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Initial experimental verification: characterizing tool illumination and PSM performance with phase-shifting masks
Predictive modeling of advanced illumination pupils used as imaging enhancement for low-k1 applications
Study of air-bubble-induced light scattering effect on image quality in 193-nm immersion lithography
Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets
Characterization of ACLV for advanced technology nodes using scatterometer-based lens fingerprinting technique
Monte-Carlo-based analysis of local CD variation and application to establish realistic process and tool error budgets