PROCEEDINGS VOLUME 6283
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XIII | 18-20 APRIL 2006
Photomask and Next-Generation Lithography Mask Technology XIII
Editor(s): Morihisa Hoga
Editor Affiliations +
PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XIII
18-20 April 2006
Yokohama, Japan
Mask Business and Management
Norihiko Miyazaki, T. Sato, M. Honma, N. Yoshioka, K. Hosono, T. Onodera, H. Itoh, H. Suzuki, T. Uga, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628302 (2006) https://doi.org/10.1117/12.681729
Andrew Watts, Chet Huang, Yiyang Wang, Cuc Huynh, Craig Benson, Adam Smith
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628303 (2006) https://doi.org/10.1117/12.681730
Patterning
Henrik Sjöberg, Tord Karlin, Mats Rosling, Thomas Öström, Jonas Måhlén, Tom Newman
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628305 (2006) https://doi.org/10.1117/12.681731
Hitoshi Sunaoshi, Yuichi Tachikawa, Hitoshi Higurashi, Tomohiro Iijima, Junichi Suzuki, Takashi Kamikubo, Kenji Ohtoshi, Hirohito Anze, Takehiko Katsumata, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628306 (2006) https://doi.org/10.1117/12.681732
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628307 (2006) https://doi.org/10.1117/12.681734
Sanghee Lee, Sungho Park, Byunggook Kim, Seongwoon Choi, Woosung Han
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628308 (2006) https://doi.org/10.1117/12.681735
Process and Materials
Jaehyuck Choi, Seungyeon Lee, Yongjin Cho, Sunghun Ji, Byung Cheol Cha, Sung Woon Choi, Woo Sung Han
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830A (2006) https://doi.org/10.1117/12.681736
Shingo Anzai, Noriaki Takagi, Tomoaki Kamiyama, Naotoshi Kawaguchi, Mikio Ishijima, Toshimitsu Watanabe, Hiroaki Morimoto, Tsuneaki Kuwajima, Makito Nakatsu, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830B (2006) https://doi.org/10.1117/12.681737
Madhavi Chandrachood, Michael Grimbergen, Toi Yue B. Leung, Keven Yu, Renee Koch, Jeff Chen, Ibrahim M. Ibrahim, Sheeba Panayil, Ajay Kumar
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830C (2006) https://doi.org/10.1117/12.684417
Hitoshi Handa, Satoshi Yamauchi, Koji Hosono, Hiroshi Maruyama, Daisuke Nakamura, Toshifumi Yokoyama, Akihiko Naito
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830D (2006) https://doi.org/10.1117/12.681740
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830E (2006) https://doi.org/10.1117/12.681741
EUV Masks (I)
Guojing Zhang, Pei-Yang Yan, Ted Liang, Yan Du, Peter Sanchez, Seh-jin Park, Eric J. Lanzendorf, Chang Ju Choi, Emily Y. Shu, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830G (2006) https://doi.org/10.1117/12.681839
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830H (2006) https://doi.org/10.1117/12.681840
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830I (2006) https://doi.org/10.1117/12.681841
EUV Masks (II)
Shinpei Tamura, Koichiro Kanayama, Yasushi Nishiyama, Tadashi Matsuo, Akira Tamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830J (2006) https://doi.org/10.1117/12.681842
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830K (2006) https://doi.org/10.1117/12.681844
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830L (2006) https://doi.org/10.1117/12.681845
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830M (2006) https://doi.org/10.1117/12.681847
MDP and DFM
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830O (2006) https://doi.org/10.1117/12.681848
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830P (2006) https://doi.org/10.1117/12.681850
Bo Su, Melody Ma, Abhishek Vikram, William Volk, Hong Du, Gaurav Verma, Richard Morse, Chih-wei Chu, Becky Tsao, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830Q (2006) https://doi.org/10.1117/12.681851
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830R (2006) https://doi.org/10.1117/12.681852
OPC and RET
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830T (2006) https://doi.org/10.1117/12.681853
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830U (2006) https://doi.org/10.1117/12.681854
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830V (2006) https://doi.org/10.1117/12.681855
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830W (2006) https://doi.org/10.1117/12.681856
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830X (2006) https://doi.org/10.1117/12.681857
Inspection and Repair
Nobutaka Kikuiri, Shingo Murakami, Hideo Tsuchiya, Motonari Tateno, Kenichi Takahara, Shinichi Imai, Ryoichi Hirano, Ikunao Isomura, Yoshitake Tsuji, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830Y (2006) https://doi.org/10.1117/12.683579
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62830Z (2006) https://doi.org/10.1117/12.681858
