PROCEEDINGS VOLUME 5446
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XI | 14-16 APRIL 2004
Photomask and Next-Generation Lithography Mask Technology XI
Editor(s): Hiroyoshi Tanabe
Editor Affiliations +
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XI
14-16 April 2004
Yokohama, Japan
Photomask and Lithography Strategy
Markus Dilger, Jan Hendrik Peters
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557674
Photomask Processes and Materials
Sungmin Huh, Ki-Sung Yoon, Il-Yong Jang, Jung-Hyun Hwang, In-Kyun Shin, Sung-Woon Choi, Woo-Sung Han
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557675
Chia-Jen Chen, Hsin-Chang Lee, Lee-Chih Yeh, Kai-Chung Liu, Ta-Cheng Lien, Yi-Chun Chuo, Hung-Chang Hsieh, Burn J. Lin
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557676
Ho-Yong Jung, Sung Jin Choi, Mun-Sik Kim, Dong Wook Lee, Junsik Lee, Oscar Han
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557677
Mathias Irmscher, Dirk Beyer, Joerg Butschke, Peter Hudek, Corinna Koepernik, Jason Plumhoff, Emmanuel Rausa, Mitsuru Sato, Peter Voehringer
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557686
Kazumasa Takeshi, Naoko Ito, Daisuke Inokuchi, Yasushi Nishiyama, Yuichi Fukushima, Yasuhiro Okumoto
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557692
Photomask and Lithography Strategy
David H. Hwang, Wen-Hao Cheng
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557697
Cleaning and Quality Assurance
Zih-Wen Chang, Chen-Ming Wu, Mabel Mo, Chin-Chung Shieh, D.S. Cheng, Chun-Chien Chen, Richard Y. Yang, David W. Randall, Wen-Cheng Yu
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557698
Florence O. Eschbach, Daniel Tanzil, Michael Kovalchick, Uwe U. Dietze, Min Liu, Fei Xu
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557700
Hiroyuki Ishii, Atsushi Tobita, Yusuke Shoji, Hiroko Tanaka, Akihiko Naito, Hiroyuki Miyashita
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557701
Chia Hwa Shiao, Chien-Chung Tsai, Tony Hsu, Steve Tuan, Doris Chang, Richard Chen, Frank Hsieh
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557702
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557703
Photomask Processes and Materials
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557706
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557707
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557708
Tae-Joong Ha, Young-Mo Lee, Bo Kyung Choi, Yongkyoo Choi, Oscar Han
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557709
Jaecheon Shin, Tae-Joong Ha, Bo-Kyung Choi, Oscar Han
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557710
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557711
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557713
Lothar Berger, Werner Saule, Peter Dress, Thomas M. Gairing, C.-J. Chen, Hsin-Chang Lee, Hung-Chang Hsieh
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557714
Hideo Kobayashi, Tomohiro Shirane, Atsuo Imai, Keiji Tsukuda, Shoji Yamamoto
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557715
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557718
Corinna Koepernik, Joerg Butschke, Dirk Beyer, Mathias Irmscher, Bernd Leibold, Emmanuel Rausa, Rainer Plontke, Jason Plumhoff, Peter Voehringer
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557719
Curt A. Jackson, Peter D. Buck, Sarah Cohen, Vishal Garg, Jason Hickethier, Charles H. Howard, Robert M. Kiefer, Matt J. Lamantia, John C. Manfredo, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557720
Yong-Dae Kim, Dae-Woo Kim, Dong-Seuk Lee, Pil-Jin Jang, Hyuk-Joo Kwon, Hyun-Jun Cho, Jin-Min Kim, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557721
Cleaning and Quality Assurance
Kyoko Sakai, Yo Sakata, Yuichi Fukushima, Yasuhiro Okumoto
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557722
Masayoshi Mori, Isao Miyazaki, Ken Fujimoto, Kunihiro Hosono
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557724
Inspection and Repair
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557725
Dong-Hoon Paul Chung, Katsumi Ohira, Nobuyuki Yoshioka, Kenichi Matsumura, Toru Tojo, Masao Otaki
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557726
Kyong Mun Shin, Dae-Woo Kim, Jung-Kwan Lee, Dong-Hyuk Lee, Jin-Min Kim, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557728
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557729
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557730
