PROCEEDINGS VOLUME 5148
19TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS | 13-15 JANUARY 2003
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
IN THIS VOLUME

0 Sessions, 30 Papers, 0 Presentations
OPC  (2)
Metrology I  (4)
NGL Masks  (3)
Inspection  (4)
Metrology II  (5)
19TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS
13-15 January 2003
Sonthofen, Germany
Keynote and Overview Papers
Proc. SPIE 5148, Through the looking glass: what is on the horizon for the mask maker?, 0000 (28 May 2003); doi: 10.1117/12.514946
OPC
Proc. SPIE 5148, Integration of OPC and mask data preparation, 0000 (28 May 2003); doi: 10.1117/12.514947
Proc. SPIE 5148, Accuracy vs. complexity: tradeoffs in OPC options, 0000 (28 May 2003); doi: 10.1117/12.514949
Metrology I
Proc. SPIE 5148, Development and characterization of new CD mask standards: a status report, 0000 (28 May 2003); doi: 10.1117/12.514952
Proc. SPIE 5148, New methods for CD measurements on photomasks using dark field optical microscopy, 0000 (28 May 2003); doi: 10.1117/12.514956
Proc. SPIE 5148, Performance of the aerial image measurement system for 157-nm lithography, 0000 (28 May 2003); doi: 10.1117/12.514958
Proc. SPIE 5148, Mask CD characterization with EUV reflectometry at the electron storage ring BESSY II, 0000 (28 May 2003); doi: 10.1117/12.514961
Defect Printability and Repair
Proc. SPIE 5148, Printability study for phase-shift masks at 193-nm lithography, 0000 (28 May 2003); doi: 10.1117/12.514964
Proc. SPIE 5148, Electron-beam mask repair with induced reactions, 0000 (28 May 2003); doi: 10.1117/12.514972
Keynote and Overview Papers
Proc. SPIE 5148, Early mask making during the 1960s in Dresden, 0000 (28 May 2003); doi: 10.1117/12.515064
Proc. SPIE 5148, Integration of mask R&D and mask manufacturing to support the European semiconductor industry, 0000 (28 May 2003); doi: 10.1117/12.515067
Poster Session
Proc. SPIE 5148, Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks, 0000 (28 May 2003); doi: 10.1117/12.515073
Proc. SPIE 5148, Compact excimer laser: light source for optical (mask) inspection systems, 0000 (28 May 2003); doi: 10.1117/12.515083
Proc. SPIE 5148, Use of nanomachining for 100-nm mask repair, 0000 (28 May 2003); doi: 10.1117/12.515088
NGL Masks
Proc. SPIE 5148, Ultrathin-membrane EPL masks, 0000 (28 May 2003); doi: 10.1117/12.515090
Inspection
Proc. SPIE 5148, Extending TeraStar reticle inspection capability to the 90-nm node through layer-specific algorithms, 0000 (28 May 2003); doi: 10.1117/12.515100
Proc. SPIE 5148, Inspection of alternating phase-shift masks through the use of phase contrast techniques, 0000 (28 May 2003); doi: 10.1117/12.515102
Proc. SPIE 5148, Inspecting alternating phase shift masks by matching stepper conditions, 0000 (28 May 2003); doi: 10.1117/12.515103
Proc. SPIE 5148, Method to determine a detection capability of the die-to-database mask inspection system in regard to pinhole and pindot defects, 0000 (28 May 2003); doi: 10.1117/12.515104
Metrology II
Proc. SPIE 5148, Feature proximity errors on mask: assessment results of commercially obtained reticles, 0000 (28 May 2003); doi: 10.1117/12.515106
Proc. SPIE 5148, Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec <M5k> DUV tool, 0000 (28 May 2003); doi: 10.1117/12.515107
Proc. SPIE 5148, Implementation of 248-nm-based CD metrology for advanced reticle production, 0000 (28 May 2003); doi: 10.1117/12.515114
Proc. SPIE 5148, Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment, 0000 (28 May 2003); doi: 10.1117/12.515116
Proc. SPIE 5148, Contact hole litho correlation with shape analysis, 0000 (28 May 2003); doi: 10.1117/12.515117
Data Flow and Process Automation
Proc. SPIE 5148, Compensation of long-range process effects on photomasks by design data correction, 0000 (28 May 2003); doi: 10.1117/12.515122
Proc. SPIE 5148, System to improve the understanding of collected logistic data to optimize cycle time and delivery performance, 0000 (28 May 2003); doi: 10.1117/12.515141
Proc. SPIE 5148, Yield Mask: first professional yield management tool specifically developed for a mask house, 0000 (28 May 2003); doi: 10.1117/12.515142
MST-related Technologies
NGL Masks
Proc. SPIE 5148, Selete activity of 157-nm lithography and masks, 0000 (28 May 2003); doi: 10.1117/12.515146
Proc. SPIE 5148, Simulation study of pattern printability for reflective mask in EUV lithography, 0000 (28 May 2003); doi: 10.1117/12.515147
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