PROCEEDINGS VOLUME 4449
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY | 29 JULY - 3 AUGUST 2001
Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II
Proceedings Volume 4449 is from: Logo
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY
29 July - 3 August 2001
San Diego, CA, United States
157 nm/193 nm Techniques
Proc. SPIE 4449, Present and future industrial metrology needs for qualification of high-quality optical microlithography materials, 0000 (10 December 2001); doi: 10.1117/12.450080
Proc. SPIE 4449, Measurement of absorptance of optical coatings for F2 lithography, 0000 (10 December 2001); doi: 10.1117/12.450089
Proc. SPIE 4449, Measuring small absorption losses of laser pulses in fused silica by a pump and probe technique, 0000 (10 December 2001); doi: 10.1117/12.450100
Proc. SPIE 4449, Measurement of total integrated scatter of optical coatings for 157-nm lithography, 0000 (10 December 2001); doi: 10.1117/12.450106
Proc. SPIE 4449, Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm, 0000 (10 December 2001); doi: 10.1117/12.450107
Ellipsometry
Proc. SPIE 4449, Recent developments in spectroscopic ellipsometry for in-situ applications, 0000 (10 December 2001); doi: 10.1117/12.450108
Proc. SPIE 4449, Infrared spectroscopic ellipsometry for nondestructive characterization of free-carrier and crystal-structure properties of group-III-nitride semiconductor device heterostructures, 0000 (10 December 2001); doi: 10.1117/12.450109
Proc. SPIE 4449, IR spectroscopic ellipsometry for industrial characterization of semiconductors, 0000 (10 December 2001); doi: 10.1117/12.450110
Proc. SPIE 4449, Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool, 0000 (10 December 2001); doi: 10.1117/12.450081
Material and Thin Film Characterization
Proc. SPIE 4449, Standardization of the measurement of laser-induced damage threshold and material absorption, 0000 (10 December 2001); doi: 10.1117/12.450082
Proc. SPIE 4449, How to measure sub-ppm optical homogeneity in fused silica: impact of temperature on accuracy and reproducibility, 0000 (10 December 2001); doi: 10.1117/12.450083
Proc. SPIE 4449, Automated high-accuracy measuring system for specular microreflectivity, 0000 (10 December 2001); doi: 10.1117/12.450084
Proc. SPIE 4449, Measurement of the elastic constants of nanometric films, 0000 (10 December 2001); doi: 10.1117/12.450085
Particle Scattering
Proc. SPIE 4449, Use of light scatter signals to identify particle material, 0000 (10 December 2001); doi: 10.1117/12.450086
Proc. SPIE 4449, Effects of particle shape on particle identification and scatter predictions, 0000 (10 December 2001); doi: 10.1117/12.450087
Proc. SPIE 4449, Accurate sizing of deposited PSL spheres from light scatter measurements, 0000 (10 December 2001); doi: 10.1117/12.450088
Proc. SPIE 4449, Measuring the scatter distribution of PSL spheres on Si wafers using a fast calibrated CMOS photodetector array, 0000 (10 December 2001); doi: 10.1117/12.450090
Large Area and Aspheric Surface Inspection
Proc. SPIE 4449, Interferometric metrology of wafer nanotopography for advanced CMOS process integration, 0000 (10 December 2001); doi: 10.1117/12.450091
Proc. SPIE 4449, Rapid Confocal Sensor: a noncontact profilometer for fast 3D submicron inspection and metrology of large formats, 0000 (10 December 2001); doi: 10.1117/12.450092
Proc. SPIE 4449, Quasi-confocal extended field surface sensing, 0000 (10 December 2001); doi: 10.1117/12.450093
Proc. SPIE 4449, Advantages of a new subnanometer aspheric profiling technique with respect to the unique requirements of EUV lithography mirrors, 0000 (10 December 2001); doi: 10.1117/12.450094
Proc. SPIE 4449, Measurement of steep aspheres: a step forward to nanometer accuracy, 0000 (10 December 2001); doi: 10.1117/12.450095
Proc. SPIE 4449, Versatile optical system for static and dynamic thermo-magnetic recording using a scanning laser microscope, 0000 (10 December 2001); doi: 10.1117/12.450096
Nano Probes
Proc. SPIE 4449, Recommendations for the metrological calibration of SPMs: a survey on the European SPMet network project, 0000 (10 December 2001); doi: 10.1117/12.450097
Proc. SPIE 4449, AFM tip calibration using nanometer-sized structures induced by ion beam sputtering, 0000 (10 December 2001); doi: 10.1117/12.450098
Proc. SPIE 4449, Diffractive solid immersion lenses: characterization and manufacturing, 0000 (10 December 2001); doi: 10.1117/12.450099
X-Ray Techniques
Proc. SPIE 4449, Rapid x-ray reflectivity (XRR) characterization and process monitoring of multilayer Ta/Al2O3/Ta/SiO2/Si, 0000 (10 December 2001); doi: 10.1117/12.450101
Proc. SPIE 4449, X-ray study of surfaces and interfaces, 0000 (10 December 2001); doi: 10.1117/12.450102
Posters - Thursday
Proc. SPIE 4449, Stitching interferometry of aspherical surfaces, 0000 (10 December 2001); doi: 10.1117/12.450103
Proc. SPIE 4449, Microstructure of thin films: correlation with laser damage threshold, 0000 (10 December 2001); doi: 10.1117/12.450104
Proc. SPIE 4449, Polarized light scattering from metallic particles on silicon wafers, 0000 (10 December 2001); doi: 10.1117/12.450105
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