PROCEEDINGS VOLUME 5043
ADVANCED MICROELECTRONIC MANUFACTURING | 27-28 FEBRUARY 2003
Cost and Performance in Integrated Circuit Creation
IN THIS VOLUME

0 Sessions, 17 Papers, 0 Presentations
Reticle Cost  (2)
ADVANCED MICROELECTRONIC MANUFACTURING
27-28 February 2003
Santa Clara, CA, United States
Semiconductor Industry Economics
Proc. SPIE 5043, Silicon economics, 0000 (2 July 2003); doi: 10.1117/12.487632
Proc. SPIE 5043, Technology acceleration: the change in industry requirements, 0000 (2 July 2003); doi: 10.1117/12.485287
Proc. SPIE 5043, Technology acceleration: the suppliers' challenge, 0000 (2 July 2003); doi: 10.1117/12.485286
Process Control and Yield
Proc. SPIE 5043, Microeconomics of yield learning in semiconductor manufacturing, 0000 (2 July 2003); doi: 10.1117/12.485288
Proc. SPIE 5043, Microeconomics of process control in semiconductor manufacturing, 0000 (2 July 2003); doi: 10.1117/12.487631
Design Reuse and Reticle Cost
Proc. SPIE 5043, Value-based management of design reuse, 0000 (2 July 2003); doi: 10.1117/12.485274
Proc. SPIE 5043, Mask cost for sub-100-nm technologies: stopping a runaway?, 0000 (2 July 2003); doi: 10.1117/12.485282
Proc. SPIE 5043, Does technology acceleration equate to mask cost acceleration?, 0000 (2 July 2003); doi: 10.1117/12.485285
Reticle Cost
Proc. SPIE 5043, Multiproject wafers: not just for million-dollar mask sets, 0000 (2 July 2003); doi: 10.1117/12.497667
Proc. SPIE 5043, DIVAS: an integrated networked system for mask defect dispositioning and defect management, 0000 (2 July 2003); doi: 10.1117/12.487634
Cost-Effective Lithography
Proc. SPIE 5043, Toward performance-driven reduction of the cost of RET-based lithography control, 0000 (2 July 2003); doi: 10.1117/12.485277
Proc. SPIE 5043, Effects of grid-placed contacts on circuit performance, 0000 (2 July 2003); doi: 10.1117/12.485279
Proc. SPIE 5043, Cost-effective strategies for ASIC masks, 0000 (2 July 2003); doi: 10.1117/12.485280
Proc. SPIE 5043, Electrical validation of resolution enhancement techniques, 0000 (2 July 2003); doi: 10.1117/12.485275
Poster Session
Proc. SPIE 5043, Practical quality metrics for resolution enhancement software, 0000 (2 July 2003); doi: 10.1117/12.485281
Proc. SPIE 5043, Improving IC process efficiency with critical materials management, 0000 (2 July 2003); doi: 10.1117/12.485278
Proc. SPIE 5043, Understanding the operating expense relationships of layouts on excimer photo tools, 0000 (2 July 2003); doi: 10.1117/12.485273
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