PROCEEDINGS VOLUME 4175
MICROMACHINING AND MICROFABRICATION | 18-21 SEPTEMBER 2000
Materials and Device Characterization in Micromachining III
IN THIS VOLUME

0 Sessions, 20 Papers, 0 Presentations
MICROMACHINING AND MICROFABRICATION
18-21 September 2000
Santa Clara, CA, United States
Measurement Techniques I
Proc. SPIE 4175, Characterization of LiNbO3/Ti(20 nm)/Pt(10 nm)/Au(100 nm)/Au(10 um) lithium niobate optical modulator by depth sensing nanoindentation and scratching techniques, 0000 (11 August 2000); doi: 10.1117/12.395604
Proc. SPIE 4175, Passive alignment and its application in multilevel x-ray lithography, 0000 (11 August 2000); doi: 10.1117/12.395611
Proc. SPIE 4175, Peel-off probe: a cost-effective probe for electrical atomic force microscopy, 0000 (11 August 2000); doi: 10.1117/12.395612
Measurement Techniques II
Proc. SPIE 4175, Mounting of molded AFM probes by soldering, 0000 (11 August 2000); doi: 10.1117/12.395613
Proc. SPIE 4175, Compact pressure- and structure-based gas flow model for microvalves, 0000 (11 August 2000); doi: 10.1117/12.395614
Proc. SPIE 4175, Automatic mesh adaptivity for finite element simulation of multilayer MEMS, 0000 (11 August 2000); doi: 10.1117/12.395615
Materials Characterization
Proc. SPIE 4175, Microtensile tests with the aid of probe microscopy for the study of MEMS materials, 0000 (11 August 2000); doi: 10.1117/12.395616
Proc. SPIE 4175, Auto-adhesion model for MEMS surfaces taking into account the effect of surface roughness, 0000 (11 August 2000); doi: 10.1117/12.395617
Proc. SPIE 4175, Novel chemistry for surface engineering in MEMS, 0000 (11 August 2000); doi: 10.1117/12.395598
High-Aspect-Ratio Processing
Proc. SPIE 4175, Fabrication of graphite masks for deep and ultradeep x-ray lithography, 0000 (11 August 2000); doi: 10.1117/12.395599
Device Characterization
Proc. SPIE 4175, Experimental one- and two-dimensional mechanical stress characterization of silicon microsystems using micro-Raman spectroscopy, 0000 (11 August 2000); doi: 10.1117/12.395600
Proc. SPIE 4175, Micromachined capacitive switches at microwave frequencies, 0000 (11 August 2000); doi: 10.1117/12.395601
Proc. SPIE 4175, RF MEMS microswitches design and characterization, 0000 (11 August 2000); doi: 10.1117/12.395602
Proc. SPIE 4175, Development of a high-performance SOI-fabricated gyroscope, 0000 (11 August 2000); doi: 10.1117/12.395603
Poster Session
Proc. SPIE 4175, Characterization and design optimization for CMOS-compatible MEMS, 0000 (11 August 2000); doi: 10.1117/12.395605
Proc. SPIE 4175, Effect of dc bias field on resonance frequency and vibration amplitude in a magnetomechanical bimorph resonator, 0000 (11 August 2000); doi: 10.1117/12.395609
Proc. SPIE 4175, Nonlinear dynamic behavior of electrostatically actuated devices, 0000 (11 August 2000); doi: 10.1117/12.395610
Measurement Techniques I
Proc. SPIE 4175, MEMS/MOEMS for lightwave networks: Can little machines make it big?, 0000 (11 August 2000); doi: 10.1117/12.395606
Proc. SPIE 4175, Bulk micromachining for sensors and actuators, 0000 (11 August 2000); doi: 10.1117/12.395607
Proc. SPIE 4175, Microsystems for diverse applications using recently developed microfabrication techniques, 0000 (11 August 2000); doi: 10.1117/12.395608
Back to Top