PROCEEDINGS VOLUME 4347
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2000 | 16-18 OCTOBER 2000
Laser-Induced Damage in Optical Materials: 2000
IN THIS VOLUME

0 Sessions, 72 Papers, 0 Presentations
Thin Films  (20)
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2000
16-18 October 2000
Boulder, CO, United States
Materials and Measurements
Proc. SPIE 4347, UV-laser coloration and bleaching of unirradiated and gamma-irradiated silica glasses, 0000 (12 April 2001); doi: 10.1117/12.425004
Thin Films
Proc. SPIE 4347, Time-resolved diagnostics and mechanisms of single-wall carbon nanotube synthesis by the laser vaporization technique, 0000 (12 April 2001); doi: 10.1117/12.425010
Mini-Symposium on Defects in Glass
Proc. SPIE 4347, Laser-induced color centers in silica, 0000 (12 April 2001); doi: 10.1117/12.425020
Fundamental Mechanisms
Proc. SPIE 4347, Photonic bandgap materials, 0000 (12 April 2001); doi: 10.1117/12.425031
Materials and Measurements
Proc. SPIE 4347, Optical absorption and ionization of silicate glasses, 0000 (12 April 2001); doi: 10.1117/12.425042
Surfaces and Mirrors
Proc. SPIE 4347, Effect of surface finish on the high-power transmission characteristics of fused-silica optical fibers, 0000 (12 April 2001); doi: 10.1117/12.425063
Mini-Symposium on Defects in Glass
Proc. SPIE 4347, Defect generation in fused silica under high-intensity laser interaction, 0000 (12 April 2001); doi: 10.1117/12.425073
Materials and Measurements
Proc. SPIE 4347, Fullerene-doped polymer-dispersed liquid crystals: holographic recording and optical limiting effect, 0000 (12 April 2001); doi: 10.1117/12.425005
Proc. SPIE 4347, Spectral and nonlinear optical properties of fullerene-doped pi-conjugated organic systems, 0000 (12 April 2001); doi: 10.1117/12.425006
Proc. SPIE 4347, Nature of damage in fused silica induced by high-fluence 3-omega 355-nm laser pulses, a multiscale morphology microstructure, and defect chemistry study, 0000 (12 April 2001); doi: 10.1117/12.425007
Fundamental Mechanisms
Proc. SPIE 4347, Modeling of laser-induced breakdown in dielectrics with subpicosecond pulses, 0000 (12 April 2001); doi: 10.1117/12.425008
Materials and Measurements
Proc. SPIE 4347, Electromagnetic aspects of localized action of high-power laser field on transparent solids, 0000 (12 April 2001); doi: 10.1117/12.425009
Mini-Symposium on Defects in Glass
Proc. SPIE 4347, Ablation of amorphous SiO2 using ArF excimer laser, 0000 (12 April 2001); doi: 10.1117/12.425011
Materials and Measurements
Proc. SPIE 4347, Index-mismatch scattering approach to optical limiting, 0000 (12 April 2001); doi: 10.1117/12.425012
Mini-Symposium on Defects in Glass
Proc. SPIE 4347, Subpicosecond optical damaging of silica: time-resolved measurements of the light-induced damage threshold, 0000 (12 April 2001); doi: 10.1117/12.425013
Thin Films
Proc. SPIE 4347, Temperature effects on the LIDT of single- and multilayer sol-gel-derived thin film coatings, 0000 (12 April 2001); doi: 10.1117/12.425014
Proc. SPIE 4347, Aging studies of sol-gel-derived thin film single-layer and multilayer dielectric mirrors, 0000 (12 April 2001); doi: 10.1117/12.425015
Surfaces and Mirrors
Proc. SPIE 4347, Room-temperature mirror preparation using sol-gel chemistry and laminar-flow coating technique, 0000 (12 April 2001); doi: 10.1117/12.425016
Mini-Symposium on Defects in Glass
Proc. SPIE 4347, Fabrication of nonerasable gratings in SiO2 glasses by a two-beam holographic method using infrared femtosecond laser pulses, 0000 (12 April 2001); doi: 10.1117/12.425017
Fundamental Mechanisms
Proc. SPIE 4347, Quantitative study of laser damage probabilities in silica and calibrated liquids: comparison with theoretical prediction, 0000 (12 April 2001); doi: 10.1117/12.425018
Materials and Measurements
Proc. SPIE 4347, CW and nanosecond laser irradiation on materials: elements of comparison of thermal effects, 0000 (12 April 2001); doi: 10.1117/12.425019
Mini-Symposium on Defects in Glass
Proc. SPIE 4347, Damage behavior of SiO2 glass induced by 193-nm radiation under a simulated operating mode of lithography laser, 0000 (12 April 2001); doi: 10.1117/12.425021
Materials and Measurements
Proc. SPIE 4347, Correlation between absorption and scattering imaging in optical materials (Abstract Only), 0000 (12 April 2001); doi: 10.1117/12.425022
Fundamental Mechanisms
Proc. SPIE 4347, Simulations of laser damage of SiO2 induced by a spherical inclusion, 0000 (12 April 2001); doi: 10.1117/12.425023
Materials and Measurements
Proc. SPIE 4347, Results of pulse-scaling experiments on rapid-growth DKDP triplers using the Optical Sciences Laser at 351 nm, 0000 (12 April 2001); doi: 10.1117/12.425024
