PROCEEDINGS VOLUME 4747
INTERNATIONAL CONFERENCE ON ATOMIC AND MOLECULAR PULSED LASERS IV | 10-14 SEPTEMBER 2001
International Conference on Atomic and Molecular Pulsed Lasers IV
INTERNATIONAL CONFERENCE ON ATOMIC AND MOLECULAR PULSED LASERS IV
10-14 September 2001
Tomsk, Russian Federation
Gass and Plasma Lasers
Proc. SPIE 4747, Superpowerful lasers on chain chemical reactions for studying dense relativistic plasma and laser fusion, 0000 (26 March 2002); doi: 10.1117/12.460102
Proc. SPIE 4747, Forming of powerful radiation beams of the pulsed photo-initiated chemical DF and HF lasers with divergence, close to diffraction, 0000 (26 March 2002); doi: 10.1117/12.460113
Proc. SPIE 4747, Scaling of pulsed-periodical electric-discharge wide-aperture lasers, 0000 (26 March 2002); doi: 10.1117/12.460124
Proc. SPIE 4747, Laser plasma electrical excitation methods: their properties, techniques, and specific applications, 0000 (26 March 2002); doi: 10.1117/12.460135
Proc. SPIE 4747, High-power pulse and pulse-periodic nonchain HF (DF) lasers, 0000 (26 March 2002); doi: 10.1117/12.460146
Proc. SPIE 4747, Efficient small-scale TEA CO2 laser for material surface modification, 0000 (26 March 2002); doi: 10.1117/12.460156
Proc. SPIE 4747, Influence of nonuniformity of active medium of a long-pulse electric discharge XeCl amplifier on radiation divergence, 0000 (26 March 2002); doi: 10.1117/12.460157
Proc. SPIE 4747, First results on the development of an energetic (sub)nanosecond XeCl laser system, 0000 (26 March 2002); doi: 10.1117/12.460158
Proc. SPIE 4747, Nitrogen laser with inductive-capacitive discharge stabilization, 0000 (26 March 2002); doi: 10.1117/12.460159
Proc. SPIE 4747, Pseudospark switch generators used for pumping exciplex lasers, 0000 (26 March 2002); doi: 10.1117/12.460103
Proc. SPIE 4747, Using SBS for improvement of output beam divergence in excimer laser systems, 0000 (26 March 2002); doi: 10.1117/12.460104
Proc. SPIE 4747, Optimization of generation parameters of the wide-aperture Xe laser pumped by an electron beam, 0000 (26 March 2002); doi: 10.1117/12.460105
Proc. SPIE 4747, XeCl master oscillator with 300-ns pulse duration, 0000 (26 March 2002); doi: 10.1117/12.460106
Proc. SPIE 4747, Influence of Q-factor value of optical resonator on spatial discharge structure and output characteristics of long pulse XeCl laser, 0000 (26 March 2002); doi: 10.1117/12.460107
Proc. SPIE 4747, Formation of pumping discharge of XeCl laser by means of semiconductor opening switch, 0000 (26 March 2002); doi: 10.1117/12.460108
Proc. SPIE 4747, Effect of pre-ionization border on development of inhomogeneities in electrical discharge pumped XeCl laser, 0000 (26 March 2002); doi: 10.1117/12.460109
Proc. SPIE 4747, Numerical simulation of pulse CO laser, 0000 (26 March 2002); doi: 10.1117/12.460110
Metal Vapor Lasers
Proc. SPIE 4747, Quasi two-dimensional model of large-bore Cu lasers, 0000 (26 March 2002); doi: 10.1117/12.460111
Proc. SPIE 4747, Large-bore copper vapor amplifier with slow buffer gas pumping, 0000 (26 March 2002); doi: 10.1117/12.460112
Proc. SPIE 4747, Influence of hydrogen on the optical and discharge properties of CuBr laser, 0000 (26 March 2002); doi: 10.1117/12.460114
Proc. SPIE 4747, Kinetic and experimental study on the influence of the inside tube diameter on the UV ion Ne-CuBr laser output parameters, 0000 (26 March 2002); doi: 10.1117/12.460115
Proc. SPIE 4747, Stability of longitudinal repetitively pulsed discharges in metal vapor lasers (the Petrash effect), 0000 (26 March 2002); doi: 10.1117/12.460116
Proc. SPIE 4747, Deionization of afterglow plasma of pulsed lasers through intensified ambipolar diffusion, 0000 (26 March 2002); doi: 10.1117/12.460117
Proc. SPIE 4747, Dynamics of cataphoresis in the pulse-periodic discharge, 0000 (26 March 2002); doi: 10.1117/12.460118
Proc. SPIE 4747, Influence of Cs on CVL operation, 0000 (26 March 2002); doi: 10.1117/12.460119
Proc. SPIE 4747, Frequency characteristics of sealed-off CuBr laser, 0000 (26 March 2002); doi: 10.1117/12.460120
Proc. SPIE 4747, Lead bromide vapor laser, 0000 (26 March 2002); doi: 10.1117/12.460121
Proc. SPIE 4747, Investigations of Bi vapor laser, 0000 (26 March 2002); doi: 10.1117/12.460122
Dye Lasers and Photoprocesses in complex organic molecules
