PROCEEDINGS VOLUME 7042
NANOSCIENCE + ENGINEERING | 10-14 AUGUST 2008
Instrumentation, Metrology, and Standards for Nanomanufacturing II
IN THIS VOLUME

0 Sessions, 18 Papers, 0 Presentations
Front Matter  (1)
Proceedings Volume 7042 is from: Logo
NANOSCIENCE + ENGINEERING
10-14 August 2008
San Diego, California, United States
Front Matter
Proc. SPIE 7042, Front Matter: Volume 7042, 704201 (2 October 2008); doi: 10.1117/12.814683
Instrumentation and Metrology I
Proc. SPIE 7042, Metrology at the nanoscale: what are the grand challenges?, 704202 (9 September 2008); doi: 10.1117/12.798004
Proc. SPIE 7042, Ultra low capacitance high frequency IC probe, 704203 (9 September 2008); doi: 10.1117/12.792137
Proc. SPIE 7042, High-speed AFM probe with micromachined membrane tip, 704204 (28 August 2008); doi: 10.1117/12.795050
Proc. SPIE 7042, Improved performance of an ultrastable measurement platform using a field-programmable gate array for real-time deterministic control, 704205 (9 September 2008); doi: 10.1117/12.795700
Proc. SPIE 7042, Self-calibration of a dual-actuated single-axis nanopositioner using measurement transitivity with extensions to calibration of two-axis systems, 704206 (9 September 2008); doi: 10.1117/12.796101
Proc. SPIE 7042, Measurement of optical near field of a nanoscale aperture, 704207 (9 September 2008); doi: 10.1117/12.796765
Materials and Metrology
Proc. SPIE 7042, Test objects with right-angled and trapezoidal profiles of the relief elements, 704208 (9 September 2008); doi: 10.1117/12.794834
Proc. SPIE 7042, Check of the quality of fabrication of test objects with a trapezoidal profile, 704209 (9 September 2008); doi: 10.1117/12.794926
Proc. SPIE 7042, Accuracy considerations for critical dimension semiconductor metrology, 70420A (9 September 2008); doi: 10.1117/12.796372
Proc. SPIE 7042, Extraction of trench geometry and linewidth of nanoscale grating targets in (110)-oriented silicon using angle-resolved scatterometry, 70420B (9 September 2008); doi: 10.1117/12.796286
Proc. SPIE 7042, Measurement of the parameters of the electron beam of a scanning electron microscope, 70420C (9 September 2008); doi: 10.1117/12.794891
Standards and Metrology
Proc. SPIE 7042, Cellulose nanocrystals the next big nano-thing?, 70420D (9 September 2008); doi: 10.1117/12.797575
Proc. SPIE 7042, Measurement of oxide barrier-film thickness of Al alloy by electrochemical impedance spectroscopy at the nanometre scale, 70420E (9 September 2008); doi: 10.1117/12.792647
Proc. SPIE 7042, Toward in situ x-ray diffraction imaging at the nanometer scale, 70420F (9 September 2008); doi: 10.1117/12.794438
Proc. SPIE 7042, Laser diagnostics for flame synthesis of nanostructured materials: instrumentation, metrology, and process control (retraction notice), 70420G (9 September 2008); doi: 10.1117/12.795650
Proc. SPIE 7042, Three-dimensional x-ray diffraction nanoscopy, 70420H (9 September 2008); doi: 10.1117/12.795955
Instrumentation and Metrology II
Proc. SPIE 7042, Silica nanoparticle inline size measurement using refractive index gradient in a microfluidic cell, 70420J (9 September 2008); doi: 10.1117/12.798766
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