Fumio Aramaki, Tomokazu Kozakai, Yasuhiko Sugiyama, Masashi Muramatsu, Yoshihiro Koyama, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Ryoji Hagiwara, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628310 (2006) https://doi.org/10.1117/12.681859
H. Marchman, D. Taylor, S. Hadisutjipto, S. Mackay, R. Cottle, J. Maltabes, J. Brown
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628311 (2006) https://doi.org/10.1117/12.681862
Metrology
Axel Zibold, Ulrich Strössner, Norbert Rosenkranz, Andrew Ridley, Rigo Richter, Wolfgang Harnisch, Alvina Williams
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628312 (2006) https://doi.org/10.1117/12.681863
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628313 (2006) https://doi.org/10.1117/12.681864
Takeshi Yamane, Rikiya Taniguchi, Takashi Hirano
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628314 (2006) https://doi.org/10.1117/12.681866
Jan Richter, Roman Liebe, Frank Laske, Jens Rudolf, Torben Heins
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628315 (2006) https://doi.org/10.1117/12.681867
Mask Related Lithography (I)
Mask Related Lithography (II)
Poster Session: Patterning
Gaston Lee, Yi-Sheng Chung, Wei-Tsung Yang, Wen-Hwa Cheng, Ren-Jang Lin, Tsung Si Wang, Yuan-Cheng Cheng, Wei-Jen Chou
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831H (2006) https://doi.org/10.1117/12.681742
Jonas Hellgren, Hans Fosshaug, Anders Österberg, Lars Ivansen
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831I (2006) https://doi.org/10.1117/12.681743
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831J (2006) https://doi.org/10.1117/12.681744
Se-Jin Park, Kyung-Hee Yoon, Jae-Hyun Kang, Jae-Young Choi, Yong-Suk Lee, Keeho Kim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831K (2006) https://doi.org/10.1117/12.681745
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831L (2006) https://doi.org/10.1117/12.681747
Russell Cinque, Peter Buck, Kyungsoo S. Yeo, Tadashi Komagata, Yasutoshi Nakagawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831M (2006) https://doi.org/10.1117/12.681748
Poster Session: Mask Process, Etching, and Materials
Andrew Jamieson, Thuc Dam, Ki-Ho Baik, Ken Duerksen, Elie Eidson, Keiji Akai, Kazuya Hisano, Norifumi Kohama, Shinichi Machidori
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831P (2006) https://doi.org/10.1117/12.681751
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831Q (2006) https://doi.org/10.1117/12.681752
S. Babin, K. Bay, S. Okulovsky
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831R (2006) https://doi.org/10.1117/12.681753
Orson Lin, Jomarch Chou, K. K. Fu, Booky Lee, Richard Lu, Jerry Lu, Chiang-Lin Shi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831S (2006) https://doi.org/10.1117/12.681754
Sung-Won Kwon, Young-Ju Park, Sung-Yoon Kim, Han-shin Lee, Hyuk-Joo Kwon, Seung-Woon Choi, Woo-Sung Han
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831T (2006) https://doi.org/10.1117/12.681756
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831U (2006) https://doi.org/10.1117/12.681757
Madhavi Chandrachood, Michael Grimbergen, Ibrahim M. Ibrahim, Sheeba Panayil, Ajay Kumar
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831V (2006) https://doi.org/10.1117/12.681759
Richard Lewington, Ibrahim M. Ibrahim, Sheeba Panayil, Ajay Kumar, John Yamartino
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831W (2006) https://doi.org/10.1117/12.681760
Scott A. Anderson, Madhavi Chandrachood, Michael Grimbergen, Toi Yue Becky Leung, Ibrahim M. Ibrahim, Sheeba Panayil, Ajay Kumar
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831X (2006) https://doi.org/10.1117/12.681761
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831Y (2006) https://doi.org/10.1117/12.681762
Kazumasa Takeshi, Kazuto Oono, Yoshiyuki Negishi, Daisuke Inokuchi, Keishi Tanaka, Akira Tamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62831Z (2006) https://doi.org/10.1117/12.681763
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628320 (2006) https://doi.org/10.1117/12.681765
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628322 (2006) https://doi.org/10.1117/12.681767
Poster Session: Cleaning and Pelicle
Vivek Kapila, Pierre A. Deymier, Hrishikesh Shende, Viraj Pandit, Srini Raghavan, Florence O. Eschbach
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628324 (2006) https://doi.org/10.1117/12.681771
Steve Osborne, Hidekazu Takahashi, Eric Woster
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628325 (2006) https://doi.org/10.1117/12.681772
Richard Wistrom, Dennis Hayden, Kenneth Racette, Monica Barrett, Andrew Watts
