Keynote Session
Proc. SPIE 4760, Pioneers of laser propulsion: Saenger, Marx, Moeckel, and Kantrowitz, 0000 (13 September 2002); doi: 10.1117/12.482032
Proc. SPIE 4760, Perspectives of laser processing and chemistry, 0000 (13 September 2002); doi: 10.1117/12.482081
Proc. SPIE 4760, Femtosecond laser ablation and nanostructuring, 0000 (13 September 2002); doi: 10.1117/12.482099
Plenary Session
Proc. SPIE 4760, The Airborne Laser, 0000 (13 September 2002); doi: 10.1117/12.482116
Proc. SPIE 4760, Excimer laser polymer ablation: the first twenty years, 0000 (13 September 2002); doi: 10.1117/12.482126
Proc. SPIE 4760, High-power CO lasers and some recent applications, 0000 (13 September 2002); doi: 10.1117/12.482131
Proc. SPIE 4760, Fundamentals and advantages in ultrafast micro-structuring of transparent materials, 0000 (13 September 2002); doi: 10.1117/12.482033
Proc. SPIE 4760, Polymers designed for laser applications: fundamentals and applications, 0000 (13 September 2002); doi: 10.1117/12.482044
High-Power Laser Interaction Physics: Plume Dynamics and Ablation Mechanisms
Proc. SPIE 4760, Dynamics of ultrashort pulse-laser ablation: equation-of-state considerations, 0000 (13 September 2002); doi: 10.1117/12.482055
Proc. SPIE 4760, Pulsed-laser ablation plume dynamics: characterization and modeling, 0000 (13 September 2002); doi: 10.1117/12.482066
Proc. SPIE 4760, UV and IR laser interaction with metal surfaces, 0000 (13 September 2002); doi: 10.1117/12.482075
High-Power Laser Interaction Physics: Wide-Gap Dielectrics and Surface Modification
Proc. SPIE 4760, Physics of high-average-power repetitively pulsed laser ablation of dielectric materials, 0000 (13 September 2002); doi: 10.1117/12.482077
Proc. SPIE 4760, Dynamical observation on laser ablation in bulk transparent materials, 0000 (13 September 2002); doi: 10.1117/12.482078
Proc. SPIE 4760, Light alloy upgrading by surface laser treatment, 0000 (13 September 2002); doi: 10.1117/12.482079
Proc. SPIE 4760, Laser ablation of dielectrics using ultrashort and temporally shaped laser pulses, 0000 (13 September 2002); doi: 10.1117/12.482080
Proc. SPIE 4760, Applications of high-power laser technology to wide-bandgap nitride semiconductor processing, 0000 (13 September 2002); doi: 10.1117/12.482082
High-Power Laser Interaction Physics: Nanoclusters, Nanostructure,and Applications
Proc. SPIE 4760, Two-dimensional simulation of nanocluster formation and comparison with experiments, 0000 (13 September 2002); doi: 10.1117/12.482083
Proc. SPIE 4760, Generation and manipulation of nanostructures by pulsed-laser ablation, 0000 (13 September 2002); doi: 10.1117/12.482084
Proc. SPIE 4760, Short-pulse laser processing of nanostructured materials, 0000 (13 September 2002); doi: 10.1117/12.482085
Proc. SPIE 4760, Synergisms at surfaces involving radiation and solvents: nanometer scale implications, 0000 (13 September 2002); doi: 10.1117/12.482086
Laboratory Scale Applications I
Proc. SPIE 4760, 3D effects in dry laser cleaning, 0000 (13 September 2002); doi: 10.1117/12.482087
Proc. SPIE 4760, Laser microprocessing in microelectronics, data storage, and photonics, 0000 (13 September 2002); doi: 10.1117/12.482088
Proc. SPIE 4760, Laser removal of oxide films: laser ultrasonics diagnostic, 0000 (13 September 2002); doi: 10.1117/12.482089
Proc. SPIE 4760, Microprocessing of glass by hybrid laser processing, 0000 (13 September 2002); doi: 10.1117/12.482090
Proc. SPIE 4760, Femtosecond and nanosecond laser removal of anodic oxide layers from aluminum, 0000 (13 September 2002); doi: 10.1117/12.482091
Polymers for Ablation
Proc. SPIE 4760, Deposition of chemically sensitive polymer films by picosecond resonant infrared laser ablation, 0000 (13 September 2002); doi: 10.1117/12.482092
Proc. SPIE 4760, Laser ablation of a triazene polymer studied by ns-interferometry and shadowgraphy, 0000 (13 September 2002); doi: 10.1117/12.482093
Proc. SPIE 4760, Numerical simulation of temperature field during laser sintering of polymer-coated metal powder, 0000 (13 September 2002); doi: 10.1117/12.482094
