PROCEEDINGS VOLUME 5130
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY X | 16-18 APRIL 2003
Photomask and Next-Generation Lithography Mask Technology X
Editor(s): Hiroyoshi Tanabe
Editor Affiliations +
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY X
16-18 April 2003
Yokohama, Japan
Mask Development Strategy
Koichiro Hoh
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504045
Photomask Processes and Materials
Osamu Nozawa, Yuki Shiota, Hideaki Mitsui, Toshiyuki Suzuki, Yasushi Ohkubo, Masao Ushida, Satoshi Yusa, Toshiharu Nishimura, Kenji Noguchi, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504047
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504048
Wu-Song Huang, Wei He, Wenjie Li, Wayne M. Moreau, Robert Lang, David R. Medeiros, Karen E. Petrillo, Arpan P. Mahorowala, Marie Angelopoulos, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504049
Kotaro Ooishi, Yukihiko Esaki, Kazuo Sakamoto, Hideaki Sakurai, Masamitsu Itoh, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504050
Dong-Il Park, Eui-Sang Park, Jong-Hwa Lee, Woo-Gun Jeong, Sun-Kyu Seo, Hyuk-Joo Kwon, Jin-Min Kim, Sung-Mo Jung, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504051
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504052
Jason O. Clevenger, Melisa J. Buie, Nicole L. Sandlin
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504053
Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504055
Inspection, Repair, and Metrology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504058
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504059
Anja Rosenbusch, Shirley Hemar, Reuven Falah
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504060
Klaus Edinger, Volker A. Boegli, Michael Budach, Ottmar Hoinkis, Bernd Weyrauch, Hans W. P. Koops, Johannes Bihr, Jens Greiser
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504061
Same-Ting Chen, Tzy-Ying Lin, Chue-San Yoo
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504063
Peter Kuschnerus, Thomas Engel, Axel M. Zibold, Claudia Hertfelder, Takashi Yasui, Iwao Higashikawa, Christof M. Schilz, Armin Semmler
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504064
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504065
NGL Mask Technology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504066
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504067
Hideyuki Eguchi, Toshiaki Kurosu, Takashi Yoshii, Hiroshi Sugimura, Kojiro Itoh, Akira Tamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504234
Fumio Murai, Hiroshi Fukuda, Shigeki Mori, Akio Sato, Kyoji Nakajo
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504235
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504237
Charles W. Gwyn, Peter J. Silverman
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504239
Takeo Watanabe, Tsuneyuki Haga, Tsutomu Shoki, Kazuhiro Hamamoto, Shintaro Takada, Naoki Kazui, Satoshi Kakunai, Harushige Tsubakino, Hiroo Kinoshita
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504240
Guenther G. Ruhl, Josef Mathuni, Dirk Knobloch, Frank-Michael Kamm, Jenspeter Rau, Florian Letzkus, Reinhard Springer
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504243
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504244
Kokoro Kato, Kuninori Nishizawa, Tamae Haruki, Tadao Inoue
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504245
Hiroshi Sugimura, Hideyuki Eguchi, Takashi Yoshii, Akira Tamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504246
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504248
Kenta Yotsui, Gaku Suzuki, Akira Tamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504250
Yuuki Aritsuka, Yukio Iimura, Morihisa Hoga, Hisatake Sano
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504926
Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shoji Nohama, Isao Ashida, Shigeru Moriya, Tetuya Kitagawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504258
Shoji Nohama, Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shigeru Moriya, Tetuya Kitagawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504273
Kohichi Nakayama, Kazuharu Inoue, Isao Ashida, Shinji Omori, Hidetoshi Ohnuma
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504071
Morio Hosoya, Tsutomu Shoki, Takeru Kinoshita, Noriyuki Sakaya, Osamu Nagarekawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504072
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504075
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504376
Phase-Shift and OPC Mask Technology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504379
