PROCEEDINGS VOLUME 5755
MICROLITHOGRAPHY 2005 | FEB 27 - MAR 4 2005
Data Analysis and Modeling for Process Control II
MICROLITHOGRAPHY 2005
Feb 27 - Mar 4 2005
San Jose, California, United States
Advanced Process Control I
Proc. SPIE 5755, Advanced method for run-to-run control of photolithography overlay registration in high-mix semiconductor production, 0000 (17 May 2005); doi: 10.1117/12.599733
Proc. SPIE 5755, A new run-to-run control method for oxide CMP process, 0000 (17 May 2005); doi: 10.1117/12.599603
Proc. SPIE 5755, Advanced process control for deep sub-100nm gate fabrication, 0000 (17 May 2005); doi: 10.1117/12.599284
Proc. SPIE 5755, Robust control of lithographic process in semiconductor manufacturing, 0000 (17 May 2005); doi: 10.1117/12.600365
Data Modeling for Control I
Proc. SPIE 5755, Correlation analysis: a fast and reliable method for a better understanding of simulation models in optical lithography, 0000 (17 May 2005); doi: 10.1117/12.599390
Proc. SPIE 5755, Practical pattern recognition of high-magnification targets, 0000 (17 May 2005); doi: 10.1117/12.599492
Proc. SPIE 5755, Oxide etch rate estimation using plasma impedance monitoring, 0000 (17 May 2005); doi: 10.1117/12.599997
Proc. SPIE 5755, Automated yield forecasting in a high product mix ASIC facility, 0000 (17 May 2005); doi: 10.1117/12.600079
Proc. SPIE 5755, Flash memory-cell characterization using two-transistor cell compact macro-model for system-on-chip design, 0000 (17 May 2005); doi: 10.1117/12.601974
Proc. SPIE 5755, Robust linear regression for modeling systematic spatial wafer variation, 0000 (17 May 2005); doi: 10.1117/12.600198
Joint Session I: CD Uniformity Control
Proc. SPIE 5755, Real-time temperature characterization and monitoring as a method of fault isolation, 0000 (17 May 2005); doi: 10.1117/12.600189
Proc. SPIE 5755, Etch, reticle, and track CD fingerprint corrections with local dose compensation, 0000 (17 May 2005); doi: 10.1117/12.602129
Joint Session II: Advanced Process Control
Proc. SPIE 5755, Bayesian networks in overlay recipe optimization, 0000 (17 May 2005); doi: 10.1117/12.599613
Proc. SPIE 5755, Full-field feature profile models in process control, 0000 (17 May 2005); doi: 10.1117/12.600240
Proc. SPIE 5755, Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system, 0000 (17 May 2005); doi: 10.1117/12.598983
Methods for Data Analysis and Automation
Proc. SPIE 5755, Automated process control optimization to control low volume products based on high volume products data, 0000 (17 May 2005); doi: 10.1117/12.598409
Proc. SPIE 5755, An electrostatic analysis of subthreshold behavior in FINFET, 0000 (17 May 2005); doi: 10.1117/12.597698
Proc. SPIE 5755, ROI on yield data analysis systems through a business process management strategy, 0000 (17 May 2005); doi: 10.1117/12.600057
Proc. SPIE 5755, Broadband RF process-state sensor for fault detection and classification, 0000 (17 May 2005); doi: 10.1117/12.606991
Advanced Process Control II
Proc. SPIE 5755, Real-time control of photoresist absorption coefficient uniformity, 0000 (17 May 2005); doi: 10.1117/12.598582
Proc. SPIE 5755, Inheritance scheme for cascading lithography process control parameters technology, layer, and tool, 0000 (17 May 2005); doi: 10.1117/12.598749
Poster Session
Proc. SPIE 5755, Log data extraction and correlation miner for lithography management system: LMS-LEC, 0000 (17 May 2005); doi: 10.1117/12.594994
Advanced Process Control II
Proc. SPIE 5755, Wafer sampling by regression for systematic wafer variation detection, 0000 (17 May 2005); doi: 10.1117/12.600217
Proc. SPIE 5755, A flexible architecture for advanced process control solutions, 0000 (17 May 2005); doi: 10.1117/12.607230
Poster Session
Proc. SPIE 5755, Reduction of edge defocus by modification of chuck shape on Nikon scanner S204B, 0000 (17 May 2005); doi: 10.1117/12.598097
Proc. SPIE 5755, Real-time control of photoresist development process, 0000 (17 May 2005); doi: 10.1117/12.599630
Proc. SPIE 5755, Optimization of multi-step development scheme to improve the critical dimension uniformity, 0000 (17 May 2005); doi: 10.1117/12.599321
Advanced Process Control II
Proc. SPIE 5755, The first intrinsic process monitoring system for 90-nm device with focus and dose line navigator (FDLN), 0000 (17 May 2005); doi: 10.1117/12.604489
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