PROCEEDINGS VOLUME 6586
INTERNATIONAL CONGRESS ON OPTICS AND OPTOELECTRONICS | 16-19 APRIL 2007
Damage to VUV, EUV, and X-ray Optics
Proceedings Volume 6586 is from: Logo
INTERNATIONAL CONGRESS ON OPTICS AND OPTOELECTRONICS
16-19 April 2007
Prague, Czech Republic
Front Matter: 6586
Proc. SPIE 6586, Front Matter: 6586, 658601 (23 May 2007); doi: 10.1117/12.741219
Facilities and Their Optics I
Proc. SPIE 6586, Optics challenges in 4GLS: radiation damage, 658602 (18 May 2007); doi: 10.1117/12.723338
Proc. SPIE 6586, The BESSY soft x-ray FEL, 658604 (18 May 2007); doi: 10.1117/12.724687
Facilities and Their Optics II
Proc. SPIE 6586, Optics development for Japanese XFEL project, 658605 (18 May 2007); doi: 10.1117/12.724318
Proc. SPIE 6586, State-of-the-art thin film x-ray optics for synchrotrons and FEL sources, 658608 (18 May 2007); doi: 10.1117/12.722452
Observed Damage I
Proc. SPIE 6586, Ablation of inorganic materials using laser plasma soft x-rays, 658609 (5 May 2007); doi: 10.1117/12.723799
Proc. SPIE 6586, Response of inorganic materials to laser-plasma EUV radiation focused with a lobster eye collector, 65860A (11 May 2007); doi: 10.1117/12.722749
Proc. SPIE 6586, Compact EUV source and Schwarzschild objective for modification and ablation of various materials, 65860B (18 May 2007); doi: 10.1117/12.723010
Proc. SPIE 6586, Structural change in amorphous carbon on core excitations induced by soft x-ray illumination, 65860C (23 May 2007); doi: 10.1117/12.723791
Proc. SPIE 6586, Capillary-discharge 46.9-nm laser-induced damage to a-C thin films exposed to multiple laser shots below single-shot damage threshold, 65860D (23 May 2007); doi: 10.1117/12.724602
Observed Damage II
Proc. SPIE 6586, Radiation damage processes in complex-oxide scintillators, 65860E (18 May 2007); doi: 10.1117/12.724737
Proc. SPIE 6586, Interaction of short and intense light pulses with matter: visible versus VUV, 65860F (23 May 2007); doi: 10.1117/12.723986
Proc. SPIE 6586, Pillars formed by laser ablation and modified by wet etching, 65860H (18 May 2007); doi: 10.1117/12.724413
Proc. SPIE 6586, Applications of intense ultra-short XUV pulses to solid state physics: time resolved luminescence spectroscopy and radiation damage studies, 65860I (15 June 2007); doi: 10.1117/12.724006
Multilayers, EUV Lithography, and Optics
Proc. SPIE 6586, Multilayers for next-generation x-ray sources, 65860J (18 May 2007); doi: 10.1117/12.724786
Proc. SPIE 6586, Plasma-induced damage of multilayer coatings in EUVL, 65860L (18 May 2007); doi: 10.1117/12.724889
VUV Damage
Proc. SPIE 6586, Resistivity for deep-UV laser irradiation in fluorine doped silica glass fiber, 65860N (18 May 2007); doi: 10.1117/12.723972
Diagnostic Methods
Proc. SPIE 6586, At-wavelength diagnostics of EUV-optics, 65860Q (18 May 2007); doi: 10.1117/12.722786
Proc. SPIE 6586, X-ray optics power considerations for high intensity x-ray free-electron lasers based on superconducting technology, 65860R (18 May 2007); doi: 10.1117/12.725550
Proc. SPIE 6586, Utilizing ablation of solids to characterize a focused soft x-ray laser beam, 65860S (18 May 2007); doi: 10.1117/12.724385
Theory and Computation
Proc. SPIE 6586, Damage-resistant single-pulse optics for x-ray free electron lasers, 65860T (18 May 2007); doi: 10.1117/12.723994
Poster Session
Proc. SPIE 6586, Quantitative modelization of particle emission from excited solids: application to spectroscopic diagnostics of buried interfaces in multilayer, 65860V (18 May 2007); doi: 10.1117/12.722922
Proc. SPIE 6586, Debris- and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance, 65860W (18 May 2007); doi: 10.1117/12.723692
Proc. SPIE 6586, Design, conception, and metrology of EUV mirrors for aggressive environments, 65860X (18 May 2007); doi: 10.1117/12.723483
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