Proceedings Volume 7488 is from: Logo
SPIE PHOTOMASK TECHNOLOGY
14-17 September 2009
Monterey, California, United States
Front Matter
Proc. SPIE 7488, Front Matter: Volume 7488, 748801 (16 October 2009); doi: 10.1117/12.848146
Invited Session
Proc. SPIE 7488, Mask industry assessment: 2009, 748803 (30 September 2009); doi: 10.1117/12.832722
Proc. SPIE 7488, PMJ panel discussion overview: mask manufacturing with massive or multi-parallel method, 748805 (23 September 2009); doi: 10.1117/12.835786
Defect Inspection and Disposition
Proc. SPIE 7488, SMO photomask inspection in the lithographic plane, 748807 (23 September 2009); doi: 10.1117/12.830668
Proc. SPIE 7488, Aerial image based die-to-model inspections of advanced technology masks, 748808 (30 September 2009); doi: 10.1117/12.829637
Proc. SPIE 7488, Mask pattern recovery by level set method based inverse inspection technology (IIT) and its application on defect auto disposition, 748809 (23 September 2009); doi: 10.1117/12.830034
Proc. SPIE 7488, Defect printability analysis by lithographic simulation from high resolution mask images, 74880A (23 September 2009); doi: 10.1117/12.831475
Proc. SPIE 7488, Printability verification function of mask inspection system, 74880B (23 September 2009); doi: 10.1117/12.829739
Defect Inspection and Repair
Proc. SPIE 7488, Using metrology capabilities of mask inspection equipment for optimizing total lithography performance, 74880C (30 September 2009); doi: 10.1117/12.833513
Proc. SPIE 7488, High MEEF reticle inspection strategy, 74880D (23 September 2009); doi: 10.1117/12.834830
Proc. SPIE 7488, New tools to enable photomask repair to the 32nm node, 74880F (23 September 2009); doi: 10.1117/12.847238
Proc. SPIE 7488, Simulation based mask defect repair verification and disposition, 74880G (23 September 2009); doi: 10.1117/12.829692
Proc. SPIE 7488, Challenging defect repair techniques for maximizing mask repair yield, 74880H (23 September 2009); doi: 10.1117/12.833404
Proc. SPIE 7488, Expanding the lithography process window (PW) with CDC technology, 74880I (23 September 2009); doi: 10.1117/12.833442
Mask Films, Process Control, and Equipment
Proc. SPIE 7488, Post exposure bake tuning for 32nm photomasks, 74880J (23 September 2009); doi: 10.1117/12.830123
Proc. SPIE 7488, Reduction of local CD-linewidth variations in resist develop through acoustic streaming, 74880K (23 September 2009); doi: 10.1117/12.829613
Proc. SPIE 7488, Plasma characterization of Tetra III chrome etch system, 74880L (6 November 2009); doi: 10.1117/12.833490
Proc. SPIE 7488, Behavior of the molybdenum silicide thin film by 193nm exposure, 74880M (23 September 2009); doi: 10.1117/12.829749
Proc. SPIE 7488, Mask performance improvement with mapping, 74880N (23 September 2009); doi: 10.1117/12.834302
Proc. SPIE 7488, Enhanced laser-writing techniques for bimetallic grayscale photomasks, 74880O (23 September 2009); doi: 10.1117/12.829743
Nano-Imprint and Patterned Media Technology II
Proc. SPIE 7488, Study of program defects of 22nm nanoimprint template with an advanced e-beam inspection system, 74880T (30 September 2009); doi: 10.1117/12.834581
Proc. SPIE 7488, A cost of ownership model for imprint lithography templates for HDD applications, 74880U (23 September 2009); doi: 10.1117/12.833468
Proc. SPIE 7488, High-resolution e-beam repair for nanoimprint templates, 74880V (23 September 2009); doi: 10.1117/12.833030
Proc. SPIE 7488, Duplicated quartz template for 2.5 inch discrete track media, 74880W (23 September 2009); doi: 10.1117/12.833466
Source-Mask Optimization
Proc. SPIE 7488, Source-mask co-optimization (SMO) using level set methods, 74880Y (30 September 2009); doi: 10.1117/12.833430
Proc. SPIE 7488, Aerial imaging for source mask optimization: mask and illumination qualification, 74880Z (1 October 2009); doi: 10.1117/12.832724
RET and OPC/ORC
Proc. SPIE 7488, Sub-resolution assist features placement using cost-function-reduction method, 748811 (23 September 2009); doi: 10.1117/12.834099
Proc. SPIE 7488, Inverse lithography (ILT) mask manufacturability for full-chip device, 748812 (30 September 2009); doi: 10.1117/12.833572
