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Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with β-tool development
Feasibility study of manufacturing process and quality control for the new alternating PSM structure
Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop
Simulation study of 193-nm phase-shifting masks: analysis of distributed defects of embeded attenuated phase mask (EAPSM)
Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses
Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results
Noncontact fluorescence measurements for inspection and imprint depth control in nanoimprint lithography