Photomask Processes and Materials (I)
Akira Imai, Noboyuki Yoshioka, Tetsuro Hanawa, Koichiro Narimatsu, Kunihiro Hosono, Kazuyuki Suko
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617033
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617034
Sin-Ju Yang, Sung-Min Seo, Sang-Hoon Ko, Han-Sun Cha, Geung-Won Kang, Kee-Soo Nam, Woong-Won Seo, Woo-Kyun Jung, Hyun-Kyoon Cho, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617054
Photomask Processes and Materials (II)
Kezhao Xing, Johan Karlsson, Adisa Paulson, Charles Bjornberg, Axel Lundvall, Peter Hogfeldt, Jukka Vedenpaa, Robin Goodoree, Mans Bjuggren
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617056
Ming L. Yu, Allan Sagle, Benny Buller
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617058
Daniel Ritter, Peter Brooker, John Lewellen, Young-Mog Ham, Patrick Martin, Rand Cottle
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617060
Eui-Sang Park, Hyun-Joon Cho, Jin-Min Kim, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617065
S. Babin, K. Bay, S. Okulovsky
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617070
Cleaning and Quality Assurance (I)
Florence Eschbach, Peter Coon, Barbara Greenebaum, Anurag Mittal, Peter Sanchez, Daniel Tanzil, Grace Ng, Henry Yun, Archita Sengupta
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617078
Sang-Yong Yu, Soon-Ho Kim, Byung-Cheol Cha, Yong-Hoon Kim, Seung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617080
Cleaning and Quality Assurance (II)
S. Banerjee, C. C. Lin, S. Su, H. F. Chung, W. Brandt, K. Tang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617081
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617083
Poster Session: Photomask Processes and Materials
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617090
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617091
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617092
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617095
Sharon Wang, Shinsuke Miyazaki, Makoto Kozuma
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617102
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617104
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617105
Corinna Koepernik, H. W. Becker, J. Butschke, U. Buttgereit, M. Irmscher, L. Nedelmann, F. Schmidt, S. Teuber
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617110
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617111
Yoshihiro Saida, Takashi Okubo, Jun Sasaki, Toshio Konishi, Motohiko Morita
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617114
Poster Session: Cleaning and Pelliclization
Harald Koster, Karsten Branz, Uwe Dietze, Peter Dress, Guenter Hess
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617115
Han-Byul Kang, Jong-Min Kim, Yong-Dae Kim, Hyun-Joon Cho, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617117
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617119
Christopher Lee, Kenneth Racette, Monica Barrett
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617120
Poster Session: Quality Assurance
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617122
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617126
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617128
Mitsuyo Kariya, Eiji Yamanaka, Satoshi Tanaka, Takahiro Ikeda, Shinji Yamaguchi, Masamitsu Itoh, Hideaki Kobayashi, Tsukasa Kawashima, Shogo Narukawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617130
Poster Session: Mask Data Preparation and Processing
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617132
Emile Sahouria, Amanda Bowhill, Steffen Schulze
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617133
Kensuke Tsuchiya, Kazuhisa Ogawa, Satomi Nakamura, Kazuyoshi Kawahara, Hidetoshi Oishi, Hidetoshi Ohnuma
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617135
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617136
Lantian Wang, Juhwan Kim, Daniel Zhang, Zongwu Tang, Minghui Fan
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617139
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617141
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617143
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617146
Katsuji Tabara, Mitsuo Sakurai, Seiji Makino, Takahisa Itoh, Tomoyuki Okada
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617148
Koki Kuriyama, Yuji Machiya, Kiyoshi Yamasaki, Shogo Narukawa, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617151
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617152
Shogo Narukawa, Kiyoshi Yamasaki, Yuji Machiya, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617155
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617158
Poster Session: PSM and OPC Mask
Michael Hsu, Doug Van Den Broeke, Tom Laidig, Kurt E. Wampler, Uwe Hollerbach, Robert Socha, J. Fung Chen, Stephen Hsu, Xuelong Shi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617165
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617191
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617194
