PROCEEDINGS VOLUME 5188
OPTICAL SCIENCE AND TECHNOLOGY, SPIE'S 48TH ANNUAL MEETING | 3-8 AUGUST 2003
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
OPTICAL SCIENCE AND TECHNOLOGY, SPIE'S 48TH ANNUAL MEETING
3-8 August 2003
San Diego, California, United States
Reflectometry, Polarimetry, Ellipsometry
Proc. SPIE 5188, Characterization of polarization aberrations in liquid crystal devices, 0000 (4 November 2003); doi: 10.1117/12.505871
Material and Thin Film Characterization
Proc. SPIE 5188, Manufacturability considerations in designing optical monitoring methods for control of plasma etch processes, 0000 (4 November 2003); doi: 10.1117/12.506671
Reflectometry, Polarimetry, Ellipsometry
Proc. SPIE 5188, Thin film 193-nm TNK measurement using multidomain genetic algorithm (MDGA) and with a combination of Beam Profile Reflectometry (BPR), Absolute Ellipsometry (AE), and spectroscopic ellipsometry (SE), 0000 (4 November 2003); doi: 10.1117/12.507466
Proc. SPIE 5188, Optical characterization in wide spectral range by a coherent spectrophotometer, 0000 (4 November 2003); doi: 10.1117/12.508642
Interferometry
Proc. SPIE 5188, Three-dimensional reconstruction of refractive index distribution in optical phase elements by interferometric and photoelastic tomography, 0000 (4 November 2003); doi: 10.1117/12.512195
Proc. SPIE 5188, Recent advances in the development of phase-shifting liquid crystal interferometers for visible and near-IR applications, 0000 (4 November 2003); doi: 10.1117/12.506025
Proc. SPIE 5188, Digital demodulation of an interferometer for the characterization of vibrating microstructures, 0000 (4 November 2003); doi: 10.1117/12.505795
Proc. SPIE 5188, Quadrature phase-shift interferometer (QPSI) decoding algorithms and error analysis, 0000 (4 November 2003); doi: 10.1117/12.504939
Characterization in the VUV to XUV Regimes
Proc. SPIE 5188, Optimization of optical coatings for the UV/VUV range, 0000 (4 November 2003); doi: 10.1117/12.507067
Proc. SPIE 5188, Absorption measurement of DUV optical materials at 193 and 157 nm by laser-induced deflection, 0000 (4 November 2003); doi: 10.1117/12.506795
Proc. SPIE 5188, Surface characterization of optically polished CaF2 crystal by quasi-Brewster-angle technique, 0000 (4 November 2003); doi: 10.1117/12.507180
Proc. SPIE 5188, VUV light-scattering measurements of substrates and thin film coatings, 0000 (4 November 2003); doi: 10.1117/12.505585
Proc. SPIE 5188, Laser-induced fluorescence of calcium fluoride at 193 and 157 nm excitation, 0000 (4 November 2003); doi: 10.1117/12.506787
Proc. SPIE 5188, Image detection system for 157 nm using fluorescent glass, 0000 (4 November 2003); doi: 10.1117/12.506755
Proc. SPIE 5188, At-wavelength metrology on Sc-based multilayers for the UV and water window, 0000 (4 November 2003); doi: 10.1117/12.505695
Proc. SPIE 5188, Mueller matrix polarimeter in 157 nm, 0000 (4 November 2003); doi: 10.1117/12.507038
Material and Thin Film Characterization
Proc. SPIE 5188, Photothermal microscopy and laser damage in optical components, 0000 (4 November 2003); doi: 10.1117/12.505890
Proc. SPIE 5188, Advanced industrial fluorescence metrology used for qualification of high-quality optical materials, 0000 (4 November 2003); doi: 10.1117/12.506814
Proc. SPIE 5188, Accuracy of optical thin film parameter determination based on spectrophotometric data, 0000 (4 November 2003); doi: 10.1117/12.505499
Poster Session
Proc. SPIE 5188, Reliable determination of wavelength dependence of thin film refractive index, 0000 (4 November 2003); doi: 10.1117/12.505554
Material and Thin Film Characterization
Proc. SPIE 5188, Characterization of Ag-Sb-Te alloy and their films for phase-change optical memories, 0000 (4 November 2003); doi: 10.1117/12.505604
Nanostructure Analysis
Proc. SPIE 5188, Advanced transmission electron microscopy for nano-optics, 0000 (4 November 2003); doi: 10.1117/12.508143
Proc. SPIE 5188, One way to accomplish the advanced requests of nanometrology: the nanometer coordinate measuring machine (NCMM), 0000 (4 November 2003); doi: 10.1117/12.505684
Proc. SPIE 5188, Characterization procedures for nanorough ultrahydrophobic surfaces with controlled optical matter, 0000 (4 November 2003); doi: 10.1117/12.505599
Proc. SPIE 5188, Enhancement and quenching of the fluorescence of single CdSe/ZnS quantum dots studied by confocal apertureless near-field scanning optical microscope, 0000 (4 November 2003); doi: 10.1117/12.504880
Imperfections, Roughness and Scatter
Proc. SPIE 5188, Characterizing surface roughness of thin films by polarized light scattering, 0000 (4 November 2003); doi: 10.1117/12.506909
Proc. SPIE 5188, Localization of sub-100-nm particles on wafers with solid state detector arrays, 0000 (4 November 2003); doi: 10.1117/12.507440
Joint Session with Conference 5190: Complex Surfaces and Angles
Proc. SPIE 5188, Low- and mid-spatial-frequency component measurement for aspheres, 0000 (4 November 2003); doi: 10.1117/12.503699
Proc. SPIE 5188, An automated subaperture stitching interferometer workstation for spherical and aspherical surfaces, 0000 (4 November 2003); doi: 10.1117/12.506254
Proc. SPIE 5188, Absolute high-accuracy deflectometric measurement of topography, 0000 (4 November 2003); doi: 10.1117/12.507867
Joint Session with Conference 5190: Measuring Nanometer-sized Dimensions
Proc. SPIE 5188, Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods, 0000 (4 November 2003); doi: 10.1117/12.509713
Poster Session
Proc. SPIE 5188, Phase-shifting algorithm via wavelength tuning based on temporal Fourier transform, 0000 (4 November 2003); doi: 10.1117/12.505523
Proc. SPIE 5188, Double-diode configuration of self-calibrating photodiodes, 0000 (4 November 2003); doi: 10.1117/12.504089
Proc. SPIE 5188, Finite difference approach to optical scattering of gratings, 0000 (4 November 2003); doi: 10.1117/12.507464
Proc. SPIE 5188, Information reconstruction based on phase-shifting technique in digital holography, 0000 (4 November 2003); doi: 10.1117/12.505450
Proc. SPIE 5188, Radioactive decay of excitations in ZnSe (Te), 0000 (4 November 2003); doi: 10.1117/12.508381
Proc. SPIE 5188, Single steady frequency and narrow-linewidth external-cavity semiconductor laser, 0000 (4 November 2003); doi: 10.1117/12.504456
Proc. SPIE 5188, New magnetic semiconductor sulfospinels with cobalt, 0000 (4 November 2003); doi: 10.1117/12.504044
Material and Thin Film Characterization
Proc. SPIE 5188, A review of the emerging SEMI standards for particle scanners, 0000 (4 November 2003); doi: 10.1117/12.519111
Characterization in the VUV to XUV Regimes
Proc. SPIE 5188, Comparison of roughness measurement with atomic force microscopy and interference microscopy, 0000 (4 November 2003); doi: 10.1117/12.521309
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