PROCEEDINGS VOLUME 4409
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY VIII | 25-27 APRIL 2001
Photomask and Next-Generation Lithography Mask Technology VIII
Editor(s): Hiroichi Kawahira
Editor Affiliations +
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY VIII
25-27 April 2001
Kanagawa, Japan
Mask Technology and Semiconductor Devices
Teruo Hirayama, T. Ezaki, N. Ouchi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438339
Photomask Processes and Materials
Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau, Robert Lang, Christopher F. Robinson, David R. Medeiros, Karen E. Petrillo, Ari Aviram, Arpan P. Mahorowala, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438350
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438359
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438370
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438379
Defect Printability and Dispositioning
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438388
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438398
Justin W. Novak, Benjamin George Eynon Jr., Anja Rosenbusch, Alex Goldenshtein
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438407
Peter Fiekowsky, Darren Taylor, David Wang, Chien-Chu Yang, Shu-Chun Lin, L. H. Tu, K. R. Lin
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438329
Metrology
Glen W. Scheid, Darren Taylor, Peter Fiekowsky
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438330
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438331
Resolution Enhancement Technology in Optical Lithography
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438332
Haruo Iwasaki, Shinji Ishida, K. Tonai, Hiroshi Nozue
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438333
PSM Fabrication Processes and Materials
Hyoungdo Kim, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438334
Resolution Enhancement Technology in Optical Lithography
Tomohiko Yamamoto, Naoyuki Ishiwata, Yuichiro Yanagishita, Takema Kobayashi, Satoru Asai
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438335
PSM Fabrication Processes and Materials
Koichiro Kanayama, Takashi Haraguchi, Tsukasa Yamazaki, Toshihiro Ii, Tadashi Matsuo, Nobuhiko Fukuhara, Tadashi Saga, Yusuke Hattori, Takashi Ooshima, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438336
Toshiaki Motonaga, M. Ohtsuki, Y. Kinase, H. Nakagawa, Toshifumi Yokoyama, Hiroshi Mohri, Junji Fujikawa, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438337
Toshifumi Yokoyama, S. Yusa, T. Okamura, H. Nakagawa, Toshiaki Motonaga, Hiroshi Mohri, Junji Fujikawa, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438338
Mask Design Automation and T-CAD
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438340
PSM Fabrication Processes and Materials
Tooru Komizo, Ichiro Kagami, Daichi Kakuta, Hiroichi Kawahira
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438341
Yasutaka Morikawa, Haruo Kokubo, Masami Nara, Hiroyuki Miyashita, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438342
Resolution Enhancement Technology in Optical Lithography
Dong-Hoon Chung, Seung-Hune Yang, Hyung-Do Kim, In-Gyun Shin, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438343
Sang-Jin Kim, Sang-Sool Koo, Seo-Min Kim, Chang-Nam Ahn, Young-Mog Ham, Ki-Soo Shin
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438344
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438345
Mask Design Automation and T-CAD
In-Soo Lee, Kyung-Han Nam, Lee-Ju Kim, Cheol Shin, Hong-Seok Kim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438346
Photomask Processes and Materials
Hsuen-Li Chen, Chien-Kui Hsu, Ben-Chang Chen, Fu-Hsiang Ko, Tiao-Yuan Huang, Tien-Chi Chu
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438347
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438348
Takehiro Kondoh, Masamitsu Itoh, Rikiya Taniguchi, Kyoh Ohtsubo, Mari Sakai, Hidehiro Watanabe
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438349
Sonoko Migitaka, Tadashi Arai, Toshio Sakamizu, Kei Kasuya, Michiaki Hashimoto, Hiroshi Shiraishi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438351
Kakuei Ozawa, Nobunori Abe
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438352
Peter Dress, Thomas M. Gairing, Werner Saule, Uwe U. Dietze, Jakob Szekeresch
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438353
Mask Design Automation and T-CAD
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438354
Dry Etching Techniques for Mask Materials
Hyuk-Joo Kwon, D. S. Min, Pil-Jin Jang, Byung-Soo Chang, Boo-Yeon Choi, Kyung Ho Park, Soo-Hong Jeong
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438355
Tatsuya Fujisawa, Nobuyuki Yoshioka, Takaei Sasaki, Kazuhide Yamashiro
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438356
Chul-Joong Lee, Hyun-Suk Bang, J. W. Choi, H. S. Jung, Cheol Shin, Hong-Seok Kim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438357
Frank Erber, Guenther G. Ruhl, C. Ebi, Ralf Dietrich, Josef Mathuni, Pavel Nesladek
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438358
Mask Design Automation and T-CAD
Isao Yonekura, Yuhichi Fukushima, Fuyuhiko Matsuo, Masao Otaki, Norihito Fukugami
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438360
Defect Printability and Dispositioning
Jung-Bae Kim, I. B. Hur, Seong-Ho Jeong, Yong-Seok Son, Kyu-Yong Lee, Sang Woon Lee, Cheol Shin, Hong-Seok Kim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438361
Linard Karklin, Stan Mazor
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438362
Cihan Tinaztepe, Ichiro Kagami
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438363
VUV and NGL Masks
Yoshinori Nakayama, Hiroshi Watanabe, Shinji Tsuboi, Hajime Aoyama, Mizunori Ezaki, Yasuji Matsui, Tetsuo Morosawa, Masatoshi Oda
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438364
Yuusuke Tanaka, Kiyoshi Fujii, Kenichiro Suzuki, Toshiyuki Iwamoto, Shinji Tsuboi, Yasuji Matsui
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438365
