PROCEEDINGS VOLUME 5533
OPTICAL SCIENCE AND TECHNOLOGY, THE SPIE 49TH ANNUAL MEETING | 2-6 AUGUST 2004
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
OPTICAL SCIENCE AND TECHNOLOGY, THE SPIE 49TH ANNUAL MEETING
2-6 August 2004
Denver, Colorado, United States
EUVL Systems: Source, Mirror Manufacturing, and Metrology
Proc. SPIE 5533, Compact debris-free EUV source for advanced mirror metrology, 0000 (18 October 2004); doi: 10.1117/12.554892
Poster Session
Proc. SPIE 5533, Source collection optics for EUV lithography, 0000 (18 October 2004); doi: 10.1117/12.549409
EUVL Systems: Source, Mirror Manufacturing, and Metrology
Proc. SPIE 5533, Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA, 0000 (18 October 2004); doi: 10.1117/12.559210
Proc. SPIE 5533, EUV microlithography: a challenge for optical metrology, 0000 (18 October 2004); doi: 10.1117/12.556317
Proc. SPIE 5533, Recent progress of EUV wavefront metrology in EUVA, 0000 (18 October 2004); doi: 10.1117/12.562431
Coating
Proc. SPIE 5533, Design and development of an optical system for EUV-microscopy, 0000 (18 October 2004); doi: 10.1117/12.559675
Proc. SPIE 5533, A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU, 0000 (18 October 2004); doi: 10.1117/12.559395
Proc. SPIE 5533, Investigations of large x-ray optics for free electron lasers, 0000 (18 October 2004); doi: 10.1117/12.559619
Proc. SPIE 5533, Hard X-ray multilayer coated astronomical mirrors by e-beam deposition, 0000 (18 October 2004); doi: 10.1117/12.562085
Proc. SPIE 5533, Smoothing of substrate roughness by carbon-based layers prepared by pulsed laser deposition (PLD), 0000 (18 October 2004); doi: 10.1117/12.560358
X-Ray Optics Fabrication
Proc. SPIE 5533, Fabrication and testing of Wolter type-I mirrors for soft x-ray microscopes, 0000 (18 October 2004); doi: 10.1117/12.557617
Proc. SPIE 5533, Advances in the use of plasma spraying for the fabrication of lightweight x-ray optics, 0000 (18 October 2004); doi: 10.1117/12.560421
Proc. SPIE 5533, Magnetorheological finishing of large and lightweight optics, 0000 (18 October 2004); doi: 10.1117/12.559814
Proc. SPIE 5533, System wavefront correction using a complex aspheric mirror, 0000 (18 October 2004); doi: 10.1117/12.567162
X-Ray Optics Manufacturing and Metrology
Proc. SPIE 5533, Fabrication technology of ultraprecise mirror optics to realize hard x-ray nanobeam, 0000 (18 October 2004); doi: 10.1117/12.567501
Proc. SPIE 5533, Effect of silicon anisotropy on mirror substrate design, 0000 (18 October 2004); doi: 10.1117/12.561438
Proc. SPIE 5533, Vibration diagnosis and remediation design for an x-ray optics stitching interferometer system, 0000 (18 October 2004); doi: 10.1117/12.560646
Proc. SPIE 5533, Moiré interferometry formulas for hard x-ray wavefront sensing, 0000 (18 October 2004); doi: 10.1117/12.559695
Poster Session
Proc. SPIE 5533, How and why side cooling of high-heat-load optics works, 0000 (18 October 2004); doi: 10.1117/12.561435
Proc. SPIE 5533, New multilayer coating for 30.4-nm radiation, 0000 (18 October 2004); doi: 10.1117/12.558976
Proc. SPIE 5533, Microstitching interferometry for nanofocusing mirror optics, 0000 (18 October 2004); doi: 10.1117/12.567511
Proc. SPIE 5533, Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement, 0000 (18 October 2004); doi: 10.1117/12.567515
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