PROCEEDINGS VOLUME 2862
SPIE'S 1996 INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE, ENGINEERING, AND INSTRUMENTATION | 4-9 AUGUST 1996
Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays
SPIE'S 1996 INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE, ENGINEERING, AND INSTRUMENTATION
4-9 August 1996
Denver, CO, United States
Industry Overview
Proc. SPIE 2862, Silicon wafer specifications and characterization capabilities: another perspective, 0000 (4 November 1996); doi: 10.1117/12.256190
Microroughness Metrology I
Proc. SPIE 2862, Proposed methodology for characterization of microroughness-induced optical scatter instrumentation, 0000 (4 November 1996); doi: 10.1117/12.256204
Proc. SPIE 2862, Morphology of silicon wafer surfaces: a comparative study with atomic force microscopy and other techniques, 0000 (4 November 1996); doi: 10.1117/12.256205
Proc. SPIE 2862, Fast and accurate roughness characterization techniques for wafers and hard disks, 0000 (4 November 1996); doi: 10.1117/12.256206
Proc. SPIE 2862, Method to improve the accuracy of super-smooth surface scatter data, 0000 (4 November 1996); doi: 10.1117/12.256207
Microroughness Metrology II
Proc. SPIE 2862, Application of off-specular x-ray reflectivity for surface characterization, 0000 (4 November 1996); doi: 10.1117/12.256208
Proc. SPIE 2862, Surface haze in the Stokes-Mueller representation, 0000 (4 November 1996); doi: 10.1117/12.256191
Proc. SPIE 2862, Requirements and suggestions for an industrial smooth surface microroughness standards, 0000 (4 November 1996); doi: 10.1117/12.256192
Proc. SPIE 2862, Development of a physical haze and microroughness standard, 0000 (4 November 1996); doi: 10.1117/12.256193
Proc. SPIE 2862, Confocal microscope 3D visualizing method for fine surface characterization of microstructures, 0000 (4 November 1996); doi: 10.1117/12.256194
Particle and Defect Metrology I
Proc. SPIE 2862, Selection of calibration particles for scanning surface inspection systems, 0000 (4 November 1996); doi: 10.1117/12.256195
Proc. SPIE 2862, Utilization of near specular energy in the detection of surface defects, 0000 (4 November 1996); doi: 10.1117/12.256196
Particle and Defect Metrology II
Proc. SPIE 2862, Comparison of experimentally measured differential scattering cross sections of PSL spheres on flat surfaces and patterned surfaces, 0000 (4 November 1996); doi: 10.1117/12.256197
Proc. SPIE 2862, Modeling of light scattering from structures with particle contaminants, 0000 (4 November 1996); doi: 10.1117/12.256198
Flatness Metrology
Proc. SPIE 2862, Requirements of measurement equipment for silicon wafers, 0000 (4 November 1996); doi: 10.1117/12.256199
Proc. SPIE 2862, Large flat panel profiler, 0000 (4 November 1996); doi: 10.1117/12.256200
Proc. SPIE 2862, Flatness measurement by reflection moire technique, 0000 (4 November 1996); doi: 10.1117/12.256201
Proc. SPIE 2862, New method of surface characterization with a single-mode fiber to thin film coupler, 0000 (4 November 1996); doi: 10.1117/12.256202
Proc. SPIE 2862, Instrument for measuring flatness by using laser and CCD, 0000 (4 November 1996); doi: 10.1117/12.256203
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