PROCEEDINGS VOLUME 5044
ADVANCED MICROELECTRONIC MANUFACTURING | 27-28 FEBRUARY 2003
Advanced Process Control and Automation
IN THIS VOLUME

0 Sessions, 18 Papers, 0 Presentations
ADVANCED MICROELECTRONIC MANUFACTURING
27-28 February 2003
Santa Clara, CA, United States
Overlay and CD Control I
Proc. SPIE 5044, Industrial strength lithography APC, 0000 (1 July 2003); doi: 10.1117/12.485310
Proc. SPIE 5044, Optimal model-predictive control of overlay lithography implemented in an ASIC fab, 0000 (1 July 2003); doi: 10.1117/12.485303
Proc. SPIE 5044, Improving overlay control through proper use of multilevel query APC, 0000 (1 July 2003); doi: 10.1117/12.485304
Proc. SPIE 5044, Knowledge-based APC methodology for overlay control, 0000 (1 July 2003); doi: 10.1117/12.485308
Proc. SPIE 5044, Stepper registration feedback control in 300-mm manufacturing, 0000 (1 July 2003); doi: 10.1117/12.485313
Proc. SPIE 5044, Adaptive on-line estimation and control of overlay tool bias, 0000 (1 July 2003); doi: 10.1117/12.485294
Overlay and CD Control II
Proc. SPIE 5044, Improving overlay manufacturing metrics through application of feedforward mask-bias, 0000 (1 July 2003); doi: 10.1117/12.485314
Proc. SPIE 5044, Multiloop photolithography control using hierarchical context information for APC models, 0000 (1 July 2003); doi: 10.1117/12.485309
Proc. SPIE 5044, Exposure-focus critical dimension feedback control in 300-mm manufacturing technologies, 0000 (1 July 2003); doi: 10.1117/12.485312
Proc. SPIE 5044, Advanced process control for polysilicon gate etching using integrated optical CD metrology, 0000 (1 July 2003); doi: 10.1117/12.487635
Etch, CMP, CVD, and RTP Control
Proc. SPIE 5044, Computationally efficient modeling of wafer temperatures in an LPCVD furnace, 0000 (1 July 2003); doi: 10.1117/12.485299
Proc. SPIE 5044, Recursive least squares estimation and its application to shallow trench isolation, 0000 (1 July 2003); doi: 10.1117/12.485293
Algorithms, Architecture, and ROI
Proc. SPIE 5044, Process control systems integrated for future process technologies, 0000 (1 July 2003); doi: 10.1117/12.485311
Proc. SPIE 5044, Cost and revenue impact of advanced process control (APC) with an emphasis on run-to-run control (R2R), 0000 (1 July 2003); doi: 10.1117/12.485316
Proc. SPIE 5044, Knowledge-based process control for fault detection and classification, 0000 (1 July 2003); doi: 10.1117/12.485290
Poster Session
Proc. SPIE 5044, Neural-network-based run-to-run controller using exposure and resist thickness adjustment, 0000 (1 July 2003); doi: 10.1117/12.485298
Proc. SPIE 5044, APC system health indicators, or why Cpks aren't good enough, 0000 (1 July 2003); doi: 10.1117/12.485302
Proc. SPIE 5044, Parallel abstraction of software architecture and statistical principles for tighter process control, 0000 (1 July 2003); doi: 10.1117/12.485306
Back to Top