PROCEEDINGS VOLUME 6317
SPIE OPTICS + PHOTONICS | 13-17 AUGUST 2006
Advances in X-Ray/EUV Optics, Components, and Applications
Proceedings Volume 6317 is from: Logo
SPIE OPTICS + PHOTONICS
13-17 August 2006
San Diego, California, United States
Sources, Systems, and Instruments I
Proc. SPIE 6317, Novel compact spectrophotometer for EUV-optics characterization, 631701 (29 August 2006); doi: 10.1117/12.686878
Proc. SPIE 6317, GOES N-P SXI in-flight calibration using the Crab Nebula, 631702 (29 August 2006); doi: 10.1117/12.680800
Proc. SPIE 6317, Dark-field image of full-field transmission hard x-ray microscope in 8-11 keV, 631703 (29 August 2006); doi: 10.1117/12.680216
Proc. SPIE 6317, Compact x-ray microscopes for EUV- and soft x-radiation with spectral imaging capabilities, 631704 (29 August 2006); doi: 10.1117/12.679819
Proc. SPIE 6317, EUV radiation from gas-puff laser plasma focused by multi-foil optics, 631705 (29 August 2006); doi: 10.1117/12.684031
Sources, Systems, and Instruments II
Proc. SPIE 6317, Compact EUV source and optics for applications apart from lithography, 631706 (29 August 2006); doi: 10.1117/12.683682
Proc. SPIE 6317, SXR optical diagnostics of capillary discharge plasma, 631707 (13 September 2006); doi: 10.1117/12.684051
Metrology
Proc. SPIE 6317, At-wavelength figure metrology of total reflection mirrors in hard x-ray region, 631709 (29 August 2006); doi: 10.1117/12.681587
Proc. SPIE 6317, Positioning errors of pencil-beam interferometers for long trace profilers, 63170A (29 August 2006); doi: 10.1117/12.677956
Proc. SPIE 6317, Surface gradient integrated profiler for x-ray and EUV optics: 3D mapping of 1m-long flat mirror and off-axis parabolic mirror, 63170B (29 August 2006); doi: 10.1117/12.680245
Proc. SPIE 6317, X-ray optics for beamlines at Diamond Light Source, 63170C (29 August 2006); doi: 10.1117/12.684012
Proc. SPIE 6317, Air convection noise of pencil-beam interferometer for long trace profiler, 63170D (29 August 2006); doi: 10.1117/12.681297
Optical Coatings and Multilayers
Proc. SPIE 6317, Graded multilayers for focusing hard x-rays below 50 nm, 63170F (29 August 2006); doi: 10.1117/12.679039
Proc. SPIE 6317, Ion-beam sputter deposition of x-ray multilayer optics on large areas, 63170G (11 September 2006); doi: 10.1117/12.680618
Proc. SPIE 6317, Reflectivity and stress responses of multilayers upon isothermal treatment, 63170I (11 September 2006); doi: 10.1117/12.678472
Proc. SPIE 6317, Film stress studies and the multilayer Laue lens project, 63170J (29 August 2006); doi: 10.1117/12.687074
Proc. SPIE 6317, EUV multilayer mirrors with enhanced stability, 63170K (29 August 2006); doi: 10.1117/12.680719
Proc. SPIE 6317, Transmittance and reflective coatings for the 50-200-nm spectral range, 63170L (29 August 2006); doi: 10.1117/12.680987
Optics and Instruments
Proc. SPIE 6317, Measurement of zone plate efficiencies in the extreme ultraviolet and applications to radiation monitors for absolute spectral emission, 63170N (29 August 2006); doi: 10.1117/12.678142
Proc. SPIE 6317, Off-plane grazing-incidence fan-groove blazed grating to serve as a high-efficiency spectral purity filter for EUV lithography, 63170O (29 August 2006); doi: 10.1117/12.678151
Proc. SPIE 6317, Beryllium and lithium x-ray lenses at the APS, 63170Q (13 September 2006); doi: 10.1117/12.684350
Proc. SPIE 6317, Tunable highly efficient crystal analyzer based on active optics, 63170R (29 August 2006); doi: 10.1117/12.684942
Optical Constants and Measurement Techniques I
Proc. SPIE 6317, Determination of the transmittance and extinction coefficient of Yb films in the 23-1700 eV range, 63170S (21 September 2006); doi: 10.1117/12.680930
Proc. SPIE 6317, Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb, 63170T (29 August 2006); doi: 10.1117/12.683234
Proc. SPIE 6317, Optical constants determination of neodymium and gadolinium in the 3- to 100-nm wavelength range, 63170U (29 August 2006); doi: 10.1117/12.681952
Proc. SPIE 6317, Transmittance and extinction coefficient of Ce films measured in situ in the extreme ultraviolet and soft x-rays, 63170V (29 August 2006); doi: 10.1117/12.684339
Optical Constants and Measurement Techniques II
Proc. SPIE 6317, Construction of an extreme ultraviolet polarimeter based on high-order harmonic generation, 63170Y (29 August 2006); doi: 10.1117/12.687200
Proc. SPIE 6317, Optical constant measurements of the uppermost layer of a reflection multilayer using reflection and total electron yield spectra, 63170Z (29 August 2006); doi: 10.1117/12.683880
Optical Constants and Measurement Techniques III
Proc. SPIE 6317, Thorium dioxide thin films in the extreme ultraviolet, 631710 (29 August 2006); doi: 10.1117/12.687201
Proc. SPIE 6317, Understanding DC-bias sputtered thorium oxide thin films useful in EUV optics, 631711 (29 August 2006); doi: 10.1117/12.687499
Proc. SPIE 6317, Optical constants in the EUV soft x-ray (5÷152 nm) spectral range of B4C thin films deposited by different deposition techniques, 631712 (29 August 2006); doi: 10.1117/12.684088
Proc. SPIE 6317, Determination of the optical constants of amorphous carbon in the EUV spectral region 40-450 eV, 631713 (15 September 2006); doi: 10.1117/12.683878
Poster Session
Proc. SPIE 6317, Development of Mg/SiC multilayer mirrors, 631714 (29 August 2006); doi: 10.1117/12.679965
Proc. SPIE 6317, Narrow-band x-ray imaging for core temperature and density maps retrieval of direct drive implosions, 631716 (29 August 2006); doi: 10.1117/12.681271
Proc. SPIE 6317, Wave-optical simulations for designing and evaluating hard x-ray reflective optics, 631718 (29 August 2006); doi: 10.1117/12.681944
Proc. SPIE 6317, High-spatial-resolution scanning x-ray fluorescence microscope with Kirkpatrick-Baez mirrors, 631719 (29 August 2006); doi: 10.1117/12.681964
Proc. SPIE 6317, Evaluation of a modern soft x-ray monochromator with high resolving power over 10,000, 63171A (29 August 2006); doi: 10.1117/12.682329
Proc. SPIE 6317, Focusing properties of aperiodic zone plates, 63171B (29 August 2006); doi: 10.1117/12.684602
Proc. SPIE 6317, Design and characterization of an UHV compatible artificial channel cut monochromator, 63171D (29 August 2006); doi: 10.1117/12.690296
Proc. SPIE 6317, Wavefront analysis and beam profiling from 40 eV up to 40 keV, 63171E (29 August 2006); doi: 10.1117/12.690297
Proc. SPIE 6317, Thermal and mechanical joints to cryo-cooled silicon monochromator crystals, 63171F (29 August 2006); doi: 10.1117/12.697083
Proc. SPIE 6317, ESAD shearing deflectometry: potentials for synchrotron beamline metrology, 63171H (11 September 2006); doi: 10.1117/12.716301
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