PROCEEDINGS VOLUME 5641
PHOTONICS ASIA | 8-11 NOVEMBER 2004
MEMS/MOEMS Technologies and Applications II
PHOTONICS ASIA
8-11 November 2004
Beijing, China
Photonic MEMS I
Proc. SPIE 5641, Electromagnetic MEMs eight-channel variable optical attenuator array, 0000 (30 December 2004); doi: 10.1117/12.574536
Proc. SPIE 5641, Dielectric-based distributed Bragg reflector (DBR) mirrors for tunable MOEMS applications, 0000 (30 December 2004); doi: 10.1117/12.572816
Proc. SPIE 5641, Structure design of Si-based M-Z interference acceleration seismic geophone, 0000 (30 December 2004); doi: 10.1117/12.573534
Proc. SPIE 5641, Design considerations for electrostatically tunable InP-based Fabry-Perot filters for WDM applications, 0000 (30 December 2004); doi: 10.1117/12.577776
Photonic MEMS II
Proc. SPIE 5641, The application of laser micromachining technology in fiber optic sensing, 0000 (30 December 2004); doi: 10.1117/12.581189
Proc. SPIE 5641, The study on the compound x-ray refractive lens using LIGA technique, 0000 (30 December 2004); doi: 10.1117/12.570760
Proc. SPIE 5641, Silicon scanning mirror with 54.74-degree slanted reflective surface for fluorescence scanning system, 0000 (30 December 2004); doi: 10.1117/12.575974
Characterization I
Proc. SPIE 5641, Origin mechanism of residual stresses in porous silicon film, 0000 (30 December 2004); doi: 10.1117/12.574579
Proc. SPIE 5641, Optical properties study of silicon oxynitride films deposited by RF magnetron sputtering, 0000 (30 December 2004); doi: 10.1117/12.574768
Proc. SPIE 5641, Lumped model for the comb-finger capacitance and electrostatic force, 0000 (30 December 2004); doi: 10.1117/12.577315
Proc. SPIE 5641, Simulation and comparison of movable membrane design for MEMS Fabry-Perot tunable filter, 0000 (30 December 2004); doi: 10.1117/12.575143
Characterization II
Proc. SPIE 5641, The deflection and frequency analysis of the inhomogeneous silicon cantilever beam for microrelay, 0000 (30 December 2004); doi: 10.1117/12.569014
Proc. SPIE 5641, 3D Align overlay verification using glass wafers, 0000 (30 December 2004); doi: 10.1117/12.573807
Posters - Thursday
Proc. SPIE 5641, A novel system to measure MEMS motion, 0000 (30 December 2004); doi: 10.1117/12.574167
Characterization II
Proc. SPIE 5641, Analysis of the structures and characteristics for an InP-based micromechanical tunable filter, 0000 (30 December 2004); doi: 10.1117/12.578453
Proc. SPIE 5641, Study on application and analysis of a microaccelerometer with magnetorheological fluids, 0000 (30 December 2004); doi: 10.1117/12.569574
Sensors and Actuators
Proc. SPIE 5641, BioMEMS for high-throughput handling and microinjection of embryos, 0000 (30 December 2004); doi: 10.1117/12.584626
Proc. SPIE 5641, Torsion-mirror optical actuators with compound driving structures, 0000 (30 December 2004); doi: 10.1117/12.576590
Proc. SPIE 5641, A high-g overload-protected accelerometer with a novel microstructure, 0000 (30 December 2004); doi: 10.1117/12.581191
Proc. SPIE 5641, Mechanism and experiment study on photothermally excited bilayer silicon microcantilever resonators, 0000 (30 December 2004); doi: 10.1117/12.572752
Design and Applications
Proc. SPIE 5641, Polymer-derived ceramic-based fuel atomizers, 0000 (30 December 2004); doi: 10.1117/12.581188
Proc. SPIE 5641, Single crystalline silicon micromirror array for maskless photolithography in protein synthesis systems, 0000 (30 December 2004); doi: 10.1117/12.574010
