PROCEEDINGS VOLUME 7284
AOMATT 2008 - 4TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING | 19-21 NOVEMBER 2008
4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
IN THIS VOLUME

0 Sessions, 44 Papers, 0 Presentations
Front Matter  (1)
4-1  (5)
4-2  (6)
AOMATT 2008 - 4TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING
19-21 November 2008
Chengdu, Chengdu, China
Front Matter
Proc. SPIE 7284, Front Matter: Volume 7284, 728401 (18 May 2009); doi: 10.1117/12.834211
4-1
Proc. SPIE 7284, Characterizations of displaying magnetic-fluid microelectromechanical light modulator with laser speckle technique, 728402 (18 May 2009); doi: 10.1117/12.832060
Proc. SPIE 7284, New method on real-time signal correction and subdivision for grating-based nanometrology, 728403 (18 May 2009); doi: 10.1117/12.832061
Proc. SPIE 7284, Diamond turning microstructure optical components, 728404 (18 May 2009); doi: 10.1117/12.832062
Proc. SPIE 7284, Analysis and compensation of shape distortion in UV-LIGA based on partial coherent light theory, 728405 (18 May 2009); doi: 10.1117/12.832063
Proc. SPIE 7284, Micro-machined infrared emitter with metallic photonic crystals structure, 728406 (18 May 2009); doi: 10.1117/12.832064
4-2
Proc. SPIE 7284, Highly reflective optical coatings from vacuum ultraviolet to near infrared for micro mirrors, 728407 (18 May 2009); doi: 10.1117/12.832065
Proc. SPIE 7284, FDM study of ion exchange diffusion equation in glass, 728408 (18 May 2009); doi: 10.1117/12.832066
Proc. SPIE 7284, MEMS testing and applications in automotive and aerospace industries, 728409 (18 May 2009); doi: 10.1117/12.832067
Proc. SPIE 7284, Static micro-michelson interferometer based on electro-optical effect, 72840A (18 May 2009); doi: 10.1117/12.832068
Proc. SPIE 7284, TiO2 nanocrystals fabricated with hydrothermal method, 72840B (18 May 2009); doi: 10.1117/12.832069
Proc. SPIE 7284, Study on laser direct writing system for 32nm node, 72840C (18 May 2009); doi: 10.1117/12.832070
Poster Session
Proc. SPIE 7284, Application of MEMS blazed gratings in WDM, 72840D (18 May 2009); doi: 10.1117/12.832071
Proc. SPIE 7284, Development of a 20Х Schwarzschild projection optics for principle experiment of EUV at-wavelength interferometry, 72840E (18 May 2009); doi: 10.1117/12.832072
Proc. SPIE 7284, Effects of stress on the adhesive behavior of photoresist, 72840F (18 May 2009); doi: 10.1117/12.832073
Proc. SPIE 7284, Effect of adaptive optical system on the capability of lidar detection in atmosphere, 72840G (18 May 2009); doi: 10.1117/12.832074
Proc. SPIE 7284, Simulation on a deformable mirror actuated by microfluidic elements, 72840H (18 May 2009); doi: 10.1117/12.832075
Proc. SPIE 7284, Automatic alignment system for optical lithography based on machine vision, 72840I (18 May 2009); doi: 10.1117/12.832076
Proc. SPIE 7284, Imaging characterization and tolerance analysis of thin planar photon sieves, 72840J (18 May 2009); doi: 10.1117/12.832077
Proc. SPIE 7284, System-level design and analysis of MEMS-based micro-fuze resonator, 72840K (18 May 2009); doi: 10.1117/12.832079
Proc. SPIE 7284, Design and optimization of 2D electrostatic micro scanning mirrors, 72840L (18 May 2009); doi: 10.1117/12.832080
Proc. SPIE 7284, The theoretical analysis of tri-beam SPPs interference through Ag film, 72840M (18 May 2009); doi: 10.1117/12.832081
Proc. SPIE 7284, Plasmonic nanolens focusing light in subwavelength scale, 72840N (18 May 2009); doi: 10.1117/12.832082
Proc. SPIE 7284, Simulation of surface plasmon nanolithography using tapered structure, 72840O (18 May 2009); doi: 10.1117/12.834515
Proc. SPIE 7284, Micro-structuring of photonic materials by deep-ultraviolet laser, 72840P (18 May 2009); doi: 10.1117/12.832084
Proc. SPIE 7284, Micropatterning cathode separator for high resolution organic light-emitting diode with negative and positive type photoresists, 72840Q (18 May 2009); doi: 10.1117/12.832085
Proc. SPIE 7284, Method of laser mode selection based on silicon micro F-P cavity, 72840R (18 May 2009); doi: 10.1117/12.832086
Proc. SPIE 7284, Study on enhancing dynamic range of CCD imaging based on digital micro-mirror device, 72840S (18 May 2009); doi: 10.1117/12.832087
Proc. SPIE 7284, Numerical simulations of volume holographic imaging system resolution characteristics, 72840T (18 May 2009); doi: 10.1117/12.832088
Proc. SPIE 7284, Rim morphology of nanopore for studying single biomolecule, 72840U (18 May 2009); doi: 10.1117/12.832089
Proc. SPIE 7284, Application of support vector machines in the micro spectrometer, 72840V (18 May 2009); doi: 10.1117/12.832090
Proc. SPIE 7284, Interaction between femtosecond laser and silicon nitride crystal film, 72840W (18 May 2009); doi: 10.1117/12.832091
Proc. SPIE 7284, Influence of non-ideal lens array on*) position and quality of 3D reconstruction in integral images, 72840X (18 May 2009); doi: 10.1117/12.832092
Proc. SPIE 7284, Design of optical coherence tomography probe using a 2-axis MEMS scanning mirror, 72840Y (18 May 2009); doi: 10.1117/12.832093
Proc. SPIE 7284, Increasing the sensitivity of Love wave sensors with thicker waveguide layer by modified spin coating method, 72840Z (18 May 2009); doi: 10.1117/12.832094
Proc. SPIE 7284, Fabrication and gas sensitivity of poly-2,5-dimethoxyethynylbenzene/SnO2 nanocomposite, 728410 (18 May 2009); doi: 10.1117/12.832095
Proc. SPIE 7284, Fabrication and emission properties of LaB6 field emission microtriodes, 728411 (18 May 2009); doi: 10.1117/12.832096
Proc. SPIE 7284, Improved near field lithography by surface plasmon resonance, 728412 (18 May 2009); doi: 10.1117/12.832097
Proc. SPIE 7284, Fabrication of flexible grating sensing waveguide based on nano-imprint lithography and micro-replication process, 728413 (18 May 2009); doi: 10.1117/12.832098
Proc. SPIE 7284, Nano-materials analysis using optical profiler, 728414 (18 May 2009); doi: 10.1117/12.832099
Proc. SPIE 7284, Effect of substrate bending on the piezoelectric measurement of PZT thin film, 728415 (18 May 2009); doi: 10.1117/12.832100
Proc. SPIE 7284, SWS grating for UV band filter by nano-imprint, 728416 (18 May 2009); doi: 10.1117/12.832101
Proc. SPIE 7284, Research on digital gray-tone projection lithography, 728417 (18 May 2009); doi: 10.1117/12.832102
Proc. SPIE 7284, Near-field diffraction simulation on three-dimensional mask model with off-axis illumination, 728418 (18 May 2009); doi: 10.1117/12.832103
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