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Concept of ultra-fast at-wavelength inspection of defects on a multilayer mask using a laser-produced plasma source
Comparison of pattern placement errors as measured using traditional overlay targets and design rule structures
Aerial image-based mask inspection: a development effort to detect what might impact printing image quality on wafers
Subnanometer wavelength metrology of lithographically prepraed structures: a comparison of neutron and X-ray scattering.
Improved gate process control at the 130-nm node using spectroscopic-ellipsometry-based profile metrology
Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration
Spectroscopic Ellipsometry based Scatterometry enabling 193nm Litho and Etch process control for the 110nm technology node and beyond
Quantitative profile-shape measurement study on a CD-SEM with application to etch-bias control and several different CMOS features
Calibration and validation of projection lithography in chemically amplified resist systems using fluorescence imaging
Nano precision AFM imaging by stereo deconvolution: theory; applications, and experimental validation