Proc. SPIE 4747, Photophysical and lasing characterization of some phenylenevinylene-based polymers, 0000 (26 March 2002); doi: 10.1117/12.460123
Proc. SPIE 4747, Transformation of energy in some laser dyes under excitation by electrons, 0000 (26 March 2002); doi: 10.1117/12.460125
Proc. SPIE 4747, Photoprocesses in quinolone substituted, 0000 (26 March 2002); doi: 10.1117/12.460126
Proc. SPIE 4747, Quantum chemical calculations by INDO/S method of stilbene photoisomers, 0000 (26 March 2002); doi: 10.1117/12.460127
Proc. SPIE 4747, Improvement of photodecomposition methods of phenol containing exotoxicants in aqueous media, 0000 (26 March 2002); doi: 10.1117/12.460128
Proc. SPIE 4747, Pulse-periodic source of tunable radiation for the ultraviolet range of spectrum, 0000 (26 March 2002); doi: 10.1117/12.460129
Physical Processers in Gas Lasers
Proc. SPIE 4747, High-current discharge pumping of ArF, F2 lasers without cathode hot spots and filament instabilities, 0000 (26 March 2002); doi: 10.1117/12.460130
Proc. SPIE 4747, Single hot spot discharge in SF6 gas and in the mixture SF6/C2H6, 0000 (26 March 2002); doi: 10.1117/12.460131
Proc. SPIE 4747, Cathode layer parameters in high-pressure Xe excilamp, 0000 (26 March 2002); doi: 10.1117/12.460132
Proc. SPIE 4747, Electron energy distribution in CO2 and CO lasers plasma, 0000 (26 March 2002); doi: 10.1117/12.460133
Proc. SPIE 4747, Analytic and numerical calculations of thermal and electric characteristics of glow discharge chambers in gas flow, 0000 (26 March 2002); doi: 10.1117/12.460134
Laser Systems and Applications
Proc. SPIE 4747, Isotope separation by laser technology, 0000 (26 March 2002); doi: 10.1117/12.460136
Proc. SPIE 4747, Development of CO2 waveguide lasers and laser technology for remote sensing, 0000 (26 March 2002); doi: 10.1117/12.460137
Proc. SPIE 4747, Parameters of front-end system pulse on Iskra-5 installation, 0000 (26 March 2002); doi: 10.1117/12.460138
Proc. SPIE 4747, Medical complex for photodynamic therapy, 0000 (26 March 2002); doi: 10.1117/12.460139
Proc. SPIE 4747, Metal vapor laser and medicine: laser systems, methods, and therapy, 0000 (26 March 2002); doi: 10.1117/12.460140
Proc. SPIE 4747, Laser radiation absorption for various atmospheric paths based on experimental data on the spectral composition of the selected chemical lasers, 0000 (26 March 2002); doi: 10.1117/12.460141
Incoherent UV and VUV Sources and Laser Output Conversion
Proc. SPIE 4747, Discharge and radiation characteristics of Xe one-barrier excilamps, 0000 (26 March 2002); doi: 10.1117/12.460142
Proc. SPIE 4747, Excilamp application in the chemical sample pretreatment process, 0000 (26 March 2002); doi: 10.1117/12.460143
Proc. SPIE 4747, Processes of the formation of HgBr and HgCl excimer molecules in gas-discharge radiation sources, 0000 (26 March 2002); doi: 10.1117/12.460144
Proc. SPIE 4747, Wide-band radiation dynamics in rare gases using ion- and electron beam pumping, 0000 (26 March 2002); doi: 10.1117/12.460145
Proc. SPIE 4747, Electrodeless HF-lamps as UV and VUV light sources, 0000 (26 March 2002); doi: 10.1117/12.460147
Proc. SPIE 4747, Power and energy input determination for barrier discharge excilamps, 0000 (26 March 2002); doi: 10.1117/12.460148
Proc. SPIE 4747, Efficiency of UV wide-band source on transitions of Xe and Kr molecular ions, 0000 (26 March 2002); doi: 10.1117/12.460149
Proc. SPIE 4747, Xe(He)-I2 glow and capacitive discharge excilamps, 0000 (26 March 2002); doi: 10.1117/12.460150
Proc. SPIE 4747, Phase matching and optical properties of LiInS2 nonlinear crystal, 0000 (26 March 2002); doi: 10.1117/12.460151
Proc. SPIE 4747, Stimulated Mandelshtam-Brillouin light scattering and nonlinear absorption in an aqueous solution of nonelectrolyte, 0000 (26 March 2002); doi: 10.1117/12.460152
Proc. SPIE 4747, Electrodischarge VUV radiator of low pressure on the mixtures He(Ar, Kr, Xe)/H2O, 0000 (26 March 2002); doi: 10.1117/12.460153
Gass and Plasma Lasers
Proc. SPIE 4747, Longitudinally excited F2 laser and gain measurement at a total gas pressure of 40 Torr, 0000 (26 March 2002); doi: 10.1117/12.460154
Physical Processers in Gas Lasers
Proc. SPIE 4747, Gain measurements of Ar2* excimer formed by high-pressure homogeneous discharge using plasma electrode, 0000 (26 March 2002); doi: 10.1117/12.460155