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617197
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617198
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617201
Yung-Tin Chen, M. T. Lee, C. P. Chen, Y. Y. Huang, Timothy Wu, B. C. Ho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617202
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617205
Scott A. Anderson, Alex Buxbaum, Ajay Kumar, Ibrahim Ibrahim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617206
Poster Session: Photomask Related Lithography Technologies
Poster Session: Masks for NGL: EUV
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617268
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617273
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617278
Poster Session: Masks for NGL: E-Beam
Hiroshi Sugimura, Tsukasa Yamazaki, Takashi Susa, Yoshiyuki Negishi, Takashi Yoshii, Hideyuki Eguchi, Akira Tamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617279
Nobuyuki Iriki, Hiroshi Arimoto, Yo Yamamoto, Akira Tamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617280
Yoshiyuki Negishi, Kazumasa Takeshi, Takashi Yoshii, Keishi Tanaka, Yasuhiro Okumoto
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617283
Hideyuki Eguchi, Tomoya Sumida, Takashi Susa, Yoshiyuki Negishi, Toshiaki Kurosu, Takashi Yoshii, Tsukasa Yamazaki, Kenta Yotsui, Hiroshi Sugimura, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617287
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617290
Isao Yonekura, Shinji Kunitani, Takashi Susa, Kojiro Itoh, Akira Tamura, Satoru Maruyama
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617292
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617294
Poster Session: Inspection
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617303
Syarhei Avakaw, Aliaksandr Korneliuk, Alena Tsitko
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617305
Yoshikazu Nagamura, Satoshi Momose, Akira Imai, Kunihiro Hosono, Yasutaka Morikawa, Kouichirou Kojima, Hiroshi Mohri
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617337
Tadashi Kitamura, Kazufumi Kubota, Toshiaki Hasebe, Futoshi Sakai, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto, Masahiro Inoue
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.620389
Poster Session: Repair
Yasutoshi Itou, Yoshiyuki Tanaka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617344
Peter Brooker, Tod Robinson, John Lewellen, Bob Naber, Ron Bozak, David A. Lee
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617346
Poster Session: Equipment
Charles Howard, Keun-Taek Park, Marcus Scherer, Svetomir Stankovic, Rusty Cantrell, Mark Herrmann
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617357
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617527
Mask Data Preparation and Processing (I)
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617363
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617366
Jae-pil Shin, Jin-sook Choi, Dae-hyun Jung, Jee-hyong Lee, Moon-hyun Yoo, Jeong-taek Kong
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617368
Mask Data Preparation and Processing (II)
Puneet Gupta, Andrew B. Kahng, C.-H. Park
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617372
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617412
Toshio Suzuki, Junji Hirumi, Yutaka Hojyo, Yuichi Kawase, Shinji Sakamoto, Koki Kuriyama, Syogo Narukawa, Morihisa Hoga
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617423
Takeshi Fujino, Yoshihiko Kajiya, Masaya Yoshikawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617427
PSM and OPC Mask
J. Fung Chen, Douglas van den Broeke, Stephen Hsu, Michael C. W. Hsu, Tom Laidig, Xuelong Shi, Ting Chen, Robert J. Socha, Uwe Hollerbach, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617430
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617431
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617432
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617433
Vicky Philipsen, Leonardus Leunissen, Rudi De Ruyter, Rik Jonckheere, Patrick Martin, Clare Wakefield, Stephen Johnson, Michael Cangemi, Alex Buxbaum, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617438
Toru Komizo, Satoru Nemoto, Yosuke Kojima, Takashi Ohshima, Takashi Yoshii, Toshio Konishi, Kazuaki Chiba, Yasutaka Kikuchi, Masao Otaki, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617440
Photomask Related Lithography Technologies
Masks for NGL: EUV, E-Beam, and Nanoimprint (I)
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617462
Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Tukasa Yamazaki, Hiroshi Sugimura, Takashi Susa, Kojiro Ito, Akira Tamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617467
Masks for NGL: EUV, E-Beam, and Nanoimprint (II)
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617470
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617472
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617477
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XII, (2005) https://doi.org/10.1117/12.617483