PROCEEDINGS VOLUME 5378
MICROLITHOGRAPHY 2004 | 22-27 FEBRUARY 2004
Data Analysis and Modeling for Process Control
MICROLITHOGRAPHY 2004
22-27 February 2004
Santa Clara, California, United States
Keynote Paper
Proc. SPIE 5378, Intel nanotechnology integrated process control systems: an overview, 0000 (29 April 2004); doi: 10.1117/12.543298
Advanced Process Control I
Proc. SPIE 5378, In-tool process control for advanced patterning based on integrated metrology, 0000 (29 April 2004); doi: 10.1117/12.537444
Proc. SPIE 5378, Multivariable versus univariable APC, 0000 (29 April 2004); doi: 10.1117/12.536472
Proc. SPIE 5378, Advanced process control applied to metal layer overlay process, 0000 (29 April 2004); doi: 10.1117/12.531837
Data Modeling for Control I
Proc. SPIE 5378, Modeling for profile-based process-window metrology, 0000 (29 April 2004); doi: 10.1117/12.540914
Proc. SPIE 5378, Model-based fault detection and metrology error rejection in registration APC system, 0000 (29 April 2004); doi: 10.1117/12.536810
Proc. SPIE 5378, Advanced module-based approach to effective CD prediction of sub-100nm patterns, 0000 (29 April 2004); doi: 10.1117/12.536345
Proc. SPIE 5378, Propagation of APC models across product boundaries, 0000 (29 April 2004); doi: 10.1117/12.536454
CD Uniformity Control: Joint Session with Conf. 5875
Proc. SPIE 5378, Comparing the transient response of a resistive-type sensor with a thin film thermocouple during the post-exposure bake process, 0000 (29 April 2004); doi: 10.1117/12.535522
Proc. SPIE 5378, Intra-wafer CDU characterization to determine process and focus contributions based on scatterometry metrology, 0000 (29 April 2004); doi: 10.1117/12.543786
Advanced Process Control II: Joint Session with Conf. 5375
Proc. SPIE 5378, In-line lithography cluster monitoring and control using integrated scatterometry, 0000 (29 April 2004); doi: 10.1117/12.537384
Proc. SPIE 5378, Complementary feed-forward and feedback method for improved critical dimension control, 0000 (29 April 2004); doi: 10.1117/12.535204
Methods for Data Analysis and Automation
Proc. SPIE 5378, Automatic defect classification using topography map from SEM photometric stereo, 0000 (29 April 2004); doi: 10.1117/12.532961
Proc. SPIE 5378, Automated fault detection and classification of etch systems using modular neural networks, 0000 (29 April 2004); doi: 10.1117/12.536870
Proc. SPIE 5378, Integrated electrical and SEM-based defect characterization for rapid yield ramp, 0000 (29 April 2004); doi: 10.1117/12.536469
Proc. SPIE 5378, PVD fault detection using disparate integrated data sources, 0000 (29 April 2004); doi: 10.1117/12.540790
Proc. SPIE 5378, CD error budget analysis in ArF lithography, 0000 (29 April 2004); doi: 10.1117/12.534582
Advanced Process Control II
Proc. SPIE 5378, Improvement of 90nm KrF Cu process window by minimizing via deformation caused by low-frequency resonance of scanner projection lens, 0000 (29 April 2004); doi: 10.1117/12.535046
Proc. SPIE 5378, Use case approach to integrating and implementing lithography run-to-run control, 0000 (29 April 2004); doi: 10.1117/12.535667
Proc. SPIE 5378, Enhancement of photolithographic performance by implementing an advanced process control system, 0000 (29 April 2004); doi: 10.1117/12.535554
Data Modeling for Control II
Proc. SPIE 5378, Yield loss in lithographic patterning at the 65nm node and beyond, 0000 (29 April 2004); doi: 10.1117/12.537349
Proc. SPIE 5378, Improving manufacturing variability control in advanced CMOS technology by using TCAD methodology, 0000 (29 April 2004); doi: 10.1117/12.537172
Proc. SPIE 5378, Mix-and-match overlay method by compensating dynamic scan distortion error, 0000 (29 April 2004); doi: 10.1117/12.535097
Proc. SPIE 5378, Necessary nonzero lithography overlay correctables for improved device performance for 110nm generation and lower geometries, 0000 (29 April 2004); doi: 10.1117/12.535258
Data Modeling for Control I
Proc. SPIE 5378, Simulation benchmarking for the whole resist process, 0000 (29 April 2004); doi: 10.1117/12.536210
Poster Session
Proc. SPIE 5378, Development of customer assistance software for alignment parameter optimization, 0000 (29 April 2004); doi: 10.1117/12.536104
Back to Top