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438366
Hajime Nii, Hiroo Kinoshita, Takeo Watanabe, K. Hamamoto, H. Tsubakino, Y. Sugie
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438367
Hajime Nii, Hiroo Kinoshita, Takeo Watanabe, Y. Matsuo, Y. Sugie
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438368
Akira Chiba, Eiichi Hoshino, Makoto Takahashi, Hiromasa Yamanashi, Hiromasa Hoko, Byoung Taek Lee, Takashi Yoneda, Masaaki Ito, Taro Ogawa, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438369
Manhyoung Ryoo, Masaaki Ito, Byoung Taek Lee, Taro Ogawa, Shinji Okazaki
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438371
Defect Inspection and Repair Systems
Hisashi Shiba, Masayoshi Kimura, Y. Saito, Naohisa Takayama, K. Matsumura, Shingo Murakami, Keiichi Hatta
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438372
Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, S. Yabe, Yoshihiro Koyama, Masashi Muramatsu, Toshio Doi, Kenji Suzuki, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438373
Advanced Mask Cleaning, Pellicle, and Process Technology
Shen Chung Kuo, TaiSheng Tan, Anja Rosenbusch, Yair Eran, Ofer Lindman, Gidon Gottlib
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438374
Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yuki Oomasa, Koichi Kido, Atsushi Hayashi, Yasutaka Kikuchi, Ichiro Imagawa, Yuichi Matsuzawa, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438375
Photmask Patterning
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438376
Mask Design Automation and T-CAD
Michael Chang, A. Yu, J. Chen, J. Lin, Jason H. Huang, F. Hsu, Hua-Yu Liu
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438377
Metrology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438378
Rand Cottle, Peter Fiekowsky, C. C. Hung, Sheng-che Lin
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438380
VUV and NGL Masks
Yasuji Matsui, Takao Taguchi, Yoshinori Nakayama, Yukiko Kikuchi, Shinji Tsuboi, Hiroaki Sumitani
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438381
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438382
Kenji Kurihara, H. Iriguchi, A. Motoyoshi, T. Tabata, S. Takahashi, K. Iwamoto, Ikuo Okada, Hideo Yoshihara, Hitoshi Noguchi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438383
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438384
Photomask Processes and Materials
Nobuyoshi Deguchi, Kazunori Iwamoto, Izumi Tsukamoto, Ryo Takai, Mitsuru Hiura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438385
Dry Etching Techniques for Mask Materials
Han-Ming Wu, Long He, Jeff N. Farnsworth, Gang Liu
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438386
Defect Inspection and Repair Systems
Chih-Chien Hung, Chue-San Yoo, Chin-Hsiang Lin, William Waters Volk, James N. Wiley, Steve Khanna, Steve Biellak, D. Wang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438387
Kiyoshi Ogawa, J. Kodama, K. Machida, Katsuyoshi Nakashima, Yaichiro Watakabe
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438389
Atsushi Ueda, Yoichi Yoshino, Yukio Morishige, Syuichi Watanabe, Yukio Kyusho, Tsutoma Haneda, Makoto Ohmiya
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438390
Ichiro Kagami, Daichi Kakuta, Tooru Komizo, Hiroichi Kawahira
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438391
Chia-Yang Chang, Chung-Hsing Chang, Chuan-Yuan Lin, C. C. Hung, Chien-Hung Lin, John C.H. Lin
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438392
Advanced Mask Cleaning, Pellicle, and Process Technology
Hitoshi Handa, Masumi Takahashi, Hisatsugu Shirai
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438393
Takashi Kozeki, Shigeto Shigematsu, Masahiro Kondo, Hiroaki Nakagawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438394
Resolution Enhancement Technology in Optical Lithography
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438395
Kyung-Han Nam, Lee-Ju Kim, Hyoung-Sup Jeong, Sang Woon Lee, In-Soo Lee, Cheol Shin, Hong-Seok Kim, L. Dieu, Seung-Weon Paek, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438396
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438397
Advanced Mask Cleaning, Pellicle, and Process Technology
Masayoshi Tsuzuki, Wataru Nozaki, Shinji Akima, Jun Yoshida, Yuko Oi, Yoshiro Yamada, Yuichi Matsuzawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438399
VUV and NGL Masks
Jerry Cullins, Edward G. Muzio
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438400
Photmask Patterning
Ki-Ho Baik, Varoujan Chakarian, Bob Dean, Maiying Lu, Robert J. Naber, Thomas H. Newman, Mark Wiltse, Frank E. Abboud
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438401
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438402
Kenji Ohtoshi, Hitoshi Sunaoshi, Jun Takamatsu, Fumiyuki Okabe, K. Ishibashi, Shusuke Yoshitake, Hirokazu Yamada, Shuichi Tamamushi, Hirohito Anze, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438403
Tadashi Komagata, Yasutoshi Nakagawa, Nobuo Gotoh, Kazumitsu Tanaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438404
Akira Fujii, Kazui Mizuno, Tetsuji Nakahara, Suyo Asai, Yasuhiro Kadowaki, Hajime Shimada, Hiroshi Touda, Ken Iizumi, Hiroyuki Takahashi, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438405
Resolution Enhancement Technology in Optical Lithography
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438406
Mask Technology and Semiconductor Devices
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438408
Metrology
Bradley Todd, Kirk Miller, Thomas V. Pistor
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438409
Mask Design Automation and T-CAD
Stephen Hsu, Xuelong Shi, Chungwei Michael Hsu, Noel P. Corcoran, J. Fung Chen, Sunil Desai, Micheal J. Sherrill, Y. C. Tseng, H. A. Chang, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology VIII, (2001) https://doi.org/10.1117/12.438410
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