Mechanistic and Materials Aspects of 193-nm Resists
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 44 (7 July 1997); doi: 10.1117/12.275811
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 55 (7 July 1997); doi: 10.1117/12.275822
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 65 (7 July 1997); doi: 10.1117/12.275836
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 76 (7 July 1997); doi: 10.1117/12.275847
Lithographic Materials for 193-nm Lithography
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 84 (7 July 1997); doi: 10.1117/12.275856
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 92 (7 July 1997); doi: 10.1117/12.275867
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 104 (7 July 1997); doi: 10.1117/12.275878
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 113 (7 July 1997); doi: 10.1117/12.275888
Poster Session: Chemically Amplified Systems
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 430 (7 July 1997); doi: 10.1117/12.275898
Characterization Methods for Chemically Amplified Resists
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 126 (7 July 1997); doi: 10.1117/12.275812
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 135 (7 July 1997); doi: 10.1117/12.275813
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 146 (7 July 1997); doi: 10.1117/12.275814
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 154 (7 July 1997); doi: 10.1117/12.275815
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 168 (7 July 1997); doi: 10.1117/12.275816
Modeling Aspects of Chemically Amplified Resists
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 180 (7 July 1997); doi: 10.1117/12.275817
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 189 (7 July 1997); doi: 10.1117/12.275818
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 201 (7 July 1997); doi: 10.1117/12.275819
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 212 (7 July 1997); doi: 10.1117/12.275820
Materials Aspects of Chemically Amplified Resists
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 226 (7 July 1997); doi: 10.1117/12.275821
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 238 (7 July 1997); doi: 10.1117/12.275823
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 248 (7 July 1997); doi: 10.1117/12.275827
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 256 (7 July 1997); doi: 10.1117/12.275828
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 269 (7 July 1997); doi: 10.1117/12.275829
Process Development of Chemically Amplified Resists
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 282 (7 July 1997); doi: 10.1117/12.275830
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 300 (7 July 1997); doi: 10.1117/12.275831
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 314 (7 July 1997); doi: 10.1117/12.275832
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 324 (7 July 1997); doi: 10.1117/12.275833
Poster Session: Dissolution Inhibition Systems
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 528 (7 July 1997); doi: 10.1117/12.275834
Mechanistic Aspects of Novolac/DNQ Resists
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 345 (7 July 1997); doi: 10.1117/12.275835
Poster Session: New Materials and Characterization Methods
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 706 (7 July 1997); doi: 10.1117/12.275837
Mechanistic Aspects of Novolac/DNQ Resists
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 363 (7 July 1997); doi: 10.1117/12.275838
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 372 (7 July 1997); doi: 10.1117/12.275839
Processes Using Antireflective Layers/Top-Surface Imaging
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 386 (7 July 1997); doi: 10.1117/12.275840
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 397 (7 July 1997); doi: 10.1117/12.275841
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 409 (7 July 1997); doi: 10.1117/12.275842
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 419 (7 July 1997); doi: 10.1117/12.275843
Poster Session: Chemically Amplified Systems
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 437 (7 July 1997); doi: 10.1117/12.275844
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 448 (7 July 1997); doi: 10.1117/12.275845
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 459 (7 July 1997); doi: 10.1117/12.275846
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 466 (7 July 1997); doi: 10.1117/12.275848
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 473 (7 July 1997); doi: 10.1117/12.275849
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 485 (7 July 1997); doi: 10.1117/12.275850
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 492 (7 July 1997); doi: 10.1117/12.275851
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 501 (7 July 1997); doi: 10.1117/12.275852
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 512 (7 July 1997); doi: 10.1117/12.275853
Mechanistic Aspects of Novolac/DNQ Resists
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 340 (7 July 1997); doi: 10.1117/12.275854
Poster Session: Dissolution Inhibition Systems
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 535 (7 July 1997); doi: 10.1117/12.275855
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 546 (7 July 1997); doi: 10.1117/12.275857
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 557 (7 July 1997); doi: 10.1117/12.275858
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 566 (7 July 1997); doi: 10.1117/12.275859
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 575 (7 July 1997); doi: 10.1117/12.275860
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 585 (7 July 1997); doi: 10.1117/12.275861
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 596 (7 July 1997); doi: 10.1117/12.275862
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 608 (7 July 1997); doi: 10.1117/12.275863
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 618 (7 July 1997); doi: 10.1117/12.275864
Poster Session: Electron-Beam/X-Ray Resists Applications
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 640 (7 July 1997); doi: 10.1117/12.275865
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 650 (7 July 1997); doi: 10.1117/12.275866
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 659 (7 July 1997); doi: 10.1117/12.275868
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 667 (7 July 1997); doi: 10.1117/12.275869
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 676 (7 July 1997); doi: 10.1117/12.275870
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 692 (7 July 1997); doi: 10.1117/12.275871
Poster Session: New Materials and Characterization Methods
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 712 (7 July 1997); doi: 10.1117/12.275872
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 720 (7 July 1997); doi: 10.1117/12.275873
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 728 (7 July 1997); doi: 10.1117/12.275874
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 738 (7 July 1997); doi: 10.1117/12.275875
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 746 (7 July 1997); doi: 10.1117/12.275876
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 757 (7 July 1997); doi: 10.1117/12.275877
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 765 (7 July 1997); doi: 10.1117/12.275879
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 775 (7 July 1997); doi: 10.1117/12.275880
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 789 (7 July 1997); doi: 10.1117/12.275881
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 805 (7 July 1997); doi: 10.1117/12.275882
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 816 (7 July 1997); doi: 10.1117/12.275883
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 829 (7 July 1997); doi: 10.1117/12.275884
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 838 (7 July 1997); doi: 10.1117/12.275885
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 850 (7 July 1997); doi: 10.1117/12.275886
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 861 (7 July 1997); doi: 10.1117/12.275887
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 871 (7 July 1997); doi: 10.1117/12.275889
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 879 (7 July 1997); doi: 10.1117/12.275890
Poster Session: Process Development
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 912 (7 July 1997); doi: 10.1117/12.275891
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 922 (7 July 1997); doi: 10.1117/12.275892
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 932 (7 July 1997); doi: 10.1117/12.275893
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 944 (7 July 1997); doi: 10.1117/12.275894
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 955 (7 July 1997); doi: 10.1117/12.275895
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 963 (7 July 1997); doi: 10.1117/12.275896
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 974 (7 July 1997); doi: 10.1117/12.275897
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 988 (7 July 1997); doi: 10.1117/12.275899
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 997 (7 July 1997); doi: 10.1117/12.275900
Poster Session: New Materials and Characterization Methods
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 888 (7 July 1997); doi: 10.1117/12.275901
Poster Session: Chemically Amplified Systems
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 519 (7 July 1997); doi: 10.1117/12.275902
Poster Session: New Materials and Characterization Methods
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 898 (7 July 1997); doi: 10.1117/12.275903
Poster Session: Process Development
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 1010 (7 July 1997); doi: 10.1117/12.275904
Poster Session: Dissolution Inhibition Systems
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 628 (7 July 1997); doi: 10.1117/12.275905
Mechanistic Aspects of Novolac/DNQ Resists
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 355 (7 July 1997); doi: 10.1117/12.275906
Plenary Session
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 2 (7 July 1997); doi: 10.1117/12.275824
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 14 (7 July 1997); doi: 10.1117/12.275825
Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, pg 28 (7 July 1997); doi: 10.1117/12.275826
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