PROCEEDINGS VOLUME 3048
MICROLITHOGRAPHY '97 | 10-14 MARCH 1997
Emerging Lithographic Technologies
MICROLITHOGRAPHY '97
10-14 March 1997
Santa Clara, CA, United States
Electron-Beam Writing
Proc. SPIE 3048, Impact of the Coulomb interaction effect on delineating densely repeated 0.1-um patterns using electron-beam block exposure, 0000 (7 July 1997); doi: 10.1117/12.275768
Proc. SPIE 3048, 0.15-um pattern formation using cell projection electron-beam direct writing with variable shot size, 0000 (7 July 1997); doi: 10.1117/12.275779
Proc. SPIE 3048, One-dimensional calculation method for proximity effect correction in cell projection electron-beam direct writing, 0000 (7 July 1997); doi: 10.1117/12.275792
Proc. SPIE 3048, Development of electron-beam lithography for power semiconductor devices, 0000 (7 July 1997); doi: 10.1117/12.275802
Proc. SPIE 3048, Three-dimensional electron-beam lithography simulation, 0000 (7 July 1997); doi: 10.1117/12.275807
Novel Resist Technology
Proc. SPIE 3048, Positive-tone conducting electron-beam resists, 0000 (7 July 1997); doi: 10.1117/12.275808
Proc. SPIE 3048, Conducting polyaniline coatings for submicron lithography and SEM metrology, 0000 (7 July 1997); doi: 10.1117/12.275809
Proc. SPIE 3048, Influence of optical nonlinearities of the photoresist on the photolithographic process: applications, 0000 (7 July 1997); doi: 10.1117/12.275810
X-ray Technology I
Proc. SPIE 3048, Evaluation of aerial image in XRL, 0000 (7 July 1997); doi: 10.1117/12.275769
Proc. SPIE 3048, Sloped irradiation techniques in deep x-ray lithography for 3D shaping of microstructures, 0000 (7 July 1997); doi: 10.1117/12.275770
Proc. SPIE 3048, Membrane distortions in x-ray masks due to specific absorber features, 0000 (7 July 1997); doi: 10.1117/12.275771
Proc. SPIE 3048, Simulation of x-ray mask defect printability, 0000 (7 July 1997); doi: 10.1117/12.275772
X-ray Technology II
Proc. SPIE 3048, High-volume production stepper for x-ray lithography, 0000 (7 July 1997); doi: 10.1117/12.275773
Proc. SPIE 3048, Single-stepper soft x-ray source for step-and-scan tools, 0000 (7 July 1997); doi: 10.1117/12.275774
Proc. SPIE 3048, X-ray phase mask: nanostructures, 0000 (7 July 1997); doi: 10.1117/12.275775
Proc. SPIE 3048, Metrology and quantification of micromilled x-ray masks and exposures, 0000 (7 July 1997); doi: 10.1117/12.275776
Critical Lithographic Parms: Masks, Positional Accuracy
Proc. SPIE 3048, Cost of mask fabrication, 0000 (7 July 1997); doi: 10.1117/12.275777
Proc. SPIE 3048, Active noise cancellation technique for highly accurate EB lithography systems, 0000 (7 July 1997); doi: 10.1117/12.275778
Proc. SPIE 3048, Scattered-light alignment system using SiC mask for x-ray lithography, 0000 (7 July 1997); doi: 10.1117/12.275780
Proc. SPIE 3048, Highly accurate alignment technology for electron-beam lithography in mix-and-match with optical stepper, 0000 (7 July 1997); doi: 10.1117/12.275784
Novel Lithographic Technologies
Proc. SPIE 3048, Interferometric lithography exposure tool for 180-nm structures, 0000 (7 July 1997); doi: 10.1117/12.275785
Proc. SPIE 3048, Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry, 0000 (7 July 1997); doi: 10.1117/12.275787
Proc. SPIE 3048, Scanning array lens lithography for large-area applications, 0000 (7 July 1997); doi: 10.1117/12.275788
Poster Session
Proc. SPIE 3048, Stability and stiffness characteristics of the national x-ray mask standard, 0000 (7 July 1997); doi: 10.1117/12.275789
Proc. SPIE 3048, X-ray mask replication using a Suss stepper at CXrL, 0000 (7 July 1997); doi: 10.1117/12.275790
Proc. SPIE 3048, Power measurements of exposure radiation using thin metal film sensors, 0000 (7 July 1997); doi: 10.1117/12.275791
Proc. SPIE 3048, Process development for 180-nm structures using interferometric lithography and I-line photoresist, 0000 (7 July 1997); doi: 10.1117/12.275793
Proc. SPIE 3048, Method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist: KRS, 0000 (7 July 1997); doi: 10.1117/12.275794
Proc. SPIE 3048, Fabrication of high-performance MSM photodetectors on SOI with nanometer-scale scattering buried backside reflectors, 0000 (7 July 1997); doi: 10.1117/12.275795
Proc. SPIE 3048, Effect of SiC x-ray masks on alignment accuracy of heterodyne alignment, 0000 (7 July 1997); doi: 10.1117/12.275796
Proc. SPIE 3048, Microlens direct-write concept for lithography, 0000 (7 July 1997); doi: 10.1117/12.275797
Proc. SPIE 3048, Measurement of midspatial frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements, 0000 (7 July 1997); doi: 10.1117/12.275798
Novel Resist Technology
Proc. SPIE 3048, SNR200 chemically amplified resist optimization, 0000 (7 July 1997); doi: 10.1117/12.275799
Poster Session
Proc. SPIE 3048, CD variation in 30-kV EBL due to resist heating: experiment and simulation, 0000 (7 July 1997); doi: 10.1117/12.275800
Proc. SPIE 3048, Simulation of resist heating in electron-beam lithography, 0000 (7 July 1997); doi: 10.1117/12.275801
Critical Lithographic Parms: Masks, Positional Accuracy
Proc. SPIE 3048, Evaluation of the Defense Advanced Lithography Program (DALP) x-ray lithography aligner, 0000 (7 July 1997); doi: 10.1117/12.275803
Poster Session
Proc. SPIE 3048, Achieving subhalf-micron I-line manufacturability through automated OPC, 0000 (7 July 1997); doi: 10.1117/12.275804
Proc. SPIE 3048, Fabrication process of superconducting integrated circuits with submicron Nb/AlOx/Nb junctions using electron-beam direct writing technique, 0000 (7 July 1997); doi: 10.1117/12.275805
Proc. SPIE 3048, Fabrication of submicron topology with ion- and neutral-beam etching, 0000 (7 July 1997); doi: 10.1117/12.275806
Plenary Session
Proc. SPIE 3048, Wavefront engineering from 500- to 100-nm CD, 0000 (7 July 1997); doi: 10.1117/12.275781
Proc. SPIE 3048, Optical lithography--thirty years and three orders of magnitude: the evolution of optical lithography tools, 0000 (7 July 1997); doi: 10.1117/12.275782
Proc. SPIE 3048, Photoresist materials: a historical perspective, 0000 (7 July 1997); doi: 10.1117/12.275783
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