1117/12.240489
Proc. SPIE 2723, Optimization of electron-beam lithography for super-low-noise HEMTs, 0000 (27 May 1996); doi: 10.1117/12.240490
Proc. SPIE 2723, Process latitude for 100-nm dimensions for e-beam lithography in SAL-601, 0000 (27 May 1996); doi: 10.1117/12.240491
Proc. SPIE 2723, Fabrication of 0.25-um electrode width SAW filters using x-ray lithography with a laser plasma source, 0000 (27 May 1996); doi: 10.1117/12.240492
Proc. SPIE 2723, Nanolithography by scanning probe stimulated development of photoresists, 0000 (27 May 1996); doi: 10.1117/12.240493
X-Ray Proximity Lithography: Point Sources
Proc. SPIE 2723, Characterization techniques for x-ray lithography sources, 0000 (27 May 1996); doi: 10.1117/12.240494
Back to Top