PROCEEDINGS VOLUME 6607
PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIV | 17-19 APRIL 2007
Photomask and Next-Generation Lithography Mask Technology XIV
Editor(s): Hidehiro Watanabe
Editor Affiliations +
Proceedings Volume 6607 is from: Logo
PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIV
17-19 April 2007
Yokohama, Japan
Front Matter: Volume 6607
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660701 (2007) https://doi.org/10.1117/12.741654
Writing Tools and Technologies
Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada, Hirohito Anze, Takehiko Katsumata, Tomohiro Iijima, Rieko Nishimura, Syuuichiro Fukutome, Nobuo Miyamoto, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660703 (2007) https://doi.org/10.1117/12.728917
Anders Österberg, Lars Ivansen, Henrik Åhlfeldt, Hans Fosshaug, Tom Newman, Amanda Bowhill, Emile Sahouria, Steffen Schulze
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660704 (2007) https://doi.org/10.1117/12.728918
Ming-Jiun Yao, Tzu-Yi Wang, Chia-Jen Chen, Hsin-Chang Lee, Yao-Ching Ku
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660705 (2007) https://doi.org/10.1117/12.728919
Progressive Defects
S. Shimada, N. Kanda, N. Takahashi, H. Nakajima, H. Tanaka, H. Ishii, Y. Shoji, M. Ohtsuki, A. Naitoh, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660706 (2007) https://doi.org/10.1117/12.729258
Joseph Gordon, David Chan, Larry E. Frisa, Colleen Weins, Christian Chovino, John Keagy, Steve Mahoney, Frank F. Chen, Makoto Kozuma, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660707 (2007) https://doi.org/10.1117/12.728920
Kyo Otsubo, Shinji Yamaguchi, Yukiyasu Arisawa, Hidefumi Mukai, Toshiya Kotani, Hiromitsu Mashita, Hiromitsu Hashimoto, Takashi Kamo, Tomohiro Tsutsui, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660708 (2007) https://doi.org/10.1117/12.728921
Jaehyuck Choi, Han-shin Lee, Jin-sik Jung, Byung Cheol Cha, Sang-Gyun Woo, HanKu Cho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660709 (2007) https://doi.org/10.1117/12.728922
Process and Material I
Kunihiro Ugajin, Masato Saito, Machiko Suenaga, Tomotaka Higaki, Hideaki Nishino, Hidehiro Watanabe, Osamu Ikenaga
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070A (2007) https://doi.org/10.1117/12.728923
Mikio Takagi, Takashi Mizoguchi, Yosuke Kojima, Tadashi Saga, Takashi Haraguchi, Yuichi Fukushima, Tsuyoshi Tanaka, Yoshimitsu Okuda, Yukio Inazuki, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070B (2007) https://doi.org/10.1117/12.728924
Yosuke Kojima, Masanori Shirasaki, Kazuaki Chiba, Tsuyoshi Tanaka, Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki, Kazuya Iwase, Kiichi Ishikawa, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070C (2007) https://doi.org/10.1117/12.728925
Process and Material II
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070D (2007) https://doi.org/10.1117/12.728926
C. L. Lu, L. Y. Hsia, T. H. Cheng, S. C. Chang, W. C. Wang, H. J. Lee, Y. C. Ku
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070E (2007) https://doi.org/10.1117/12.728928
NGL I
Rik Jonckheere, Gian Francesco Lorusso, Anne Marie Goethals, Jan Hermans, Bart Baudemprez, Alan Myers, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070H (2007) https://doi.org/10.1117/12.729259
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070I (2007) https://doi.org/10.1117/12.728931
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070J (2007) https://doi.org/10.1117/12.728933
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070K (2007) https://doi.org/10.1117/12.728934
Tsukasa Abe, Akiko Fujii, Shiho Sasaki, Hiroshi Mohri, Hidemichi Imai, Hironobu Takaya, Yasushi Sato, Naoya Hayashi, Yumiko Maenaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070L (2007) https://doi.org/10.1117/12.728935
EDA for Photomask
Shimon Maeda, Ryuji Ogawa, Seiji Shibazaki, Tadashi Nakajima
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070M (2007) https://doi.org/10.1117/12.728936
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070N (2007) https://doi.org/10.1117/12.728937
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070O (2007) https://doi.org/10.1117/12.728938
Tom Wong, Ravi Ravikumar
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070P (2007) https://doi.org/10.1117/12.728939
NGL II
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070R (2007) https://doi.org/10.1117/12.728941
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070S (2007) https://doi.org/10.1117/12.728942
Douglas J. Resnick, Gerard Schmid, Mike Miller, Gary Doyle, Chris Jones, Dwayne LaBrake
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070T (2007) https://doi.org/10.1117/12.728943
Joerg Butschke, Mathias Irmscher, Douglas Resnick, Holger Sailer, Ecron Thompson
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070U (2007) https://doi.org/10.1117/12.728944
MDP
Min-Kyu Ji, Sung-Hoon Jang, Sung-Jun Son, Ji-Hyeun Choi, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070V (2007) https://doi.org/10.1117/12.728945
