PROCEEDINGS VOLUME 5720
MOEMS-MEMS MICRO AND NANOFABRICATION | 22-27 JANUARY 2005
Micromachining Technology for Micro-Optics and Nano-Optics III
IN THIS VOLUME

0 Sessions, 29 Papers, 0 Presentations
Applications  (1)
MOEMS-MEMS MICRO AND NANOFABRICATION
22-27 January 2005
San Jose, California, United States
Nanofabrication I
Proc. SPIE 5720, Holographic fabrication of photonic crystals, 0000 (22 January 2005); doi: 10.1117/12.597621
Proc. SPIE 5720, Fabrication of three-dimensional Yablonovite photonic crystals by multiple-exposure UV interference lithography, 0000 (22 January 2005); doi: 10.1117/12.591090
Proc. SPIE 5720, Modeling the formation of photonic crystals by holographic lithography, 0000 (22 January 2005); doi: 10.1117/12.601186
Proc. SPIE 5720, Fabrication of three-dimensional photonic crystals with multilayer photolithography, 0000 (22 January 2005); doi: 10.1117/12.589139
Etching Micro- and Nano-Optics
Proc. SPIE 5720, Etching of micro- and nano-structures in semiconductor and glass material systems, 0000 (22 January 2005); doi: 10.1117/12.600789
Proc. SPIE 5720, Etching three-dimensional photonic crystals in GaAs, 0000 (22 January 2005); doi: 10.1117/12.591282
Proc. SPIE 5720, Submicron sculpturing on chalcogenide films, 0000 (22 January 2005); doi: 10.1117/12.588563
Advanced Lithography I
Proc. SPIE 5720, Electron-beam lithography for micro and nano-optical applications, 0000 (22 January 2005); doi: 10.1117/12.600784
Proc. SPIE 5720, Design and fabrication of trihedral corner-cube arrays using analog exposure based on phase masks, 0000 (22 January 2005); doi: 10.1117/12.591996
Proc. SPIE 5720, Fabrication of optical microstructures through fractional Talbot imaging, 0000 (22 January 2005); doi: 10.1117/12.599125
Proc. SPIE 5720, Study on 193-nm immersion interference lithography, 0000 (22 January 2005); doi: 10.1117/12.600795
Waveguide Devices
Proc. SPIE 5720, Fabrication techniques for low-loss silicon nitride waveguides, 0000 (22 January 2005); doi: 10.1117/12.588828
Proc. SPIE 5720, Spectral-band engineering with interacting resonant leaky modes in thin periodic films, 0000 (22 January 2005); doi: 10.1117/12.601191
Proc. SPIE 5720, Deep PFCB polymer etch development for photonic devices, 0000 (22 January 2005); doi: 10.1117/12.591161
Proc. SPIE 5720, Improved fabrication accuracy of Bragg gratings, 0000 (22 January 2005); doi: 10.1117/12.594382
Applications
Proc. SPIE 5720, Formation of discrete space-variant subwavelength dielectric gratings for polarimetric measurements, 0000 (22 January 2005); doi: 10.1117/12.590143
Nanofabrication II
Proc. SPIE 5720, Dielectric pinholes for laser-beam filtering, 0000 (22 January 2005); doi: 10.1117/12.590473
Proc. SPIE 5720, UV laser cutting of organic nanofibers, 0000 (22 January 2005); doi: 10.1117/12.589682
Proc. SPIE 5720, Integrated optics devices for long-ranging surface plasmons: fabrication challenges and solutions, 0000 (22 January 2005); doi: 10.1117/12.600788
Advanced Lithography II
Proc. SPIE 5720, Photonic systems formed by proximity field nanopatterning, 0000 (22 January 2005); doi: 10.1117/12.597652
Proc. SPIE 5720, CAD-integrated system for automated multi-photon three-dimensional micro- and nano-fabrication, 0000 (22 January 2005); doi: 10.1117/12.601187
Proc. SPIE 5720, Advanced laser micro-structuring of super-large-area optical films, 0000 (22 January 2005); doi: 10.1117/12.599396
Poster Session
Proc. SPIE 5720, Polarization converting element for minimizing the losses in cylindrical hollow waveguides, 0000 (22 January 2005); doi: 10.1117/12.593226
Proc. SPIE 5720, On-chip replication of high-sag micro-optical components fabricated by direct laser writing, 0000 (22 January 2005); doi: 10.1117/12.591719
Proc. SPIE 5720, Fabrication of macroporous TiO2 monoliths for photonic applications, 0000 (22 January 2005); doi: 10.1117/12.591059
Proc. SPIE 5720, Multilayer coating method for x-ray reflectivity enhancement of polysilicon micro-mirrors at 1.54-Å wavelength, 0000 (22 January 2005); doi: 10.1117/12.590429
Proc. SPIE 5720, Characterization of chemically assisted ion beam etching and form birefringence structure fabrication in GaAs using SU-8, 0000 (22 January 2005); doi: 10.1117/12.590564
Proc. SPIE 5720, Formation of photonic structures in Sm2+-doped aluminosilicate glasses through phase separation, 0000 (22 January 2005); doi: 10.1117/12.590712
Proc. SPIE 5720, Polarization separation element (subwavelength structure), 0000 (22 January 2005); doi: 10.1117/12.608418
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