PROCEEDINGS VOLUME 4984
MICROMACHINING AND MICROFABRICATION | 25-31 JANUARY 2003
Micromachining Technology for Micro-Optics and Nano-Optics
IN THIS VOLUME

0 Sessions, 30 Papers, 0 Presentations
Etching  (3)
MICROMACHINING AND MICROFABRICATION
25-31 January 2003
San Jose, CA, United States
Advanced Lithography
Proc. SPIE 4984, Additive lithography for refractive micro-optics, 0000 (17 January 2003); doi: 10.1117/12.477839
Proc. SPIE 4984, Zone-plate array lithography (ZPAL): a maskless fast-turnaround system for micro-optic device fabrication, 0000 (17 January 2003); doi: 10.1117/12.477856
Proc. SPIE 4984, Hybrid phase and amplitude modulation proximity printing mask fabricated on DLC and SiO2 substrates, 0000 (17 January 2003); doi: 10.1117/12.477830
Polymers and Replication
Proc. SPIE 4984, Applications of spin-on glass for waveguide and micro-optical systems, 0000 (17 January 2003); doi: 10.1117/12.477859
Proc. SPIE 4984, UV-assisted rotational molding of microstructures using a conventional flexographic printing machine, 0000 (17 January 2003); doi: 10.1117/12.477838
Proc. SPIE 4984, Replication of micro-optical elements in hybrid organic-inorganic materials, 0000 (17 January 2003); doi: 10.1117/12.472901
Proc. SPIE 4984, Replication of micro-optical components by UV-molding process, 0000 (17 January 2003); doi: 10.1117/12.472903
Nanofabrication I
Proc. SPIE 4984, Fabrication of arbitrary three-dimensional photonic crystals by four-plane-wave interference, 0000 (17 January 2003); doi: 10.1117/12.477855
Proc. SPIE 4984, Nanofabrication of integrated diffractive optical elements, 0000 (17 January 2003); doi: 10.1117/12.477837
Proc. SPIE 4984, Novel fabrication methods for 2D photonic crystals in silicon slab waveguides, 0000 (17 January 2003); doi: 10.1117/12.477850
Nanofabrication II
Proc. SPIE 4984, Fabrication of infrared antennas using electron-beam lithography, 0000 (17 January 2003); doi: 10.1117/12.477851
Applications I
Proc. SPIE 4984, Overview of grey-scale photolithography for micro-optical elements fabrication, 0000 (17 January 2003); doi: 10.1117/12.477831
Proc. SPIE 4984, Novel type of micromachined retroreflector, 0000 (17 January 2003); doi: 10.1117/12.477834
Proc. SPIE 4984, New fabrication of highly dense electromagnetic field microactuators and micro-optics for MOEMS applications, 0000 (17 January 2003); doi: 10.1117/12.472900
Proc. SPIE 4984, Optical performance of a diode laser circularizer microlens, 0000 (17 January 2003); doi: 10.1117/12.472905
Proc. SPIE 4984, Nanofabrication and diffractive and microrefractive optics element applications in compact sensor systems, 0000 (17 January 2003); doi: 10.1117/12.477842
Applications II
Proc. SPIE 4984, Direct-write optical waveguides, 0000 (17 January 2003); doi: 10.1117/12.477840
Proc. SPIE 4984, Optical filter design with holographic photopolymer materials and selectively buried ion exchange optical waveguides, 0000 (17 January 2003); doi: 10.1117/12.477844
Proc. SPIE 4984, Space-variant polarization-state manipulation with computer-generated subwavelength gratings, 0000 (17 January 2003); doi: 10.1117/12.477853
Proc. SPIE 4984, Phase scanning in ruling engine for the fabrication of subnanometer varied line-space diffraction gratings, 0000 (17 January 2003); doi: 10.1117/12.477835
Laser Processing
Proc. SPIE 4984, Three-dimensional structuring of glass by ultrashort laser pulses, 0000 (17 January 2003); doi: 10.1117/12.477847
Proc. SPIE 4984, Time-tailored laser pulses: a new approach for laser micromachining and microfabrication processing, 0000 (17 January 2003); doi: 10.1117/12.477843
Proc. SPIE 4984, High-speed gray-scale laser direct-write technology for micro-optic fabrication, 0000 (17 January 2003); doi: 10.1117/12.472908
Proc. SPIE 4984, Laser ablation patterning of layered systems: a method to fabricate dielectric masks and diffractive phase elements, 0000 (17 January 2003); doi: 10.1117/12.472928
Proc. SPIE 4984, Direct writing of 40-nm features inside fused silica glass with oscillator ultrafast lasers, 0000 (17 January 2003); doi: 10.1117/12.477832
Etching
Proc. SPIE 4984, Microfabrication of controlled angle diffusers used for resolution enhancement in microlithography, 0000 (17 January 2003); doi: 10.1117/12.477845
Proc. SPIE 4984, Very deep fused silica etching, 0000 (17 January 2003); doi: 10.1117/12.477833
Proc. SPIE 4984, Novel approaches to maximizing micromachining throughput by minimizing positioner inertia, servo following errors, and unobservable resonant responses, 0000 (17 January 2003); doi: 10.1117/12.477861
Advanced Lithography
Proc. SPIE 4984, Plastic micro-optical components with LIGA technology, 0000 (17 January 2003); doi: 10.1117/12.499993
Poster Session
Proc. SPIE 4984, Novel method of fabrication of diffractive mocrolens arrays, 0000 (17 January 2003); doi: 10.1117/12.501841
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