PROCEEDINGS VOLUME 4349
17TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS | 13-14 NOVEMBER 2000
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
17TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS
13-14 November 2000
Munich, Germany
Next-Generation Masks
Proc. SPIE 4349, Challenges and opportunities for EPL and EUVL masks, 0000 (9 April 2001); doi: 10.1117/12.425076
Proc. SPIE 4349, Resistless electron beam lithography technique for the fabrication of x-ray masks, 0000 (9 April 2001); doi: 10.1117/12.425086
Proc. SPIE 4349, Removal process for buffer layer on multilayer of EUVL mask, 0000 (9 April 2001); doi: 10.1117/12.425097
Proc. SPIE 4349, Progress in placement control for ion beam stencil mask technology, 0000 (9 April 2001); doi: 10.1117/12.425098
Pattern Transfer and Testing
Proc. SPIE 4349, Investigation of quartz etch rate uniformity for alternating phase-shift mask applications utilizing a next-generation ICP source, 0000 (9 April 2001); doi: 10.1117/12.425099
Proc. SPIE 4349, Doubly exposed patterning characteristics using two alternating phase-shift masks, 0000 (9 April 2001); doi: 10.1117/12.425100
Proc. SPIE 4349, Canary reticle: a new diagnostic for reticles and a window into the physics of ESD damage to reticles, 0000 (9 April 2001); doi: 10.1117/12.425101
Pattern Generation and Data Preparation I
Proc. SPIE 4349, 130-nm node mask development, 0000 (9 April 2001); doi: 10.1117/12.425102
Proc. SPIE 4349, Continuous image writer with improved image quality for high-accuracy optical patterning, 0000 (9 April 2001); doi: 10.1117/12.425103
Poster Session
Proc. SPIE 4349, First results from a new 248-nm CD measurement system for future mask and reticle generation, 0000 (9 April 2001); doi: 10.1117/12.425077
Proc. SPIE 4349, Improvement of temperature uniformity during prebake process in mask blank production, 0000 (9 April 2001); doi: 10.1117/12.425078
Proc. SPIE 4349, Mask definition by nanoimprint lithography, 0000 (9 April 2001); doi: 10.1117/12.425079
Proc. SPIE 4349, Strategies for wafer-scale hot embossing lithography, 0000 (9 April 2001); doi: 10.1117/12.425080
Metrology
Proc. SPIE 4349, Mask manufacturing contribution on 248-nm and 193-nm lithography performances, 0000 (9 April 2001); doi: 10.1117/12.425081
Proc. SPIE 4349, Comparison of linewidth measurements on COG masks, 0000 (9 April 2001); doi: 10.1117/12.425082
Proc. SPIE 4349, High-resolution inspection of 2D microstructures using multimode polarization microscopy, 0000 (9 April 2001); doi: 10.1117/12.425083
Proc. SPIE 4349, Quality assessment of advanced photomasks using the Q-CAP cluster tool, 0000 (9 April 2001); doi: 10.1117/12.425084
Pattern Generation and Data Preparation II
Proc. SPIE 4349, Improved throughput in the ALTA 3000 IC mask writing system, 0000 (9 April 2001); doi: 10.1117/12.425085
Proc. SPIE 4349, AutoMOPS--B2B and B2C in mask making: mask manufacturing performance and customer satisfaction improvement through better information flow management, 0000 (9 April 2001); doi: 10.1117/12.425087
Proc. SPIE 4349, Electron-beam lithography data preparation based on multithreading MGS/PROXECCO, 0000 (9 April 2001); doi: 10.1117/12.425088
Proc. SPIE 4349, Study of mask aerial images to predict CD proximity and line end shortening of resist patterns, 0000 (9 April 2001); doi: 10.1117/12.425089
Resist and Mask Blank Issue
Proc. SPIE 4349, Application of e-beam chemically amplified resist to devices below 0.18-um node, 0000 (9 April 2001); doi: 10.1117/12.425090
Proc. SPIE 4349, Photomask blanks quality and functionality improvement challenges for the 130-nm node and beyond, 0000 (9 April 2001); doi: 10.1117/12.425091
Defect Inspection and Repair
Proc. SPIE 4349, Phase defect inspection of 130-nm node phase-shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm, 0000 (9 April 2001); doi: 10.1117/12.425092
Proc. SPIE 4349, Charged-particle-beam-induced processes and their applicability to mask repair for next-generation lithographies, 0000 (9 April 2001); doi: 10.1117/12.425093
Proc. SPIE 4349, Compact excimer laser light source for optical (mask) inspection systems, 0000 (9 April 2001); doi: 10.1117/12.425094
Proc. SPIE 4349, Defect inspection of IPL stencil masks with a KLA 351 tool, 0000 (9 April 2001); doi: 10.1117/12.425095
Poster Session
Proc. SPIE 4349, Establishment of production processes and assurance method for alternating phase shift masks, 0000 (9 April 2001); doi: 10.1117/12.425096
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