PROCEEDINGS VOLUME 2876
MICROELECTRONIC MANUFACTURING 1996 | 16-18 OCTOBER 1996
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II
MICROELECTRONIC MANUFACTURING 1996
16-18 October 1996
Austin, TX, United States
Advanced Process Controls in Integrated Circuit Manufacturing
Proc. SPIE 2876, Advanced process control system for vertical furnaces, 0000 (13 September 1996); doi: 10.1117/12.250893
Proc. SPIE 2876, Yield effects of interactions between high polymer forming metal etch processes and postetch ash processes, 0000 (13 September 1996); doi: 10.1117/12.250903
Proc. SPIE 2876, Data-driven method for calculating limits for particle control charts, 0000 (13 September 1996); doi: 10.1117/12.250911
Proc. SPIE 2876, Tracing metal defect relating to yield for VLSI manufacturing, 0000 (13 September 1996); doi: 10.1117/12.250913
Proc. SPIE 2876, Productivity improvement through cycle time analysis, 0000 (13 September 1996); doi: 10.1117/12.250914
Proc. SPIE 2876, Characterization and in-line control of UV-transparent silicon nitride films for passivation of FLASH devices, 0000 (13 September 1996); doi: 10.1117/12.250915
Proc. SPIE 2876, Photolithography equipment control through D-optimal design, 0000 (13 September 1996); doi: 10.1117/12.250916
Proc. SPIE 2876, Dynamics of recrystallization and melting of implanted silicon at irradiation by powerful light pulses, 0000 (13 September 1996); doi: 10.1117/12.250917
Advanced Equipment Controls in Integrated Circuit Manufacturing
Proc. SPIE 2876, Micromachined sensor for in-situ monitoring of wafer state in plasma etching, 0000 (13 September 1996); doi: 10.1117/12.250918
Proc. SPIE 2876, Defect reduction through characterization and equipment modification in tungsten residue caused by deposition process, 0000 (13 September 1996); doi: 10.1117/12.250894
Proc. SPIE 2876, Systems engineering approach to maintainability optimization with case studies on ion implanters and sputtering tools, 0000 (13 September 1996); doi: 10.1117/12.250895
Proc. SPIE 2876, Optimizing process and equipment efficiency using integrated methods, 0000 (13 September 1996); doi: 10.1117/12.250896
Proc. SPIE 2876, In-line electrical probe for CD metrology, 0000 (13 September 1996); doi: 10.1117/12.250897
Proc. SPIE 2876, Platinum-related deep levels in silicon and their passivation by atomic hydrogen using a home-built automated DLTS system, 0000 (13 September 1996); doi: 10.1117/12.250898
Advanced Materials Controls in Integrated Circuit Manufacturing
Proc. SPIE 2876, Process monitoring using surface charge profiling (SCP) method, 0000 (13 September 1996); doi: 10.1117/12.250899
Proc. SPIE 2876, Noncontact sheet resistance measurements for doped polysilicon process control, 0000 (13 September 1996); doi: 10.1117/12.250900
Proc. SPIE 2876, Nondestructive testing of semiconductors and thin coatings, 0000 (13 September 1996); doi: 10.1117/12.250901
Proc. SPIE 2876, Piecewise nonlinear regression: a statistical look at lamp performance, 0000 (13 September 1996); doi: 10.1117/12.250902
Proc. SPIE 2876, Control chart design strategies for skewed data, 0000 (13 September 1996); doi: 10.1117/12.250904
Poster Session
Proc. SPIE 2876, Improving within-run uniformity of polysilicon film, 0000 (13 September 1996); doi: 10.1117/12.250905
Proc. SPIE 2876, SPC qualification strategy for CD metrology, 0000 (13 September 1996); doi: 10.1117/12.250906
Proc. SPIE 2876, Practical automatic feedback system for polyphoto CD control, 0000 (13 September 1996); doi: 10.1117/12.250907
Proc. SPIE 2876, Particle reduction study at interlayer dielectric deposition, 0000 (13 September 1996); doi: 10.1117/12.250908
Proc. SPIE 2876, Increased process stability for CVD tungsten via in-situ particle monitoring and upstream process control, 0000 (13 September 1996); doi: 10.1117/12.250909
Proc. SPIE 2876, Submicron calibration strategy for CD control, 0000 (13 September 1996); doi: 10.1117/12.250910
Plenary Paper
Proc. SPIE 2876, Productivity improvement through industrial engineering in the semiconductor industry, 0000 (13 September 1996); doi: 10.1117/12.250912
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