PROCEEDINGS VOLUME 4230
INTERNATIONAL SYMPOSIUM ON MICROELECTRONICS AND ASSEMBLY | NOV 27 - DEC 2 2000
Micromachining and Microfabrication
IN THIS VOLUME

0 Sessions, 30 Papers, 0 Presentations
RF MEMS  (6)
INTERNATIONAL SYMPOSIUM ON MICROELECTRONICS AND ASSEMBLY
Nov 27 - Dec 2 2000
Singapore, Singapore
RF MEMS
Proc. SPIE 4230, Electroplated solenoid-type inductors for CMOS rf CO, 0000 (20 October 2000); doi: 10.1117/12.404888
Proc. SPIE 4230, Frequency tunable micromachined rf oscillators, 0000 (20 October 2000); doi: 10.1117/12.404898
Proc. SPIE 4230, MEMS variable capacitor for one-chip rf front end, 0000 (20 October 2000); doi: 10.1117/12.404909
Proc. SPIE 4230, High-frequency rf microswitches using MEMS-integrated fabrication process, 0000 (20 October 2000); doi: 10.1117/12.404912
Proc. SPIE 4230, Microfabrication technology for high-speed Si-based systems, 0000 (20 October 2000); doi: 10.1117/12.404913
Radiation and Gas Sensors
Proc. SPIE 4230, Microfabrication of 32x32 uncooled IR focal plane array, 0000 (20 October 2000); doi: 10.1117/12.404914
Proc. SPIE 4230, Improvements of an x-ray microcalorimeter for detecting cosmic rays, 0000 (20 October 2000); doi: 10.1117/12.404915
Proc. SPIE 4230, Microsensor for noncontact temperature measurement, 0000 (20 October 2000); doi: 10.1117/12.404916
Proc. SPIE 4230, Thermal modeling of low-power micromachined solid state integrated gas sensor, 0000 (20 October 2000); doi: 10.1117/12.404917
Mechanical Sensors and Actuators I
Proc. SPIE 4230, Novel self-oscillating anemometer with capacitance-based sensing, 0000 (20 October 2000); doi: 10.1117/12.404889
Proc. SPIE 4230, MEMS atomizer based on Rayleigh instability-driven breakup of filaments, 0000 (20 October 2000); doi: 10.1117/12.404890
Proc. SPIE 4230, Micromachined muscle cell analysis chip, 0000 (20 October 2000); doi: 10.1117/12.404891
Mechanical Sensors and Actuators II
Proc. SPIE 4230, New design concept for vibrating microgyroscope, 0000 (20 October 2000); doi: 10.1117/12.404892
Proc. SPIE 4230, Optimized layout generator for microgyroscope, 0000 (20 October 2000); doi: 10.1117/12.404893
Proc. SPIE 4230, Optimization methodology for low-g microaccelerometer, 0000 (20 October 2000); doi: 10.1117/12.404894
Proc. SPIE 4230, Preparation of crystalline TiNi shape-memory alloy thin film for MEMS applications, 0000 (20 October 2000); doi: 10.1117/12.404895
Pattern Transfer
Proc. SPIE 4230, High-aspect-ratio structure formation in x-ray lithography, 0000 (20 October 2000); doi: 10.1117/12.404896
Proc. SPIE 4230, Laser patterning indium tin oxide (ITO) coated on PET substrate, 0000 (20 October 2000); doi: 10.1117/12.404897
Proc. SPIE 4230, Patterning of diamond microstructures on Si substrate by bulk and surface micromachining, 0000 (20 October 2000); doi: 10.1117/12.404899
Optical MEMS I
Proc. SPIE 4230, 4x4 nonblocking matrix switch based on MOEMS, 0000 (20 October 2000); doi: 10.1117/12.404900
Proc. SPIE 4230, 4x4 MEMS optical cross-connections (OXCs), 0000 (20 October 2000); doi: 10.1117/12.404901
Proc. SPIE 4230, Dynamic characteristics measurement system for optical scanning micromirror, 0000 (20 October 2000); doi: 10.1117/12.404902
Optical MEMS II
Proc. SPIE 4230, Integrated WDM frequency tuner using polysilicon surface micromachining process, 0000 (20 October 2000); doi: 10.1117/12.404903
Proc. SPIE 4230, Tunable Fabry-Perot cavities, 0000 (20 October 2000); doi: 10.1117/12.404904
Proc. SPIE 4230, Realization of multifiber ferrule mold inserts fabricated by the LIGA process, 0000 (20 October 2000); doi: 10.1117/12.404905
Poster Session
Proc. SPIE 4230, Study on mask technology of CVD diamond thin films by RIE etching, 0000 (20 October 2000); doi: 10.1117/12.404906
Proc. SPIE 4230, Reactive ion etching of CVD diamond films for MEMS applications, 0000 (20 October 2000); doi: 10.1117/12.404907
Proc. SPIE 4230, Process monitoring of LPCVD silicon nitride and polysilicon by variable-angle spectroscopic ellipsometry, 0000 (20 October 2000); doi: 10.1117/12.404908
Proc. SPIE 4230, Micro-metal-forming technology using specially designed microtool, 0000 (20 October 2000); doi: 10.1117/12.404910
RF MEMS
Proc. SPIE 4230, Tools and processes for MEMS and nanotechnology, 0000 (20 October 2000); doi: 10.1117/12.404911
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