Yoh Yamamoto, Masakatsu Hasuda, Hiroyuki Suzuki, Makoto Sato, Osamu Takaoka, Hiroshi Matsumura, Noboru Matsumoto, Kouji Iwasaki, Ryoji Hagiwara, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557731
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557733
Katsumi Ohira, Dong Hoon Paul Chung, Yoshioka Nobuyuki, Motonari Tateno, Kenichi Matsumura, Jiunn-Hung Chen, Gerard T. Luk-Pat, Norio Fukui, Yoshio Tanaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557734
Jeffrey E. Csuy, Ron R. Bozak, Lee Terrill, Roy White, Naoki Nishida
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557736
Tod E. Robinson, Anthony Graupera, Troy B. Morrison, Marcus Ramstein
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557737
Mask Data Preparation and Design Process Integration
Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojyo, Yuichi Kawase, Shigehiro Hara, Koki Kuriyama, Morihisa Hoga, Satoshi W. Watanabe, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557738
Chih-tung Hsu, Y. S. Chen, S. C. Hsin, Laurent C. Tuo, Steffen F. Schulze
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557739
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557740
Norihiko Miyazaki, N. Iriki, M. Homma, T. Sato, M. Mori, Tadashi Imoriya, Toshio Onodera, T. Matsuda, Hidehiro Higashino, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557741
OPC and Lithography Technology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557742
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557745
Robert John Socha, Douglas J. Van Den Broeke, Stephen D. Hsu, J. Fung Chen, Thomas L. Laidig, Noel P. Corcoran, Uwe Hollerbach, Kurt E. Wampler, Xuelong Shi, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557747
Yung-Chiang Ting, Shyi-Long Shy, Ming-Chun Lee, Bau-Tong Dai
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557750
Phase Shift Masks
Douglas J. Van Den Broeke, Thomas L. Laidig, J. Fung Chen, Kurt E. Wampler, Stephen D. Hsu, Xuelong Shi, Robert John Socha, Mircea V. Dusa, Noel P. Corcoran
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557751
Yung-Tin Chen
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557752
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557753
William Y. Chou, Shih Ming Yen, J. K. Wu, W. B. Shieh, Mars Chuang, George Fan, Chin Chih Tseng, Gregory P. Hughes, Susan S. MacDonald, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557754
Equipment
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557757
Norio Kimura, Tadashi Komagata, Yasutoshi Nakagawa, Nobuo Gotoh, Kazumitsu Tanaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557758
Junji Hirumi, Nobuyuki Yoshioka, Hiromichi Hoshi, Hiroyoshi Ando, Seiichi Tsuchiya, Morihisa Hoga
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557759
Steve E. Jones, Mark Chapman, Lucy Attwood
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557760
Metrology
Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Wolfgang Degel, Klaus Boehm, Axel M. Zibold, Yuji Kobiyama, Jan-Peter Urbach, Christof M. Schilz, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557762
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557763
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557765
Christopher A. Lee, Andrew W. Kulawiec, Mark J. Tronolone, Yoshihiro Nakamura, Takayuki Murakami
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557766
Wei Chu, Xuezeng Zhao, Joseph Fu, Theodore V. Vorburger
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557767
Lili Zhou, Xuezeng Zhao, Weijie Wang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557768
Masks for EUVL
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557770
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557771
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557772
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557773
Masks for E-Beam and X-ray
Satoshi Yusa, Mikio Ishikawa, Yoshinori Kinase, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Houga, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557774
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557776
Yuuki Aritsuka, Minoru Kitada, Masaru Kurosawa, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Hoga, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557777
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557778
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557779
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557780
Jingqiu Liang, Zichun Le, Weibiao Wang, Liangqiang Peng, Weihua Lan, Anjie Ming, Jian Ye, Bisheng Quan, Jinsong Yao, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557781