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504380
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504382
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504391
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504393
Stephen D. Hsu, Douglas J. Van Den Broeke, Xuelong Shi, Michael Hsu, Kurt E. Wampler, J. Fung Chen, Annie Yu, Samuel C. Yang, Frank Hsieh
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504394
Sungmin Huh, JoHyung Park, Dong-Hoon Chung, Chang-Hwan Kim, In-Kyun Shin, Sung-Woon Choi, Jung-Min Sohn
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504395
Sung-Won Kwon, Heong-Sup Jeong, Lee-Ju Kim, Chang-Nam Ahn, Hong-Seok Kim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504175
Chun-hung Lin, Michael Hsu, Frank Hsieh, Shu Yi Lin, Stephen D. Hsu, Xuelong Shi, Douglas J. Van Den Broeke, J. Fung Chen, F. C. Tang, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504176
Mask Development Strategy
Nobuyuki Yoshioka, Masaki Yamabe, Wataru Wakamiya, Nobuhiro Endo
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504177
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504178
Photomask Processes and Materials
Michael D. Kriese, James L. Wood, James R. Rodriguez, Gary Fournier, David L. Thompson, David Mercer, Jason A. Gass, Dale E. Mauldin
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504179
SungKwan Kim, YangSoo Kim, Myung-Ah Kang, Jung-Min Sohn, Kwangsoo No
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504180
Woong-Won Seo, Si-Yeul Yoon, Dong-Il Park, Eui-Sang Park, Jin-Min Kim, Sung-Mo Jeong, Sang-Soo Choi, Han-Sun Cha, K. S. Nam
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504181
Teruhiko Kumada, Koji Tange, Kazuyuki Maetoko, Kunihiro Hosono, Masayoshi Tsuzuki, Kyoichi Yonetani, Reiji Terada, Yukio Nakashiba, Shingo Anzai, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504182
Masahiro Hashimoto, Yasunori Yokoya, Takao Higuchi, Fumiko Ohta, Shouichi Kawashima, Yasushi Ohkubo
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504183
Woo-Gun Jeong, Dong-Il Park, Eui-Sang Park, Sun-Kyu Seo, Hyuk-Joo Kwon, Jin-Min Kim, Sung-Mo Jung, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504184
Mathias Irmscher, Lothar Berger, Dirk Beyer, Joerg Butschke, Peter Dress, Thomas Hoffmann, Peter Hudek, Corinna Koepernik, Martin Tschinkl, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504185
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504186
Dong-Il Park, Sun-Kyu Seo, Woo-Gun Jeong, Eui-Sang Park, Jong-Hwa Lee, Hyuk-Joo Kwon, Jin-Min Kim, Sung-Mo Jung, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504187
Kyung-Han Nam, Hyun-Joon Cho, Seung Hee Baek, Seong-Ho Jeong, Chang-Nam Ahn, Hong-Seok Kim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504188
Cheng-ming Lin, Rick Lai, W. H. Huang, B. C. Wang, C. Y. Chen, C. H. Kung, Chue-San Yoo, Jieh-Jang Chen, Sheng-Cha Lee
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504189
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504190
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504191
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504192
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504193
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504195
Il-Yong Jang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Jung-Min Sohn
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504196
Jason Plumhoff, Chris Constantine, Jong Shin, B. Reelfs, Emmanuel Rausa, Jason M. Benz, Michael S. Hibbs, Timothy A. Brunner
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504198
Rex B. Anderson, Guenther G. Ruhl, Pavel Nesladek, Gerhard Prechtl, Winfried Sabisch, Alfred Kersch, Melisa J. Buie
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504199
Noriyuki Harashima, Takaei Sasaki, Kiyoshi Kuwahara, Toshio Hayashi, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Mutsumi Hara, Yukio Ohkubo
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504200
Inspection, Repair, and Metrology
Wolfgang Dettmann, Jan P. Heumann, Tanja Hagner, Roderick Koehle, Stephen Rahn, Martin Verbeek, Mardjan Zarrabian, Jens Weckesser, Mario Hennig, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504202
Tomoyuki Okada, Masahiko Minemura, Kazuhiko Takahashi, Mitsuo Sakurai, Satoshi Akutagawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504203
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504204
Jung-Kwan Lee, Dae-Woo Kim, Kyong-Mun Shin, Dong-Heok Lee, Jin-Min Kim, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504205
