PROCEEDINGS VOLUME 3679
MICROLITHOGRAPHY '99 | 14-19 MARCH 1999
Optical Microlithography XII
Editor(s): Luc Van den Hove
MICROLITHOGRAPHY '99
14-19 March 1999
Santa Clara, CA, United States
Enhancement Techniques I: PSM
Proc. SPIE 3679, Optical Microlithography XII, pg 10 (26 July 1999); doi: 10.1117/12.354297
Proc. SPIE 3679, Optical Microlithography XII, pg 18 (26 July 1999); doi: 10.1117/12.354332
Proc. SPIE 3679, Optical Microlithography XII, pg 27 (26 July 1999); doi: 10.1117/12.354344
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Proc. SPIE 3679, Optical Microlithography XII, pg 55 (26 July 1999); doi: 10.1117/12.354366
Image Quality I
Proc. SPIE 3679, Optical Microlithography XII, pg 70 (26 July 1999); doi: 10.1117/12.354375
Proc. SPIE 3679, Optical Microlithography XII, pg 77 (26 July 1999); doi: 10.1117/12.354385
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Proc. SPIE 3679, Optical Microlithography XII, pg 108 (26 July 1999); doi: 10.1117/12.354298
Enhancement Techniques II: Process Optimization
Proc. SPIE 3679, Optical Microlithography XII, pg 118 (26 July 1999); doi: 10.1117/12.354306
Proc. SPIE 3679, Optical Microlithography XII, pg 130 (26 July 1999); doi: 10.1117/12.354315
Proc. SPIE 3679, Optical Microlithography XII, pg 138 (26 July 1999); doi: 10.1117/12.354326
Poster Session
Proc. SPIE 3679, Optical Microlithography XII, pg 860 (26 July 1999); doi: 10.1117/12.354327
Lithography Modeling and Overlay
Proc. SPIE 3679, Optical Microlithography XII, pg 162 (26 July 1999); doi: 10.1117/12.354328
Proc. SPIE 3679, Optical Microlithography XII, pg 176 (26 July 1999); doi: 10.1117/12.354329
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CD Control and Mask Error Factor
Proc. SPIE 3679, Optical Microlithography XII, pg 220 (26 July 1999); doi: 10.1117/12.354335
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Proc. SPIE 3679, Optical Microlithography XII, pg 261 (26 July 1999); doi: 10.1117/12.354339
193-nm Process Optimization
Proc. SPIE 3679, Optical Microlithography XII, pg 278 (26 July 1999); doi: 10.1117/12.354340
Proc. SPIE 3679, Optical Microlithography XII, pg 290 (26 July 1999); doi: 10.1117/12.354341
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Image Quality II
Proc. SPIE 3679, Optical Microlithography XII, pg 330 (26 July 1999); doi: 10.1117/12.354346
Proc. SPIE 3679, Optical Microlithography XII, pg 347 (26 July 1999); doi: 10.1117/12.354347
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Proc. SPIE 3679, Optical Microlithography XII, pg 368 (26 July 1999); doi: 10.1117/12.354349
Proc. SPIE 3679, Optical Microlithography XII, pg 382 (26 July 1999); doi: 10.1117/12.354350
Enhancement Techniques III
Proc. SPIE 3679, Optical Microlithography XII, pg 396 (26 July 1999); doi: 10.1117/12.354351
Proc. SPIE 3679, Optical Microlithography XII, pg 408 (26 July 1999); doi: 10.1117/12.354352
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Proc. SPIE 3679, Optical Microlithography XII, pg 435 (26 July 1999); doi: 10.1117/12.354356
Exposure Tools and Subsystems (248-nm)
Proc. SPIE 3679, Optical Microlithography XII, pg 448 (26 July 1999); doi: 10.1117/12.354357
Enhancement Techniques II: Process Optimization
Proc. SPIE 3679, Optical Microlithography XII, pg 150 (26 July 1999); doi: 10.1117/12.354358
Exposure Tools and Subsystems (248-nm)
Proc. SPIE 3679, Optical Microlithography XII, pg 464 (26 July 1999); doi: 10.1117/12.354359
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Exposure Tools (193 nm) and 157-nm Issues
Proc. SPIE 3679, Optical Microlithography XII, pg 506 (26 July 1999); doi: 10.1117/12.354362
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Poster Session
Proc. SPIE 3679, Optical Microlithography XII, pg 548 (26 July 1999); doi: 10.1117/12.354367
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Proc. SPIE 3679, Optical Microlithography XII, pg 1146 (26 July 1999); doi: 10.1117/12.354324
Exposure Tools and Subsystems (248-nm)
Proc. SPIE 3679, Optical Microlithography XII, pg 473 (26 July 1999); doi: 10.1117/12.354325
Enhancement Techniques I: PSM
Proc. SPIE 3679, Optical Microlithography XII, pg 2 (26 July 1999); doi: 10.1117/12.354334
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