PROCEEDINGS VOLUME 5870
OPTICS AND PHOTONICS 2005 | 31 JULY - 4 AUGUST 2005
Advances in Thin-Film Coatings for Optical Applications II
OPTICS AND PHOTONICS 2005
31 July - 4 August 2005
San Diego, California, United States
Advances in Material Processing
Proc. SPIE 5870, Inorganic polarizing materials grown by physical vapor deposition, 587001 (20 August 2005); doi: 10.1117/12.613990
Proc. SPIE 5870, Double-handed circular Bragg reflection bands in chiral thin films, 587002 (20 August 2005); doi: 10.1117/12.618039
Proc. SPIE 5870, Optical and thermal characterizations of AgSbTe chalcogenide-based thin films, 587003 (24 August 2005); doi: 10.1117/12.613842
Advances in Substrate Cleaning and Deposition Techniques
Proc. SPIE 5870, Ion-air gun cleaning of substrates prior to thin film deposition, 587005 (20 August 2005); doi: 10.1117/12.612877
Proc. SPIE 5870, Silvering substrates after CO2 snow cleaning, 587006 (20 August 2005); doi: 10.1117/12.612879
Proc. SPIE 5870, Gold coatings for cube-corner retro-reflectors, 587007 (20 August 2005); doi: 10.1117/12.613286
Proc. SPIE 5870, Improved AR coating reflection color uniformity and stability using multiple anodes and fuzzy logic control in DC reactive sputter coating, 587008 (19 August 2005); doi: 10.1117/12.618976
Proc. SPIE 5870, Atomic layer deposition of TiO2 / Al2O3 films for optical applications, 587009 (20 August 2005); doi: 10.1117/12.638039
Advances in Optical and Process Monitoring
Proc. SPIE 5870, Ellipsometric monitoring of multilayer coatings, 58700A (20 August 2005); doi: 10.1117/12.613595
Proc. SPIE 5870, Usage of total reflection for optical quality control of anisotropic thin films, 58700B (20 August 2005); doi: 10.1117/12.617678
Proc. SPIE 5870, Double optical monitoring of time-dependent film formation, 58700C (22 August 2005); doi: 10.1117/12.617967
Proc. SPIE 5870, Virtual deposition plant, 58700D (19 August 2005); doi: 10.1117/12.617043
Advances in Ultraviolet Films
Proc. SPIE 5870, Correlation between mechanical stress and optical properties of SiO2/Ta2O5 multilayer UV narrow-bandpass filters deposited by plasma ion-assisted deposition, 58700E (20 August 2005); doi: 10.1117/12.613285
Proc. SPIE 5870, Effects of ion assist and substrate temperature on the optical properties and microstructure of MgF2 films produced by e-beam evaporation, 58700F (20 August 2005); doi: 10.1117/12.614753
Proc. SPIE 5870, Comparison of silicon oxide films deposited by RF ion beam sputtering and e-beam gun evaporation in visible to UV ranges, 58700G (20 August 2005); doi: 10.1117/12.615822
Advanced Thin Film Applications and Measurement
Proc. SPIE 5870, Low mechanical loss coatings for LIGO optics: progress report, 58700H (20 August 2005); doi: 10.1117/12.618288
Proc. SPIE 5870, Low-loss gratings for next-generation gravitational wave detectors, 58700J (20 August 2005); doi: 10.1117/12.617334
Proc. SPIE 5870, Angular and spectroscopic ellipsometry of ion bombarded surface layer, 58700K (25 August 2005); doi: 10.1117/12.615683
Poster Session
Proc. SPIE 5870, Dielectric coatings for customised tunable lithium niobate filters, 58700L (20 August 2005); doi: 10.1117/12.612876
Proc. SPIE 5870, Hafnium oxide for optical applications deposited by different CMOS compatible methods, 58700M (20 August 2005); doi: 10.1117/12.614727
Proc. SPIE 5870, Design of transmission linear partial polarizers using a negative film-substrate system, 58700N (19 August 2005); doi: 10.1117/12.619707
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