Motonari Tateno, Naohisa Takayama, Shingo Murakami, Keiichi Hatta, Shinji Akima, Fuyuhiko Matsuo, Masao Otaki, Byung-Gook Kim, Keishi Tanaka, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504206
Yoshikazu Nagamura, Kazuyuki Maetoko, Kiyoshi Maeshima, Naohisa Tamada, Kunihiro Hosono, Masaya Fujimoto, Yutaka Kodera, Koji Goto, Tsuyoshi Narita, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504207
Yoshikazu Nagamura, Itaru Kanai, Koji Tange, Kunihiro Hosono, Koki Hayashi, Hidehiro Ikeda, Susumu Nagashige, Mikio Ishijima, Hironobu Iwasaki, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504208
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504209
Dae-Woo Kim, Jung-Kwan Lee, Sang-Hoi Koo, Dong-Heok Lee, Jin-Min Kim, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504210
Joshua Lessing, Tod Robinson, Rey A. Brannen, Troy B. Morrison, Theresa Holtermann
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504211
Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504212
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504213
Dag Lindquist, Andrew W. Kulawiec, Mark J. Tronolone, Jack Frankovich, Chris Lee, Simon Lee, Yoshihiro Nakamura, Takayuki Murakami
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504214
Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Thomas Engel, Axel M. Zibold, Claudia Hertfelder, Yuji Kobiyama, Jan-Peter Urbach, Christof M. Schilz, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504215
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504216
Leslie L. Deck, Chris Van Peski, Richard D. Eandi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504217
Mask Data Preparation and Design Automation
Koki Kuriyama, Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojo, Yuichi Kawase, Shigehiro Hara, Morihisa Hoga, Satoshi W. Watanabe, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504218
Juergen Gramss, Melchior Lemke, Hans Eichhorn, Voler Neick, Michael Kramer, Erhard Stache
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504219
Shih-Ying Chen, Eric C. Lynn
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504220
Linard N. Karklin, Micha Oren, Dragos Dudau, James D. Jordan
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504251
Mask Development Strategy
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504253
Mask Data Preparation and Design Automation
Youping Zhang, Minghui Fan
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504254
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504255
Equipment
Junji Hirumi, Koki Kuriyama, Nobuyuki Yoshioka, Ryoichi Yoshikawa, Yutaka Hojo, Takashi Matuzaka, Kazumitsu Tanaka, Morihisa Hoga
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504259
Mats Ekberg, Per-Uno Skotte, Tomas Utterback, Swaraj Paul, Oleg P. Kishkovich, James S. Hudzik
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504260
Tadashi Komagata, Yuichi Kawase, Yasutoshi Nakagawa, Nobuo Gotoh, Kazumitsu Tanaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504261
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504262
Tatsuo Morimoto, Kazumitsu Nakamura, Hiroshi Kubota, Akira Nakada, Takayuki Akamichi, Tsuneo Inokuchi, Kouji Kosaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504264
Quality Assurance, Defect Reduction, and Pelliclization
Julio R. Reyes, Curt Jackson, Laurent Dieu, William Bowers, Russell Stevens
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504265
Shigeto Shigematsu, Toshihiko Nakano, H. Shigemoto, Masahiro Kondo, Hiroaki Nakagawa, H. Sasaki, Iwao Higashikawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504266
Thuc H. Dam, Matt Pekny, Jim Millino, Gibson Luu, Nitesh Melwani, Aparna Venkatramani, Malahat Tavassoli
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504267
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504268
Mask Data Preparation and Design Automation
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504270
Toshiya Kotani, Hirotaka Ichikawa, Takanori Urakami, Shigeki Nojima, Sachiko Kobayashi, Yoko Oikawa, Satoshi Tanaka, Atsuhiko Ikeuchi, Kiminobu Suzuki, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504271
Hidemuchi Kawase, Tomoko Kamimoto, Hiroji Ogasawara, Koki Kuriyama, Junji Hirumi, Nobuyuki Yoshioka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504272
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504274
Equipment
Masaomi Tanaka, Suyo Asai, H. Kawano, Ken Iizumi, Kazuyoshi Oonuki, Hiroyuki Takahashi, Hidetoshi Sato, Rikio Tomiyoshi, Kazui Mizuno, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504275
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology X, (2003) https://doi.org/10.1117/12.504276