Proc. SPIE 5641, Microfluidic dye laser integration in a lab-on-a-chip device, 0000 (30 December 2004); doi: 10.1117/12.576780
Micromachining and Lithography I
Proc. SPIE 5641, Development of microfabrication technology for MEMS/MOEMS applications, 0000 (30 December 2004); doi: 10.1117/12.581272
Proc. SPIE 5641, Two new types of microneedle array fabricated by x-ray lithography, 0000 (30 December 2004); doi: 10.1117/12.566563
Proc. SPIE 5641, Fabrication of anisotropic structures with large aspect ratio and minimal roughness by using black silicon method, 0000 (30 December 2004); doi: 10.1117/12.570968
Proc. SPIE 5641, Electrochemical etching of deep-macropore array on p-type silicon wafers, 0000 (30 December 2004); doi: 10.1117/12.572181
Micromachining and Lithography II
Proc. SPIE 5641, The microfabrication using powder materials with excimer laser, 0000 (30 December 2004); doi: 10.1117/12.570167
Proc. SPIE 5641, Fabrication of grating waveguides based on nano-imprint lithography and silicon-mould replication techniques, 0000 (30 December 2004); doi: 10.1117/12.573604
Proc. SPIE 5641, Microfabrication assisted by laser-trapped microparticle tools, 0000 (30 December 2004); doi: 10.1117/12.576129
Proc. SPIE 5641, Fabrication of PDMS (poly-dimethyl siloxane) molding and 3D structure by two-photon absorption induced by an ultrafast laser, 0000 (30 December 2004); doi: 10.1117/12.576633
Proc. SPIE 5641, Analysis on the optical MEMS pressure sensors based on circular multilayer diaphragm, 0000 (30 December 2004); doi: 10.1117/12.573685
Posters - Thursday
Proc. SPIE 5641, Theoretical calculation of light-induced forces and torques on complex microrotors, 0000 (30 December 2004); doi: 10.1117/12.575262
Proc. SPIE 5641, Design of electrostatically levitated micromachined rotational gyroscope based on UV-LIGA technology, 0000 (30 December 2004); doi: 10.1117/12.575632
Proc. SPIE 5641, Parallel valveless micropump with two flexible diaphragms, 0000 (30 December 2004); doi: 10.1117/12.575835
Proc. SPIE 5641, Theoretical analysis of grating light valve, 0000 (30 December 2004); doi: 10.1117/12.576828
Proc. SPIE 5641, Microfluid oscillator based on thermocapillarity, 0000 (30 December 2004); doi: 10.1117/12.569524
Proc. SPIE 5641, Preparation of multimode fiber grating by microprocessing modification and their temperature-sensing properties, 0000 (30 December 2004); doi: 10.1117/12.579845
Proc. SPIE 5641, Optimization of torque on an optically driven micromotor by manipulation of the index of refraction, 0000 (30 December 2004); doi: 10.1117/12.580273
Proc. SPIE 5641, Fabrication and application of a novel freestanding stencil bi-material cantilever structure, 0000 (30 December 2004); doi: 10.1117/12.569916
Proc. SPIE 5641, X-ray lithography mask fabricated by excimer laser process, 0000 (30 December 2004); doi: 10.1117/12.566583
Proc. SPIE 5641, Study on optical parts of MOEMS optical switch with low insertion loss, 0000 (30 December 2004); doi: 10.1117/12.570729
Proc. SPIE 5641, Extraction of exposure modeling parameters of thick resist, 0000 (30 December 2004); doi: 10.1117/12.571891
Proc. SPIE 5641, Silicon microhole array prepared by ICP, 0000 (30 December 2004); doi: 10.1117/12.572084
Proc. SPIE 5641, Progress in large-range and nanoscale micromotion stage, 0000 (30 December 2004); doi: 10.1117/12.572897
Proc. SPIE 5641, A model for the microfabrication with selective laser sintering metal powders, 0000 (30 December 2004); doi: 10.1117/12.573514
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