Proc. SPIE 4347, Differences in bulk damage probability distributions between tripler and z-cuts of KDP and DKDP at 355 nm, 0000 (12 April 2001); doi: 10.1117/12.425025
Proc. SPIE 4347, Effect of thermal annealing and second harmonic generation on bulk damage performance of rapid-growth KDP type-I doublers at 1064 nm, 0000 (12 April 2001); doi: 10.1117/12.425026
Thin Films
Proc. SPIE 4347, Quadratic increase of nonlinear absorption in thin Al2O3 films at 193 nm, 0000 (12 April 2001); doi: 10.1117/12.425028
Surfaces and Mirrors
Proc. SPIE 4347, CHARISMA: a new way for angular-resolved scattering measurements, 0000 (12 April 2001); doi: 10.1117/12.425029
Thin Films
Proc. SPIE 4347, Interfacial absorption of DUV coatings, 0000 (12 April 2001); doi: 10.1117/12.425030
Proc. SPIE 4347, Physical mechanisms of femtosecond-pulse-induced damage in dielectric thin films, 0000 (12 April 2001); doi: 10.1117/12.425032
Mini-Symposium on Defects in Glass
Proc. SPIE 4347, Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses, 0000 (12 April 2001); doi: 10.1117/12.425033
Thin Films
Proc. SPIE 4347, Long-time radiation-resistant optical coatings for UV excimer laser applications, 0000 (12 April 2001); doi: 10.1117/12.425034
Fundamental Mechanisms
Proc. SPIE 4347, Use of high-power dye laser beams during long periods induces chemical vapor deposition, 0000 (12 April 2001); doi: 10.1117/12.425035
Surfaces and Mirrors
Proc. SPIE 4347, Laser-induced damage simulations of silica surface under 1.053-um irradiation, 0000 (12 April 2001); doi: 10.1117/12.425036
Thin Films
Proc. SPIE 4347, Using colloidal gold nanoparticles for studies of laser interaction with defects in thin films, 0000 (12 April 2001); doi: 10.1117/12.425037
Surfaces and Mirrors
Proc. SPIE 4347, CPA compression gratings with improved damage performance, 0000 (12 April 2001); doi: 10.1117/12.425038
Materials and Measurements
Proc. SPIE 4347, Waveguides in chalcogenide glasses produced by a train of femtosecond laser pulses, 0000 (12 April 2001); doi: 10.1117/12.425039
Proc. SPIE 4347, Development and characterization of advanced F2 laser source for 157-nm lithography, 0000 (12 April 2001); doi: 10.1117/12.425040
Proc. SPIE 4347, Reliable materials and instruments for 157-nm lithography, 0000 (12 April 2001); doi: 10.1117/12.425041
Surfaces and Mirrors
Proc. SPIE 4347, Dynamics of electrons in metallic nanoinclusions interacting with an intense laser beam, 0000 (12 April 2001); doi: 10.1117/12.425043
Thin Films
Proc. SPIE 4347, Optical thin films grown by surface chemical reaction for high-power lasers, 0000 (12 April 2001); doi: 10.1117/12.425045
Proc. SPIE 4347, Influence of the standing-wave electric field pattern on the laser damage resistance of HfO2 thin films, 0000 (12 April 2001); doi: 10.1117/12.425046
Fundamental Mechanisms
Proc. SPIE 4347, Effects of dispersion and aberrations in ocular focusing of femtosecond pulses and the impact on damage mechanisms, 0000 (12 April 2001); doi: 10.1117/12.425047
Materials and Measurements
Proc. SPIE 4347, Angle-resolved scatter measurements of laser-damaged DKDP crystals using a bidirectional scatter diagnostics, 0000 (12 April 2001); doi: 10.1117/12.425048
Thin Films
Proc. SPIE 4347, Laser conditioning characterization and damage threshold prediction of hafnia/silica multilayer mirrors by photothermal microscopy, 0000 (12 April 2001); doi: 10.1117/12.425049
Materials and Measurements
Proc. SPIE 4347, Laser raster conditioning of KDP and DKDP crystals using XeCl and Nd:YAG lasers, 0000 (12 April 2001); doi: 10.1117/12.425050
Fundamental Mechanisms
Proc. SPIE 4347, Mechanisms to explain damage growth in optical materials, 0000 (12 April 2001); doi: 10.1117/12.425051
Materials and Measurements
Proc. SPIE 4347, Analysis of bulk DKDP damage distribution, obscuration, and pulse-length dependence, 0000 (12 April 2001); doi: 10.1117/12.425052
Fundamental Mechanisms
Proc. SPIE 4347, Scaling relations for laser damage initiation craters, 0000 (12 April 2001); doi: 10.1117/12.425053
Surfaces and Mirrors
Proc. SPIE 4347, Chemical etch effects on laser-induced surface damage growth in fused silica, 0000 (12 April 2001); doi: 10.1117/12.425054
Materials and Measurements
Proc. SPIE 4347, Growth of laser-initiated damage in fused silica at 351 nm, 0000 (12 April 2001); doi: 10.1117/12.425055
Thin Films
Proc. SPIE 4347, Femtosecond laser damage in dielectric coatings, 0000 (12 April 2001); doi: 10.1117/12.425056
Materials and Measurements
Proc. SPIE 4347, Absolute measurements of nonlinear absorption near LIDT at 193 nm, 0000 (12 April 2001); doi: 10.1117/12.425057