PROCEEDINGS VOLUME 6110
MOEMS-MEMS 2006 MICRO AND NANOFABRICATION | 21-27 JANUARY 2006
Micromachining Technology for Micro-Optics and Nano-Optics IV
IN THIS VOLUME

0 Sessions, 22 Papers, 0 Presentations
Materials  (4)
Replication  (2)
MOEMS-MEMS 2006 MICRO AND NANOFABRICATION
21-27 January 2006
San Jose, California, United States
Advanced Lithography I
Proc. SPIE 6110, SU-8 multiple layer structuring by means of maskless photolithography (DWL66), 611003 (23 January 2006); doi: 10.1117/12.643777
Proc. SPIE 6110, Modeling the fabrication of nano-optical structures, 611004 (23 January 2006); doi: 10.1117/12.652604
Etching Micro- and Nano-Optics
Proc. SPIE 6110, A new fabrication technique for complex refractive micro-optical systems, 611005 (23 January 2006); doi: 10.1117/12.646306
Proc. SPIE 6110, Fabrication of 3D photonic crystals by two-step dry etching of layered media, 611006 (23 January 2006); doi: 10.1117/12.646461
Materials
Proc. SPIE 6110, Optimization of SU-8 processing for integrated optics, 611009 (23 January 2006); doi: 10.1117/12.646489
Proc. SPIE 6110, The study on spatial resolution in two-photon induced polymerization, 61100A (23 January 2006); doi: 10.1117/12.645221
Proc. SPIE 6110, Effect of two- and three-zone phase masks on the axial and transverse intensity distribution under high numerical aperture focusing, 61100B (23 January 2006); doi: 10.1117/12.647618
Proc. SPIE 6110, Grey scale electron-beam lithography in functionalized SU-8 for active optical devices, 61100C (23 January 2006); doi: 10.1117/12.641213
Advanced Lithography II
Proc. SPIE 6110, New nanofabrication technique using overlay for 15-nm zone plate, 61100D (23 January 2006); doi: 10.1117/12.647164
Applications I
Proc. SPIE 6110, Giant optical activity in quasi-2D planar nanostructures, 61100G (23 January 2006); doi: 10.1117/12.644491
Proc. SPIE 6110, Monolithic fabrication of hollow ARROW-based sensors, 61100H (23 January 2006); doi: 10.1117/12.655322
Proc. SPIE 6110, Fabrication of tapered air-core defects in 3D photonic crystals for multifunctional scanning-probe NSOM tips, 61100I (23 January 2006); doi: 10.1117/12.647470
Proc. SPIE 6110, Fabrication issues for a chirped subwavelength form-birefringent polarization splitter, 61100J (23 January 2006); doi: 10.1117/12.646796
Replication
Proc. SPIE 6110, Fabrication of nano and micro optical elements by step and flash imprint lithography, 61100K (23 January 2006); doi: 10.1117/12.647301
Proc. SPIE 6110, Optical module fabrication using nanoimprint technology, 61100L (23 January 2006); doi: 10.1117/12.646520
Applications II
Proc. SPIE 6110, Fabrication of dual grating reflectors for high-power laser diodes, 61100O (23 January 2006); doi: 10.1117/12.659900
Proc. SPIE 6110, Investigation of the III-V oxidation process for the fabrication of sub-micron three dimensional photonic devices, 61100P (23 January 2006); doi: 10.1117/12.647157
Proc. SPIE 6110, Manufacture and replication of a novel polymer anti-reflective structure, 61100Q (23 January 2006); doi: 10.1117/12.659068
Poster Session
Proc. SPIE 6110, Fabrication of 3D photonic crystal by deep x-ray lithography, 61100R (23 January 2006); doi: 10.1117/12.645585
Proc. SPIE 6110, Novel method for fabrication of high-efficiency diffractive optics for short wavelength radiation, 61100S (23 January 2006); doi: 10.1117/12.646492
Proc. SPIE 6110, Technology development of mold fabrication for free-form surface, DOE, and microlens, 61100T (23 January 2006); doi: 10.1117/12.647162
Proc. SPIE 6110, Tolerancing microlenses using ZEMAX, 61100U (23 January 2006); doi: 10.1117/12.644894
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