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070W (2007) https://doi.org/10.1117/12.728946
Ravi Pai, Mark Pereira, C. S. Manu, Anil Parchuri, Barsha Baruah
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070X (2007) https://doi.org/10.1117/12.728947
Metrology and Repair
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66070Z (2007) https://doi.org/10.1117/12.728948
John C. Lam, Alexander Gray, Rafael Howell, Stanley Chen
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660710 (2007) https://doi.org/10.1117/12.728949
Takeshi Yamane, Rikiya Taniguchi, Takashi Hirano
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660711 (2007) https://doi.org/10.1117/12.728950
Sang-Hyeon Lee, Hwa-Sung Kim, Hong-Seok Shim, Su-Young Lee, Geun-Bae Kim, Hyuk-Joo Kwon, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660712 (2007) https://doi.org/10.1117/12.728951
Inspection
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660714 (2007) https://doi.org/10.1117/12.728953
Tung-Yaw Kang, Chia-Hsien Chen, Chia Hui Ho, Luke Hsu, Yao-Ching Ku, Kazuyoshi Nakamura, Hideyuki Moribe, Takeshi Bashomatsu, Kenichi Matsumura, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660716 (2007) https://doi.org/10.1117/12.728955
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660717 (2007) https://doi.org/10.1117/12.728956
DFM
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660719 (2007) https://doi.org/10.1117/12.728957
Soo-Han Choi, Dai-Hyun Jung, Ji-Suk Hong, Joon-Ho Choi, Moon-Hyun Yoo, Jeong-Taek Kong
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071A (2007) https://doi.org/10.1117/12.728958
Norimasa Nagase, Kouichi Suzuki, Kazuhiko Takahashi, Masahiko Minemura, Satoshi Yamauchi, Tomoyuki Okada
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071B (2007) https://doi.org/10.1117/12.728959
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071C (2007) https://doi.org/10.1117/12.728960
Simulation
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071D (2007) https://doi.org/10.1117/12.728961
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071E (2007) https://doi.org/10.1117/12.728962
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071F (2007) https://doi.org/10.1117/12.728963
Lithography
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071G (2007) https://doi.org/10.1117/12.729263
Hiroyoshi Tanabe, Ginga Yoshizawa, Yan Liu, Vikram L. Tolani, Koichiro Kojima, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071H (2007) https://doi.org/10.1117/12.728964
Jin-Sik Jung, Hee-Bom Kim, Jeung-Woo Lee, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071I (2007) https://doi.org/10.1117/12.728965
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071J (2007) https://doi.org/10.1117/12.728966
OPC
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071L (2007) https://doi.org/10.1117/12.728968
Young-Chang Kim, Donghyun Kim, Insung Kim, Sangwook Kim, Sungsoo Suh, Yong-Jin Chun, Sukjoo Lee, Junghyeon Lee, Chang-Jin Kang, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071M (2007) https://doi.org/10.1117/12.728969
Sungsoo Suh, Sangwook Kim, Sukjoo Lee, Youngchang Kim, Junghyeon Lee, Changjin Kang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071O (2007) https://doi.org/10.1117/12.728971
Eytan Barouch, Stephen L. Knodle
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071P (2007) https://doi.org/10.1117/12.728972
Process and Material: Poster Session
Jong Gul Doh, Cheol Hong Park, Yong Seung Moon, Bo Hye Kim, Sung Won Kwon, Sun Young Choi, Sung Hyuck Kim, Seong Yoon Kim, Byung Gook Kim, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071U (2007) https://doi.org/10.1117/12.728977
K. Racette, A. Watts, M. Barrett, R. Nolan, Y. Sasaki, Y. Kikuchi, T. Matsumura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071V (2007) https://doi.org/10.1117/12.728978
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071W (2007) https://doi.org/10.1117/12.728979
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071X (2007) https://doi.org/10.1117/12.728980
Progressive Defects: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071Y (2007) https://doi.org/10.1117/12.728981
Jong-Min Kim, Jae-Chul Lee, Dong-Shik Kang, Dong-Heok Lee, Chul Shin, Moon-Hwan Choi, Sang-Soo Choi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66071Z (2007) https://doi.org/10.1117/12.728982
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660720 (2007) https://doi.org/10.1117/12.728983
Writing Tools and Technologies: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660721 (2007) https://doi.org/10.1117/12.728984
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660722 (2007) https://doi.org/10.1117/12.728985
Takashi Kamikubo, Makoto Hiramoto, Jun Yashima, Masazumi Takahashi, Rieko Nishimura, Takehiko Katsumata, Hirohito Anze, Hitoshi Sunaoshi, Shuichi Tamamushi, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660723 (2007) https://doi.org/10.1117/12.728986
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660724 (2007) https://doi.org/10.1117/12.728987