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628326 (2006) https://doi.org/10.1117/12.681775
Poster Session: Inspection
Syarhei Avakaw, Aliaksandr Korneliuk, Alena Tsitko
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628328 (2006) https://doi.org/10.1117/12.681778
Poster Session: Repair
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628329 (2006) https://doi.org/10.1117/12.681779
Arndt C. Dürr, Martin Arndt, Jan Fiebig, Samuel Weiss
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832A (2006) https://doi.org/10.1117/12.681781
Tod Robinson, John Lewellen, Ron Bozak, David A. Lee, Peter Brooker
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832B (2006) https://doi.org/10.1117/12.681782
Poster Session: Metrology
Eiji Yamanaka, Mitsuyo Kariya, Shinji Yamaguchi, Satoshi Tanaka, Kohji Hashimoto, Masamitsu Itoh, Hideaki Kobayashi, Tsukasa Kawashima, Shogo Narukawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832E (2006) https://doi.org/10.1117/12.681788
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832F (2006) https://doi.org/10.1117/12.681789
Pavel Nesladek, Andreas Wiswesser, Björn Sass, Jan Richter
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832G (2006) https://doi.org/10.1117/12.681790
Kyoung-Yoon Bang, Yo-Han Choi, Han-June Yoon, Hae-Young Jeong, Yong-Hoon Kim, Seung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832H (2006) https://doi.org/10.1117/12.681791
Poster Session: Mask Business and Management
Jochen Gruhn, Tobias Ferber, Wolfgang Keller
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832I (2006) https://doi.org/10.1117/12.681792
Poster Session: MDP, MRC, and DFM
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832J (2006) https://doi.org/10.1117/12.681793
Sven-Hendrik Voss, Maati Talmi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832K (2006) https://doi.org/10.1117/12.681794
Masahiro Shoji, Nobuyasu Horiuchi, Tomoyuki Chikanaga, Takashi Niinuma, Dai Tsunoda
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832L (2006) https://doi.org/10.1117/12.681796
Yoshihiko Kajiya, Akihiro Nakamura, Masaya Yoshikawa, Takeshi Fujino
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832M (2006) https://doi.org/10.1117/12.681798
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832N (2006) https://doi.org/10.1117/12.681800
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832O (2006) https://doi.org/10.1117/12.681801
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832P (2006) https://doi.org/10.1117/12.681802
John Nogatch, Robert Lugg, Mike Miller, Frank Amoroso
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832Q (2006) https://doi.org/10.1117/12.681804
Andrew B. Kahng, Xu Xu, Alex Zelikovsky
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832R (2006) https://doi.org/10.1117/12.681805
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832S (2006) https://doi.org/10.1117/12.681806
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832T (2006) https://doi.org/10.1117/12.681807
Poster Session: OPC and RET
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832U (2006) https://doi.org/10.1117/12.681810
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832V (2006) https://doi.org/10.1117/12.681812
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832W (2006) https://doi.org/10.1117/12.681813
James Moon, Dong-Jin Lee, Gui-Hwang Sim, Jae-Doo Eum, Byung-Ho Nam, Dong Gyu Yim
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832X (2006) https://doi.org/10.1117/12.681814
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62832Y (2006) https://doi.org/10.1117/12.681816
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628331 (2006) https://doi.org/10.1117/12.681819
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628332 (2006) https://doi.org/10.1117/12.681820
Mikio Oka, Shinichiro Suzuki, Kazuyoshi Kawahara, Kensuke Tsuchiya, Kazuhisa Ogawa, Hidetoshi Ohnuma
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628333 (2006) https://doi.org/10.1117/12.681821
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 628334 (2006) https://doi.org/10.1117/12.681822
Poster Session: Mask Related Lithography
Poster Session: EUV Mask
John Kadaksham, Dong Zhou, M. D. Murthy Peri, Ivin Varghese, Florence Eschbach, Cetin Cetinkaya
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62833C (2006) https://doi.org/10.1117/12.681831
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62833D (2006) https://doi.org/10.1117/12.681832
Jinhong Park, Seong-Sue Kim, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62833E (2006) https://doi.org/10.1117/12.681833
Poster Session: NGL Mask Technology
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIII, 62833G (2006) https://doi.org/10.1117/12.681835