PROCEEDINGS VOLUME 5835
21ST EUROPEAN MASK AND LITHOGRAPHY CONFERENCE | JAN 31 - FEB 3 2005
21st European Mask and Lithography Conference
21ST EUROPEAN MASK AND LITHOGRAPHY CONFERENCE
Jan 31 - Feb 3 2005
Dresden, Germany
Plenary Session
Proc. SPIE 5835, Enabling technologies for nanostructuring, 0000 (16 June 2005); doi: 10.1117/12.637268
Immersion Lithography
Proc. SPIE 5835, Progress in 193nm immersion lithography at IMEC, 0000 (16 June 2005); doi: 10.1117/12.637271
Reticle Manufacturing I
Proc. SPIE 5835, Influence of pellicle mounting to predicted mask flatness, 0000 (16 June 2005); doi: 10.1117/12.637272
Proc. SPIE 5835, Endpoint detection development for 70 nm technology Cr etch process, 0000 (16 June 2005); doi: 10.1117/12.637274
Proc. SPIE 5835, Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication, 0000 (16 June 2005); doi: 10.1117/12.637275
Proc. SPIE 5835, ALTA 4700 system mask patterning performance improvements for X-architecture and wafer electrical performance interchangeability with 50kV E-beam, 0000 (16 June 2005); doi: 10.1117/12.637280
Data Processing
Proc. SPIE 5835, Extending OASIS for the unification of mask data representation, 0000 (16 June 2005); doi: 10.1117/12.637283
Proc. SPIE 5835, The interaction of mask manufacturability and alt PSM design parameters, 0000 (16 June 2005); doi: 10.1117/12.637284
Simulation
Proc. SPIE 5835, Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects, 0000 (16 June 2005); doi: 10.1117/12.637285
Proc. SPIE 5835, Gaussian beam writing strategy: accuracy of using the shape beam simulator SELID for Gaussian beam systems, 0000 (16 June 2005); doi: 10.1117/12.637286
Proc. SPIE 5835, Accurate aerial image simulation using high-resolution reticle inspection images, 0000 (16 June 2005); doi: 10.1117/12.637289
Proc. SPIE 5835, TRAVIT: software tool to simulate dry etch in maskmaking, 0000 (16 June 2005); doi: 10.1117/12.637291
Metrology I
Proc. SPIE 5835, Exploring the fundamental limit of CD control: a measurement of shot noise induced CDU in e-beam lithography, 0000 (16 June 2005); doi: 10.1117/12.637293
Proc. SPIE 5835, Application results at 193nm: lithography emulation by aerial imaging and supplementary high resolution measurements, 0000 (16 June 2005); doi: 10.1117/12.637309
Proc. SPIE 5835, Actual measurement data obtained on new 65nm generation mask metrology tool set, 0000 (16 June 2005); doi: 10.1117/12.637319
Reticle Manufacturing II
Proc. SPIE 5835, Application data of the electron beam based photomask repair tool MeRiT MG, 0000 (16 June 2005); doi: 10.1117/12.637273
Proc. SPIE 5835, Second level exposure for advanced phase shift mask applications using the SLM-based Sigma7300 DUV mask writer, 0000 (16 June 2005); doi: 10.1117/12.637276
Metrology II
Proc. SPIE 5835, DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI, 0000 (16 June 2005); doi: 10.1117/12.637295
Proc. SPIE 5835, Flare metrology used for PSD reconstruction, 0000 (16 June 2005); doi: 10.1117/12.637297
Maskless Lithography ML2
Proc. SPIE 5835, Demonstrators: a vital step forward for projection mask-less lithography (PML2), 0000 (16 June 2005); doi: 10.1117/12.637298
Proc. SPIE 5835, Mask manufacture for projection mask-less lithography (PML2): MEMS-technology for a programmable aperture plate system, 0000 (16 June 2005); doi: 10.1117/12.637320
Poster Session
Proc. SPIE 5835, Optimization of anti-reflective coatings for lithography applications, 0000 (16 June 2005); doi: 10.1117/12.637323
Proc. SPIE 5835, Defect printability and inspectability of halftone masks for the 90nm and 70nm node, 0000 (16 June 2005); doi: 10.1117/12.637328
Proc. SPIE 5835, Pattern-induced non-uniformity of residual layers in nanoimprint lithography, 0000 (16 June 2005); doi: 10.1117/12.637299
Proc. SPIE 5835, High productivity object-oriented defect detection algorithms for the new modular die-to-database reticle inspection platform, 0000 (16 June 2005); doi: 10.1117/12.637300
Application and Outlook
Proc. SPIE 5835, Lithography trends based on projections of the ITRS, 0000 (16 June 2005); doi: 10.1117/12.637301
EUV Mask and Lithography Techniques I
Proc. SPIE 5835, Overview of SEMATECH's EUVL program, 0000 (16 June 2005); doi: 10.1117/12.637331
Proc. SPIE 5835, Progress on EUV-source development, tool integration and applications, 0000 (16 June 2005); doi: 10.1117/12.637333
EUV Mask and Lithography Techniques II
Proc. SPIE 5835, Production challenges of making EUV mask blanks, 0000 (16 June 2005); doi: 10.1117/12.637335
Proc. SPIE 5835, High speed reflectometer for EUV mask-blanks, 0000 (16 June 2005); doi: 10.1117/12.637341
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