Proc. SPIE 4760, Chemical and structural modifications in the UV ablation of polymers, 0000 (13 September 2002); doi: 10.1117/12.482095
Laboratory Scale Applications II
Proc. SPIE 4760, New techniques for laser micromachining MEMS devices, 0000 (13 September 2002); doi: 10.1117/12.482096
Proc. SPIE 4760, Pulsed-laser deposited TiC coatings for MEMS, 0000 (13 September 2002); doi: 10.1117/12.482097
Proc. SPIE 4760, Diamond-like carbon deposited by femtosecond pulsed-laser ablation: evidence of nanocrystalline diamond, 0000 (13 September 2002); doi: 10.1117/12.482098
Proc. SPIE 4760, Shock pressure measurements in thermal radiation irradiated foam layered targets, 0000 (13 September 2002); doi: 10.1117/12.482100
Femtosecond Lasers and Effects I
Proc. SPIE 4760, Time-resolved femtosecond laser desorption from wide-bandgap single crystals, 0000 (13 September 2002); doi: 10.1117/12.482101
Proc. SPIE 4760, Processing of semiconductors with femtosecond lasers, 0000 (13 September 2002); doi: 10.1117/12.482102
Proc. SPIE 4760, Microscopic mechanisms of initiating of nonthermal femtosecond laser-induced ablation of transparent solid dielectrics, 0000 (13 September 2002); doi: 10.1117/12.482103
Proc. SPIE 4760, Femtosecond lasers: powerful tools for clean material processing, 0000 (13 September 2002); doi: 10.1117/12.482104
Femtosecond Lasers and Effects II
Proc. SPIE 4760, Tailored ablation processing of advanced materials by femtosecond laser pulse, 0000 (13 September 2002); doi: 10.1117/12.482105
Proc. SPIE 4760, Modifications of optical properties by ultra short laser pulses, 0000 (13 September 2002); doi: 10.1117/12.482106
Proc. SPIE 4760, Femtosecond laser drilling of high-aspect-ratio 1-micron holes in silicon, 0000 (13 September 2002); doi: 10.1117/12.482107
Proc. SPIE 4760, Deep drilling of metals by femtosecond laser pulses, 0000 (13 September 2002); doi: 10.1117/12.482108
Proc. SPIE 4760, Femtosecond laser-induced damage in absorbing filters used for laser protection, 0000 (13 September 2002); doi: 10.1117/12.482109
Proc. SPIE 4760, Technology developments toward the practical use of femtosecond laser micromaterials processing, 0000 (13 September 2002); doi: 10.1117/12.482110
Proc. SPIE 4760, Femtosecond laser interaction with energetic materials, 0000 (13 September 2002); doi: 10.1117/12.482111
Proc. SPIE 4760, Threshold characteristics of short and ultrashort laser pulse ablation of metals, 0000 (13 September 2002); doi: 10.1117/12.482112
Proc. SPIE 4760, Femtosecond time-resolved studies of laser ablation, 0000 (13 September 2002); doi: 10.1117/12.482113
EUV Lithography
Proc. SPIE 4760, Pump-probe extreme ultraviolet and x-ray studies of laser-droplet plasma dynamics, 0000 (13 September 2002); doi: 10.1117/12.482114
Proc. SPIE 4760, PREUVE and the EXULITE project: modular laser-produced plasma EUV source, 0000 (13 September 2002); doi: 10.1117/12.482115
Proc. SPIE 4760, Dynamics of high-repetition-rate laser plasma extreme ultraviolet sources from droplet targets, 0000 (13 September 2002); doi: 10.1117/12.482117
High-Peak-Power High-Energy Lasers I
Proc. SPIE 4760, Review of concepts for fielding 100-KW-class repetitively pulsed CO2 lasers, 0000 (13 September 2002); doi: 10.1117/12.482118
Proc. SPIE 4760, High-power CO-overtone laser, 0000 (13 September 2002); doi: 10.1117/12.482119
Proc. SPIE 4760, Ultrahigh-average-power solid state laser, 0000 (13 September 2002); doi: 10.1117/12.482120
Poster Session
Proc. SPIE 4760, Physics of laser action using high vibrational excitation of CO molecule, 0000 (13 September 2002); doi: 10.1117/12.482121
Advances in COIL Lasers
Proc. SPIE 4760, Problems of development of oxygen-iodine laser with electric discharge production of singlet delta oxygen, 0000 (13 September 2002); doi: 10.1117/12.482122
Proc. SPIE 4760, Pulsed mode of COIL, 0000 (13 September 2002); doi: 10.1117/12.482123
Proc. SPIE 4760, Tunable diode laser gain measurements on the HF(2-0) overtone transistions in a small-scale HF laser, 0000 (13 September 2002); doi: 10.1117/12.482124
Proc. SPIE 4760, 20-Kw nitrogen diluent chemical oxygen-iodine laser, 0000 (13 September 2002); doi: 10.1117/12.482125