Inspection and Repair
Eiji Yamanaka, Shingo Kanamitsu, Takashi Hirano, Satoshi Tanaka, Takahiro Ikeda, Osamu Ikenaga, Tsukasa Kawashima, Syogo Narukawa, Hideaki Kobayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557782
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557784
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557786
Ted Liang, Alan R. Stivers, Michael Penn, Dan Bald, Chetan Sethi, Volker Boegli, Michael Budach, Klaus Edinger, Petra Spies
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557788
Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Junichi Tashiro, Katsumi Suzuki, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557789
Mask Data Preparation and Design Process Integration
Michael Hsu, Thomas L. Laidig, Kurt E. Wampler, Stephen D. Hsu, Xuelong Shi, J. Fung Chen, Douglas J. Van Den Broeke, Frank Hsieh
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557792
OPC and Lithography Technology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557793
Xuelong Shi, Thomas L. Laidig, J. Fung Chen, Douglas J. Van Den Broeke, Stephen D. Hsu, Michael Hsu, Kurt E. Wampler, Uwe Hollerbach
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557794
Kohji Hashimoto, Hiroharu Fujise, Shigeki Nojima, Takeshi Ito, Takahiro Ikeda
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557795
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557797
Phase Shift Masks
Hans W. Becker, Frank Schmidt, Frank Sobel, Markus Renno, Ute Buttgereit, Jay Chey, Marie Angelopoulos, Konrad Knapp, Gunter Hess
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557798
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557800
Yosuke Kojima, Toshio Konishi, Jun Sasaki, Keishi Tanaka, Toru Komizo, Motohiko Morita, Masanori Shirasaki, Takashi Ohshima, Hiroyuki Takahashi, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557801
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557802
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557803
Equipment
Henrik Sjoberg, Jean-Michel Chauvet, Jan Harkesjo, Peter Hogfeldt, Andrzej Karawajczyk, Johan Karlsson, Lars Kjellberg, Jonas Mahlen, Angela Beyerl, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557805
Michael E. Ungureit, Samuel C. Howells, T. Chabreck, J. Hubbard, Asher Klatchko, Peter Y. Pirogovsky, Robin L. Teitzel, Andrew Berwick, B. Skyborg, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557806
Zhigang Wang, Hidetoshi Satoh, Hiroyuki Ito, Yasunari Sohda, Hiroya Ohta, Hajime Kawano, Yasuhiro Kadowaki, Kazui Mizuno, Takashi Matsuzaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557807
Metrology
Roman Kris, Ovadya Menadeva, Aviram Tam, Ram Peltinov, Liraz Segal, Nadav Wertsman, Naftali Shcolnik, Gidon Gottlib, Arcadiy Vilenkin
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557808
Ebru Apak, T. P. Sarathy, William A. McGahan, Pablo I. Rovira, Ray J. Hoobler
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557809
Kirk Miller, Katsuhiro Matsuyama, Ingo Schmitz, Dean J. Dawson
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557810
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557811
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557812
Masks for EUVL
Scott Daniel Hector, Kevin Kemp
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557813
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557814
Kousuke Nakajima, Nobuo Kawasaki, Toshihide Nakajima
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557815
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557816
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557817
Masks for E-Beam and X-ray
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557818
Satoru Maruyama, Nakahiro Harada, Jiro Yamamoto, Naoyuki Nakamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557819
Shigeki Mori, Akio Sato, Kyoji Nakajo, Masanori Shoji, Naomi Shimada, Hirokazu Sambayashi, Kenzo Goto, Fumio Murai, Hiroshi Fukuda
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557820
Shinji Omori, Shinichiro Nohdo, Tomonori Motohashi, Tetsuya Kitagawa, Takashi Susa, Kenta Yotsui, Kojiro Itoh, Akira Tamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557821
Kazuya Iwase, Shinji Omori, Shoji Nohama, Kenta Yotsui, Gaku Suzuki, Yushin Sasaki, Kojiro Itoh, Akira Tamura, Satoru Maruyama, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.557822
Photomask Processes and Materials
Colbert Lu, Torey Huang, Shone Lee
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XI, (2004) https://doi.org/10.1117/12.562776