Proc. SPIE 7488, SRAF enhancement using inverse lithography for 32nm hole patterning and beyond, 748813 (30 September 2009); doi: 10.1117/12.829894
Proc. SPIE 7488, Model-based assist feature placement for 32nm and 22nm technology nodes using inverse mask technology, 748814 (30 September 2009); doi: 10.1117/12.829717
Proc. SPIE 7488, Model-based assist features, 748815 (23 September 2009); doi: 10.1117/12.829938
EUV Mask Substrates and Processing
Proc. SPIE 7488, Correlation of overlay performance and reticle substrate non-flatness effects in EUV lithography, 748816 (30 September 2009); doi: 10.1117/12.834746
Proc. SPIE 7488, Thin absorber EUVL mask with light-shield border for full-field scanner: flatness and image placement change through mask process, 748818 (30 September 2009); doi: 10.1117/12.829873
Proc. SPIE 7488, EUVL ML mask blank fiducial mark application for ML defect mitigation, 748819 (30 September 2009); doi: 10.1117/12.831127
Proc. SPIE 7488, Actinic EUVL mask blank inspection capability with time delay integration mode, 74881B (30 September 2009); doi: 10.1117/12.829724
Patterning Technology and Tools
Proc. SPIE 7488, Development of multiple pass exposure in electron beam direct write lithography for sub-32nm nodes, 74881C (23 September 2009); doi: 10.1117/12.829893
Proc. SPIE 7488, Charged particle multi-beam lithography evaluations for sub-16nm hp mask node fabrication and wafer direct write, 74881D (23 September 2009); doi: 10.1117/12.832156
Proc. SPIE 7488, Exposure results with four column cells in multicolumn EB exposure system, 74881F (23 September 2009); doi: 10.1117/12.829732
Metrology I
Proc. SPIE 7488, Results of an international photomask linewidth comparison of NIST and PTB, 74881H (23 September 2009); doi: 10.1117/12.831373
Proc. SPIE 7488, Measurement sampling frequency impact on determining magnitude of pattern placement errors on photomasks, 74881I (23 September 2009); doi: 10.1117/12.833495
Proc. SPIE 7488, A 193nm optical CD metrology tool for the 32nm node, 74881J (23 September 2009); doi: 10.1117/12.829629
Proc. SPIE 7488, How much is enough? An analysis of CD measurement amount for mask characterization, 74881K (23 September 2009); doi: 10.1117/12.830671
Metrology II
Proc. SPIE 7488, Photomask metrology using a 193nm scatterfield microscope, 74881L (30 September 2009); doi: 10.1117/12.829693
Proc. SPIE 7488, Experimental test results of pattern placement metrology on photomasks with laser illumination source designed to address double patterning lithography challenges, 74881M (23 September 2009); doi: 10.1117/12.833203
Proc. SPIE 7488, In-die metrology on photomasks for low k1 lithography, 74881N (30 September 2009); doi: 10.1117/12.834869
Proc. SPIE 7488, Critical dimension uniformity using reticle inspection tool, 74881O (30 September 2009); doi: 10.1117/12.830148
Proc. SPIE 7488, IntenCD technology for fast and accurate scanner performance determination, 74881P (28 October 2009); doi: 10.1117/12.833467
Mask Cleaning and Maintenance
Proc. SPIE 7488, Advances in CO2 cryogenic aerosol technology for photomask post AFM repair, 74881R (30 September 2009); doi: 10.1117/12.829690
Nano-Imprint and Patterned Media Technology III
Proc. SPIE 7488, 6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists, 74881S (30 September 2009); doi: 10.1117/12.833449
Proc. SPIE 7488, A new x-ray metrology for profiling nanostructures of patterned media, 74881T (23 September 2009); doi: 10.1117/12.833504
Proc. SPIE 7488, Inspection of 32nm imprinted patterns with an advanced e-beam inspection system, 74881V (23 September 2009); doi: 10.1117/12.833419
Proc. SPIE 7488, SEM CD metrology on nanoimprint template: an analytical SEM approach, 74881W (23 September 2009); doi: 10.1117/12.830699
Nano-Imprint and Patterned Media Technology IV
Proc. SPIE 7488, Optical metrology for template and disk patterned imprints, 74881X (23 September 2009); doi: 10.1117/12.833285
Proc. SPIE 7488, A non-destructive metrology solution for detailed measurements of imprint templates and media, 74881Z (30 September 2009); doi: 10.1117/12.833465
Proc. SPIE 7488, Jet and flash imprint lithography for the fabrication of patterned media drives, 748820 (23 September 2009); doi: 10.1117/12.833366