PROCEEDINGS VOLUME 2992
PHOTONICS WEST '97 | 8-14 FEBRUARY 1997
Excimer Lasers, Optics, and Applications
IN THIS VOLUME

0 Sessions, 18 Papers, 0 Presentations
PHOTONICS WEST '97
8-14 February 1997
San Jose, CA, United States
Excimer Lasers and Optical Systems
Proc. SPIE 2992, Excimer lasers for material ablation cross the 1.5 kHz mark, 0000 (31 March 1997); doi: 10.1117/12.270082
Proc. SPIE 2992, Small excimers opening up new industrial applications, 0000 (31 March 1997); doi: 10.1117/12.270091
Proc. SPIE 2992, Performance characteristics of a high-energy, high-pulse repetition frequency krypton fluoride laser, 0000 (31 March 1997); doi: 10.1117/12.270095
Proc. SPIE 2992, Coaxial, cylindrical, and planar UV excilamps pumped by glow or barrier discharge, 0000 (31 March 1997); doi: 10.1117/12.270096
Proc. SPIE 2992, Optimization of 200-W excimer laser for TFT annealing, 0000 (31 March 1997); doi: 10.1117/12.270097
Proc. SPIE 2992, High-average-power picosecond-pulse excimer laser system for x-ray generation, 0000 (31 March 1997); doi: 10.1117/12.270098
Proc. SPIE 2992, UV and gas interactions in an enclosed 193-nm excimer laser beamline, 0000 (31 March 1997); doi: 10.1117/12.270099
Excimer Applications--Material Processing
Proc. SPIE 2992, Improved off-axis pulsed laser deposition method, 0000 (31 March 1997); doi: 10.1117/12.270083
Proc. SPIE 2992, Optical characterization of binary, tertiary, and quaternary II-VI semiconductor thin films prepared by pulsed excimer laser deposition, 0000 (31 March 1997); doi: 10.1117/12.270084
Proc. SPIE 2992, Surface texturing of aluminum alloy 2024 via excimer laser irradiation, 0000 (31 March 1997); doi: 10.1117/12.270085
Proc. SPIE 2992, Processing applications with the 157-nm fluorine excimer laser, 0000 (31 March 1997); doi: 10.1117/12.270086
Excimer Applications--Microfabrication
Proc. SPIE 2992, Excimer ablation lithography (EAL) for TFT-LCD, 0000 (31 March 1997); doi: 10.1117/12.270087
Proc. SPIE 2992, Excimer laser machining of advanced materials, 0000 (31 March 1997); doi: 10.1117/12.270088
Proc. SPIE 2992, Morphological surface change of elastomers by excimer laser ablation, 0000 (31 March 1997); doi: 10.1117/12.270089
Proc. SPIE 2992, Polyurethane resins as resist materials for excimer ablation lithography (EAL), 0000 (31 March 1997); doi: 10.1117/12.270090
Proc. SPIE 2992, Photopolymers designed for high-resolution laser ablation at a specific irradiation wavelength, 0000 (31 March 1997); doi: 10.1117/12.270092
Proc. SPIE 2992, Excimer-laser-irradiated phase masks for grating formation, 0000 (31 March 1997); doi: 10.1117/12.270093
Proc. SPIE 2992, General machining concept for producing micro-optics with high-power UV lasers, 0000 (31 March 1997); doi: 10.1117/12.270094
Back to Top