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660725 (2007) https://doi.org/10.1117/12.728988
Metrology: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660727 (2007) https://doi.org/10.1117/12.728990
S. Shimada, T. Shimomura, K. Yoshida, M. Kurihara, H. Mohri, N. Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660728 (2007) https://doi.org/10.1117/12.728991
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660729 (2007) https://doi.org/10.1117/12.728992
Grant Davis, Sun Young Choi, Eui Hee Jung, Arne Seyfarth, Hans van Doornmalen, Eric Poortinga
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072A (2007) https://doi.org/10.1117/12.728993
Yu-Kuang Huang, Nien-Po Chen, Jason Chou, Judith Chang
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072B (2007) https://doi.org/10.1117/12.728994
Inspection: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072C (2007) https://doi.org/10.1117/12.728995
KangJoon Seo, SangIee Lee, HyunYoung Kim, DaeHo Hwang, Sangpyo Kim, Goomin Jeong, Oscar Han, Chunlin Chen, David Yee, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072D (2007) https://doi.org/10.1117/12.728996
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072E (2007) https://doi.org/10.1117/12.728997
William Chou, Yung-Feng Cheng, Shih-Ming Yen, James Cheng, Peter Peng, Joe Huang, Tracy Huang, Den Wang, Ellison Chen, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072F (2007) https://doi.org/10.1117/12.728998
Eric H. Lu, Ching Yun Hsiang, Jim Wang, Jinggang Zhu, Ellison Chen, Kaustuve Bhattacharyya
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072G (2007) https://doi.org/10.1117/12.728999
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072H (2007) https://doi.org/10.1117/12.729000
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072J (2007) https://doi.org/10.1117/12.729002
Repair: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072M (2007) https://doi.org/10.1117/12.729005
Leon Treyger, Jon Heyl, Donald Ronning, Donald Ducharme
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072N (2007) https://doi.org/10.1117/12.729006
MDP: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072O (2007) https://doi.org/10.1117/12.729007
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072P (2007) https://doi.org/10.1117/12.729008
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072Q (2007) https://doi.org/10.1117/12.729009
Ravi Pai, Mark Pereira, Nageswara Rao, C. S. Manu, D. S. S. Bhardwaj, Sandip Dutta
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072R (2007) https://doi.org/10.1117/12.729010
EDA for Photomask: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072S (2007) https://doi.org/10.1117/12.729011
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072T (2007) https://doi.org/10.1117/12.729012
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072X (2007) https://doi.org/10.1117/12.729016
Simulation: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66072Z (2007) https://doi.org/10.1117/12.729018
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660730 (2007) https://doi.org/10.1117/12.729019
OPC: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660731 (2007) https://doi.org/10.1117/12.729020
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660732 (2007) https://doi.org/10.1117/12.729021
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660733 (2007) https://doi.org/10.1117/12.729022
Technologies Relating to Lithography: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660735 (2007) https://doi.org/10.1117/12.729024
Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660736 (2007) https://doi.org/10.1117/12.729025
Yong-Jin Chun, Sung-Woo Lee, Sooryong Lee, Young-Mi Lee, Sungsoo Suh, Suk-Joo Lee, Han-Ku Cho, Ho-Jin Park, Brad Falch
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660737 (2007) https://doi.org/10.1117/12.729026
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 660739 (2007) https://doi.org/10.1117/12.729028
NGL: Poster Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66073A (2007) https://doi.org/10.1117/12.729029
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66073B (2007) https://doi.org/10.1117/12.729030
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66073C (2007) https://doi.org/10.1117/12.729031
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66073D (2007) https://doi.org/10.1117/12.729032
Banqiu Wu, Ajay Kumar
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66073E (2007) https://doi.org/10.1117/12.729033
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66073F (2007) https://doi.org/10.1117/12.729034
Mitsuaki Amemiya, Kazuya Ota, Takashi Kamono, Hiroyoshi Kubo, Youichi Usui, Tadahiko Takikawa, Takao Taguchi, Osamu Suga
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66073G (2007) https://doi.org/10.1117/12.729035
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66073H (2007) https://doi.org/10.1117/12.729036
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XIV, 66073I (2007) https://doi.org/10.1117/12.729045
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