PROCEEDINGS VOLUME 3741
MICROELECTRONIC MANUFACTURING TECHNOLOGIES | 19-21 MAY 1999
Lithography for Semiconductor Manufacturing
MICROELECTRONIC MANUFACTURING TECHNOLOGIES
19-21 May 1999
Edinburgh, United Kingdom
Manufacturing Technologies
Proc. SPIE 3741, Millennium maskmaking, 0000 (28 April 1999); doi: 10.1117/12.346875
Proc. SPIE 3741, Alignment performance as a function of chemical mechanical polishing techniques and stepper optimization, 0000 (28 April 1999); doi: 10.1117/12.346882
Proc. SPIE 3741, ASM stepper alignment through thick epitaxial silicon films, 0000 (28 April 1999); doi: 10.1117/12.346892
Proc. SPIE 3741, Recent trends and progress in deep-UV lithography, 0000 (28 April 1999); doi: 10.1117/12.346897
Proc. SPIE 3741, Process window overlap for posts and lines and spaces: optimization by resist type, optical settings, and mask bias, 0000 (28 April 1999); doi: 10.1117/12.346898
Future Optical Lithography Technologies
Proc. SPIE 3741, Challenge of extending optical lithography, 0000 (28 April 1999); doi: 10.1117/12.346899
Proc. SPIE 3741, 193-nm lithography: new challenges, new worries, 0000 (28 April 1999); doi: 10.1117/12.346900
Proc. SPIE 3741, Advantages of isofocal printing in maskmaking with the ALTA 3500, 0000 (28 April 1999); doi: 10.1117/12.346876
Proc. SPIE 3741, Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node, 0000 (28 April 1999); doi: 10.1117/12.346877
Additional Papers
Proc. SPIE 3741, OAI and PSM used in 193-nm microlithography, 0000 (28 April 1999); doi: 10.1117/12.346878
Proc. SPIE 3741, Understanding advanced lithographic materials: challenges and new characterization techniques, 0000 (28 April 1999); doi: 10.1117/12.346879
Resist Technology/Metrology
Proc. SPIE 3741, New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry, 0000 (28 April 1999); doi: 10.1117/12.346880
Proc. SPIE 3741, New versatile system for characterization of antireflective coatings using combined spectroscopic ellipsometry and grazing x-ray reflectance, 0000 (28 April 1999); doi: 10.1117/12.346881
Additional Papers
Proc. SPIE 3741, Performance of 193-nm resists based on alicyclic methacrylate and cyclo-olefin systems, 0000 (28 April 1999); doi: 10.1117/12.346883
Electron Beam Lithography/Lithography Simulation
Proc. SPIE 3741, Use of a MEBES tool to manufacture 180-nm reticles, 0000 (28 April 1999); doi: 10.1117/12.346884
Proc. SPIE 3741, Direct-write electron beam lithography automatically aligned with optical lithography for device fabrication, 0000 (28 April 1999); doi: 10.1117/12.346885
Proc. SPIE 3741, Evaluation of Shipley UV5 resist for electron beam lithography, 0000 (28 April 1999); doi: 10.1117/12.346886
Proc. SPIE 3741, Effect of developer temperature and normality on conventional and chemically amplified photoresist dissolution, 0000 (28 April 1999); doi: 10.1117/12.346887
Proc. SPIE 3741, FIRM: a new software tool for calibration of lithography simulation, 0000 (28 April 1999); doi: 10.1117/12.346888
Additional Papers
Proc. SPIE 3741, Deep-ultraviolet lithography simulator tuning by resist profile matching, 0000 (28 April 1999); doi: 10.1117/12.346889
Poster Session
Proc. SPIE 3741, Submicron structure image formation by one-pulse intracavity laser processing, 0000 (28 April 1999); doi: 10.1117/12.346890
Proc. SPIE 3741, Enhanced microlithography using coherent multiple imaging, 0000 (28 April 1999); doi: 10.1117/12.346891
Proc. SPIE 3741, Best focus shift issues from focusing system of ASML PAS-5000/50 steppers, 0000 (28 April 1999); doi: 10.1117/12.346893
Proc. SPIE 3741, Effect of reticle manufacturing quality on full chip optical proximity correction, 0000 (28 April 1999); doi: 10.1117/12.346894
Proc. SPIE 3741, Analysis technique for quantifying the effectiveness of optical-proximity-corrected photomasks and its application to defect printability, 0000 (28 April 1999); doi: 10.1117/12.346895
Proc. SPIE 3741, Effect of photoresist contrast on intrafield critical dimensions in sub-half-micron optical lithography, 0000 (28 April 1999); doi: 10.1117/12.346896
Back to Top